HgTe/CdTe in Raith

Matthias Baenninger mbaennin at stanford.edu
Tue Apr 20 21:31:58 PDT 2010

Dear Special Materials Committee,


In addition to my inquiry about using the MRC etcher (see separate email),
I'd also like to check if I could use the Raith to do ebeam lithography on
HgTe/CdTe devices. The material is identical, i.e. Hg_0.3Cd_0.7Te/HgTe
heterostructures grown on a CdTe (Zn 4%) substrate. Spinning of the resist
and developing would be done externally,  so the device would be covered in
PMMA during the entire process done at SNF.


Many thanks,

Matthias Baenninger

Coral login: mbaennin



Matthias Baenninger, PhD

Goldhaber-Gordon Group

Stanford University

McCollough Bldg., Room 224

476 Lomita Mall


CA 94305-4008


Phone: +1 (650) 723-5892



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