[Fwd: Re: UC Berkeley processing- details]
edmyers at stanford.edu
Mon Oct 26 08:26:58 PDT 2009
I think we should involve the lab members and especially Maurice. We
should include poly and LTO along with the nitride in this
decision. Following last years mandate, we should divide these tubes
in to two categories. My bet is the lab members will nominate the
new tubes for the dirtier category.
At 04:32 PM 10/23/2009, Mary Tang wrote:
>Hi all --
>Another request from Berkeley for semiclean 6" processing of
>stoichiometric nitride. This prospective labmember would like to
>process this next week. Do you all think we can or should
>reclassify thermconitride in time for this?
>-------- Original Message --------
>Subject: Re: UC Berkeley processing- details
>Date: Fri, 23 Oct 2009 16:15:43 -0700
>From: Anupama Bowonder
><mailto:bowonder at eecs.berkeley.edu><bowonder at eecs.berkeley.edu>
>Organization: UC Berkeley
>To: Mary Tang <mailto:mtang at stanford.edu><mtang at stanford.edu>
><mailto:4AE22657.5060309 at eecs.berkeley.edu><4AE22657.5060309 at eecs.berkeley.edu>
><mailto:4AE22FC8.5040208 at stanford.edu><4AE22FC8.5040208 at stanford.edu>
> I just took a look at my split sheet again to confirm and so I have
>some splits with High K (Al2O3) + Poly Si Ge gates all processed MOS
>clean thus far. SO both the Poly SIGe gate and the gate dielectric
>beneath would be possibly attacked by piranha. I just realized since SNF
>does do a lot of Ge with Al2O3 dielectrics there is probably already a
>bench for processing these wafers?
>Since Berkeley is still new to these materials we have a seperate sink
>here for Ge and High K processing where we do a Acetone and EGBHF clean
>of the wafers and then use seperate boats specifically for these wafers.
>I am sure SNF has a more sophisticated way to deal with these materials
>in a furnace.
>Thanks for all your time and help!
>Mary X. Tang, Ph.D.
>Stanford Nanofabrication Facility
>CIS Room 136, Mail Code 4070
>Stanford, CA 94305
><mailto:mtang at stanford.edu>mtang at stanford.edu
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