SpecMat's Consideration for Spin-On-Glass Material

Mary Tang mtang at stanford.edu
Fri Oct 2 10:21:34 PDT 2009


Hi James --

Please give us some more details on your process flow. Where and how do 
you plan to cure your films? And then eventually which Al deposition 
system do you think you'd like to use?

Thanks,

Mary

James Kim wrote:
>
> Hello, I submit this request for specmat committee’s approval. Please 
> let me know if anything else is needed. Thank you.
>
> Coral Login: jameskim
>
> Phone no.:408-234-6562
>
> Email: jameskim at snf.stanford.edu <mailto:jameskim at snf.stanford.edu> or 
> james.kim at sundiode.com <mailto:james.kim at sundiode.com>
>
> Company: Sundiode, Inc.
>
> Material: Accuglass T-12B (512B) Spin-On-Glass (MSDS attached)
>
> Manufacturer: Honeywell Electronic Materials 3500 Garret Drive, Santa 
> Clara, CA 95054
>
> Reason for Request: I am developing a procedure to utilize the 
> substance as a planarizing agent on compound-semiconductor devices we 
> are building. I will use it to coat a wafer (2 inch) under various 
> conditions. Later on, I will also develop a procedure to etch down on 
> the glass material in controlled manner to reveal certain features on 
> the wafer.
>
> Process flow: Initially, I will simply use the headway spin coater to 
> coat various wafers under various conditions, cure, and then examine 
> the wafers using SEM. Later on, controlled etching to etch a specific 
> amount of material to reveal parts of the semiconductor on the wafer 
> will be developed, requiring the use of wet bench (contaminated) for 
> wet etching. The etched structures will be examined using SEM. 
> Subsequently, metal deposition (Al) is planned on the spin-coated, 
> cured, etched wafer sample.
>
> Amount: I would like to bring 2 bottles, each with 125mL.
>
> Storage: They need to be refrigerated at 0-4C. The bottles are clearly 
> labeled with original manufacturer’s lables.
>
> Disposal of excess: The bulk of the material is solvent: ethanol, 
> isopropyl alcohol and smaller amount of acetone. Non-solvent material is
>
> Methyl siloxane polymer. Excess (during spin coating for example) will 
> be treated as flammable and disposed of in the same way photoresist is 
> disposed of. All of the material will be used in the next 6 months.
>
> James C. Kim, Ph.D.
>
> CEO, Sundiode, Inc.
>
> 1398 Borregas Ave., Sunnyvale, CA 94089
>
> Electronic james.kim at sundiode.com <mailto:james.kim at sundiode.com>
>
> Company +1.408.400.9182 Mobile +1.408.234.6562 Fax +1.408.624.9332
>




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