HgTe/CdTe in Raith

[Mary Tang]

Hi all --

I don't believe there is any reason that he should not be able to 
process these materials in the Raith, since the temperatures would not 
be expected to be very high. It isn't likely the beam would be directed 
at the material itself, but just the resist on top. And I can't imagine 
the vapor pressure would be higher than for resist.

As for the MRC request, I caught part of the conversation between Jim 
McV and Jim K about this -- at that time, I think both were in agreement 
that if they had their own complete, dedicated set of quartzware and 
shields, we could minimize the possible risk of off-gassing in 
subsequent runs. The concern, I believe, was not the individual piece or 
two, but coming up with a broader, workable solution in case this work 
expands or similar materials are introduced. I think the one thing that 
had not been resolved was how to handle the diffusion pump oil (not a 
user issue, but a maintenance staff safety concern.) I suspect the 
safest solution (unless we ban the material from etchers) would be to 
require staff wear PPE while performing pump oil changes.

What does everyone else think?


Mary



Matthias Baenninger wrote:
>
> Dear Special Materials Committee,
>
> In addition to my inquiry about using the MRC etcher (see separate 
> email), I’d also like to check if I could use the Raith to do ebeam 
> lithography on HgTe/CdTe devices. The material is identical, i.e. 
> Hg_0.3Cd_0.7Te/HgTe heterostructures grown on a CdTe (Zn 4%) 
> substrate. Spinning of the resist and developing would be done 
> externally, so the device would be covered in PMMA during the entire 
> process done at SNF.
>
> Many thanks,
>
> Matthias Baenninger
>
> Coral login: mbaennin
>
> -----------------------------------
>
> Matthias Baenninger, PhD
>
> Goldhaber-Gordon Group
>
> Stanford University
>
> McCollough Bldg., Room 224
>
> 476 Lomita Mall
>
> Stanford
>
> CA 94305-4008
>
> USA
>
> Phone: +1 (650) 723-5892
>
> -----------------------------------
>


-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu