[Fwd: Fwd: FW: TXRF measurements]
mtang at stanford.edu
Thu May 28 17:25:41 PDT 2009
Hi all --
What do you think of glow discharge mass spec as an assay for trace
contaminants? I've not a clue.
-------- Original Message --------
Subject: Fwd: FW: TXRF measurements
Date: Thu, 28 May 2009 17:21:25 -0700
From: Aleta Jamora <artyjamo at gmail.com>
To: Mary Tang <mtang at stanford.edu>
<AD77C2DFAF33994E83AA9AAF3DB4FD951265CC at server01.xlucent.local>
We contacted Evans Analytical Group and asked them if they
could do tXRF on one of our rare earth oxide wafers and their response
was that it was not an appropriate technique for rare earth oxides as
the peaks associated with the rare earth metals drown out any signals
from the contaminants that we are looking for. They maintain that the
glow discharge mass spec would be the best technique. Here is an EAG
link discussing thier GDMS services, it also has some links to technical
notes at the bottom.
When we spoke yesterday you said that the details and conditions of the
GDMS analysis could be very different and it is important to know
exactly what conditions are used. If we were to provide GDMS analysis
data, is there a specific set of conditions that you are looking for so
that we can ask Evans to do the way you would like it to be?
I am forwarding our correspondance with Evans.
---------- Forwarded message ----------
From: *Aleta Jamora* <aleta at translucentinc.com
<mailto:aleta at translucentinc.com>>
Date: Thu, May 28, 2009 at 5:05 PM
Subject: FW: TXRF measurements
To: artyjamo at gmail.com <mailto:artyjamo at gmail.com>
From: Lori Bisaha [mailto:lbisaha at eaglabs.com <mailto:lbisaha at eaglabs.com>]
Sent: Thursday, May 28, 2009 3:45 PM
To: Richard Sewell
Cc: Operations Desk at EAG
Subject: RE: TXRF measurements
TXRF analysis of a rare earth film is not practical. The rare earths
produce numerous peaks and at matrix level, the spectrum is dominated by
them. Peaks of elements present at lower levels are either completely
obscured or the detection limits are far too high to be useful.
You might want to speak to Jim Norberg (408-530-3758) about the specific
aim of your analysis and possible alternative methods.
From: Richard Sewell [mailto:richard at translucentinc.com
<mailto:richard at translucentinc.com>]
Sent: Wednesday, May 27, 2009 5:08 PM
Subject: TXRF measurements
I need to get one TXRF measurement done on a 100mm diameter silicon
wafer coated with a rare-earth oxide layer. We have an open PO with EAG
that this will be charged to. Can you please put me in touch with
someone for a quick discussion of the measurement.
Director of Technology, Translucent Inc
952 Commercial Street Palo Alto CA 94303 e-mail
richard at translucentinc.com <mailto:richard at translucentinc.com> Tel
650-213-9311 x225 Fax 650-213-9511 Cell
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
mtang at stanford.edu
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