[Fwd: Re: UC Berkeley processing- details]

Mary Tang mtang at stanford.edu
Fri Oct 23 16:32:10 PDT 2009


Hi all --


Another request from Berkeley for semiclean 6" processing of 
stoichiometric nitride.  This prospective labmember would like to 
process this next week.  Do you all think we can or should reclassify 
thermconitride in time for this?

Mary


-------- Original Message --------
Subject: 	Re: UC Berkeley processing- details
Date: 	Fri, 23 Oct 2009 16:15:43 -0700
From: 	Anupama Bowonder <bowonder at eecs.berkeley.edu>
Organization: 	UC Berkeley
To: 	Mary Tang <mtang at stanford.edu>
References: 	<4AE22657.5060309 at eecs.berkeley.edu> 
<4AE22FC8.5040208 at stanford.edu>



Hi Mary,

   I just took a look at my split sheet again to confirm and so I have 
some splits with High K (Al2O3) + Poly Si Ge gates all processed MOS 
clean thus far. SO both the Poly SIGe gate and the gate dielectric 
beneath would be possibly attacked by piranha. I just realized since SNF 
does do a lot of Ge with Al2O3 dielectrics there is probably already a 
bench for processing these wafers?

Since Berkeley is still new to these materials we have a seperate sink 
here for Ge and High K processing where we do a Acetone and EGBHF clean 
of the wafers and then use seperate boats specifically for these wafers. 
I am sure SNF has a more sophisticated way to deal with these materials 
in a furnace.

Thanks for all your time and help!
Anupama 


-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu

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