From edmyers at stanford.edu Mon Jan 11 13:20:58 2010 From: edmyers at stanford.edu (Ed Myers) Date: Mon, 11 Jan 2010 13:20:58 -0800 Subject: Visit to See Silane Setup on 01/06/09 In-Reply-To: <1AEC1567BC0AFC4284253C90BD07D7C501CEC8B7@piserver.photon.l ocal> References: <1AEC1567BC0AFC4284253C90BD07D7C501CEC291@piserver.photon.local> <6.2.5.6.2.20100105191032.04e4c178@stanford.edu> <1AEC1567BC0AFC4284253C90BD07D7C5013E5387@piserver.photon.local> <6.2.5.6.2.20100106074042.05010280@stanford.edu> <1AEC1567BC0AFC4284253C90BD07D7C501CEC8B7@piserver.photon.local> Message-ID: <6.2.5.6.2.20100111131601.04fa0688@stanford.edu> Thulasi Gandhi, Yes, we have a poly-silicon furnace plumbed with both dopants. Right now it is for clean samples, where your sample would be considered gold contaminated. I have copied the specmat group which is responsible for any changes to our cleanliness or contamination levels. To run what you ask, does require this group to assign a poly furnace to the gold contaminated equipment set. If you want to make this change, you will need to fill out the paperwork starting at http://snf.stanford.edu/Materials/Materials.html Also, there will be a memory effect as you switch dopant gases. This should be factored in to your process planning. If you don't remove or seal the dopants, you will get a lot of compensated doping and not sharp dopant transitions. Regards, Ed At 11:01 AM 1/11/2010, Thulasidharan Gandhi wrote: >Dear Ed Myers, > >It was nice meeting you the other day and knowing about the research >capabilities you have. We have one final question before we go ahead >with the application for training and using your facility. > >This is what we are planning to do: We are planning to grow Si nanowires >onto alumina template. > >We will have gold deposited into the alumina template and grow the Si >nanowires using silane at around 500C. In the growth of Si nanowires we >want to dope phosphor and boron alternatively to grow PN Si nanowires. >The other day you told us that your system is capable of doping phosphor >and boron. We want to once again make sure whether it can be done by >switching the gas supply. > >Thanks > >Thulasi Gandhi > >-----Original Message----- >From: Ed Myers [mailto:edmyers at stanford.edu] >Sent: Wednesday, January 06, 2010 7:43 AM >To: Thulasidharan Gandhi >Subject: RE: Visit to See Silane Setup on 01/06/09 > >Thulasi Gandhi, > >Yes, I do have to make a change. Last night I was not by my calendar >and I forgot about a 1:30-3pm training I have to provide today. Can >we meet after 3pm? > >Regards, >Ed > > >At 07:47 PM 1/5/2010, you wrote: > >Dear Ed Myers, > > > >Thats ok. I am not sure whether we can make it before 10 am. So i > >think 1-3 pm should be ok with us. I will meet you tomorrow at 1pm. > >Let me know if there is any changes. > > > >Thanks > > > >Thulasi Gandhi > > > > > >---------- > >From: Ed Myers [mailto:edmyers at stanford.edu] > >Sent: Tue 1/5/2010 7:12 PM > >To: Thulasidharan Gandhi > >Subject: Re: Visit to See Silane Setup on 01/06/09 > > > >Thulasi Gandhi, > > > >I found out late today, I have to participate in a phone conference > >at 11am on Wednesday. On Wednesday, I have time before 10am or > >between 1-3pm. Sorry for the late change, but please let me know if > >either of these times will work for you. > > > >Regards, > >Ed > > > > > >At 02:51 PM 1/4/2010, you wrote: > > >Dear Edward Myers, > > > > > >I just spoke to you over the phone about visiting your lab on > > >Wednesday (01/06/09) at 11am. You can email me back the directions. > > > > > >Thanks for your help. > > > > > >Regards, > > > > > >Thulasi Gandhi > > From mtang at stanford.edu Tue Jan 12 08:06:15 2010 From: mtang at stanford.edu (Mary Tang) Date: Tue, 12 Jan 2010 08:06:15 -0800 Subject: Fwd: SiO2 nanospheres In-Reply-To: <56cea79d1001111638x23e9aea6rc5612524000b5df2@mail.gmail.com> References: <56cea79d1001111630me8130a2i21a988f54a8c7b2@mail.gmail.com> <56cea79d1001111638x23e9aea6rc5612524000b5df2@mail.gmail.com> Message-ID: <4B4C9DF7.3010605@stanford.edu> Hi Carter --- Sorry about that. To cut down on spam to SpecMat at snf, mail is accepted only from registered addresses -- so I believe it only from your coral login at snf or the address you forward to from the SNF computer are considered legitimate addresses. If you email from anywhere else, it may be rejected. You can talk to Maureen about setting up your forwarding email appropriately. As for your SpecMat request, I'm afraid we do not allow silica microspheres to be spun up at the headway2 station. Nanoparticle solutions have a tendency to aerosolize and then fly all over the place -- and almost permanently stick to surfaces (benchtop, shields, cassettes, wafers). We do allow latex particles at this station because these are no worse than resist -- they will come off in sulfuric clean or plasma ashing and so are not likely to cause lasting damage to other people's work. However, metal, semiconducting, silica nanoparticles and nanotubes in solution can potentially do serious damage to others' work. If you are templating with silica nanospheres, spin coating will result in only limited local self-assembly. You will need to make sure your nanospheres are ionized/charged and diluted in nanopure water. If you need self-assembly over the whole wafer, you might consider talking with Chingmei Hsu in Yi Cui's lab, as she uses a Langmuir-Blodgett trough to do whole wafers. Alternatively, you might consider spin-coating latex spheres instead --- depending on your depth of etch, the selectivity of resist to silicon is typically around 4:1 and can yield nicely vertical pillars. Usha Raghuram and Mingliang Zhang have done some characterization, I believe. Lastly, we did have another spin coater located outside the lab for spinning solutions of nanoparticles (like silica) other than latex. However, this died just before shutdown and we haven't yet tried to repair or replace it. We will, but it may be some weeks before it is available again. Mary Carter Lin wrote: > Hi Mary, > > I was trying to send the following email to specMat but was > unsuccessful. Can you please tell me who will take care of my material > request? > > Thank you > Carter > > ---------- Forwarded message ---------- > From: Carter Lin > Date: Mon, Jan 11, 2010 at 4:30 PM > Subject: SiO2 nanospheres > To: SpecMat at snf.stanford.edu > > > Hi, SNF specMat staff, I'd like to bring the following chemicals into > our cleanroom please. > > Name: Carter Lin > Coral login: carterlin > Phone: 617-259-7988 > Email: carterlin at stanford.edu > PI: Bianxiao Cui, Chemistry department > > Chemicals: > * SiO2 silica nanospheres 250nm diameter in water > * SiO2 silica nanospheres 400nm diameter in water > * SiO2 silica nanospheres 550nm diameter in water > > Vendor: > 3590 Route 9, Suite 107 > Cold Spring, NY 10516 > USA > Phone: 1-845-208-7027 > > Reason for request: > To use the nanosphere as etch mask for Si wafers > > Process Flow: > The nanosphere solution will be spincoated onto Si wafers in the > headway station, then the Si substrate will be etched in lampoly. The > nanosphere mask is then removed by HF. > > Amount and form > All three type of nanospheres are in liquid form, each is 10ml. > > Storage: > I will be storing my materials in SNF. > > Disposal: > The nanosphere mask will be removed by HF. > > Thank you > Carter > > -- > Ziliang Lin / Carter Lin > Applied Physics, Stanford University > > > > -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From edmyers at stanford.edu Wed Jan 13 13:31:37 2010 From: edmyers at stanford.edu (Ed Myers) Date: Wed, 13 Jan 2010 13:31:37 -0800 Subject: FW: Gold Message-ID: <6.2.5.6.2.20100113132934.0504fd00@stanford.edu> All, Here is a request from an anxious prospective lab member to convert one of our doped poly furnaces to gold contaminated. They are under a SBIR deadline, so they are anxious to have a resolution. Ed >x-cr-puzzleid: {028F3430-F240-4D74-87CE-CA49A4A1876C} >x-cr-hashedpuzzle: AUex AzNj BTV9 ED3A ESpk FqN2 GbDh HjbJ HmqB Hx/A >IRYW IVcD I+Hu JBjW Kkrg >L6h2;1;ZQBkAG0AeQBlAHIAcwBAAHMAdABhAG4AZgBvAHIAZAAuAGUAZAB1AA==;Sosha1_v1;7;{028F3430-F240-4D74-87CE-CA49A4A1876C};dABoAHUAbABhAHMAaQBkAGgAYQByAGEAbgAuAGcAYQBuAGQAaABpAEAAZAB4AHIAYQB5AC4AYwBvAG0A;Wed, >13 Jan 2010 21:22:48 GMT;RgBXADoAIABHAG8AbABkAA== >Subject: FW: Gold >Date: Wed, 13 Jan 2010 13:22:48 -0800 >X-MS-Has-Attach: yes >X-MS-TNEF-Correlator: >Thread-Topic: Gold >Thread-Index: AcqTCLmLOumGV0zxQ22RekcwmIFejAAAPdLQAGMrzvA= >From: "Thulasidharan Gandhi" >To: "Ed Myers" > >Dear Ed, > >This is the package which I sent to specmat group. Can you let me know >if you need anything else. > >Thanks > >Thulasi Gandhi > > > >To SpecMat Committee: > >We would like to grow Si nanowires using a template process using >Stanford Nanofabrication facility. The template which we will be using >is nanoporous alumina template with few nanometers of gold >electrodeposited into the pores which will act as a catalyst for growth >of Si nanowires. Since gold is a contamination I would like to request >you permission to assign a poly furnace for growth of Si nanowires under >the gold contamination equipment set. I have attached a paper which >shows the growth process of Si nanowires using a template process using >gold as a catalyst. If you need any other information, I will be ready >to provide you. > >Thanks > >Thulasi Gandhi > >1) Contact Information: > >DxRay Inc >19355 Business Center Drive, Suite 10, Northridge, CA-91324 Contact >Person: Thulasi Gandhi Ph no: 8182800177 ext107 email:tgandhi at dxray.com > >2)Material: The Material which we are proposing to use is gold. > >3)Process: The process which we will be developing is CVD growth of Si >nanowires onto a nanoporus alumina template using gold as a catalyst. > >4)Quantity: The substrate size is around 1/2" in diameter > >5)Storage: There won't be any storage of the substrates at SNF. > >6)Disposal: There won't be any disposal of the substrates at SNF. > > > >-----Original Message----- >From: Ed Myers [mailto:edmyers at stanford.edu] >Sent: Monday, January 11, 2010 1:55 PM >To: Thulasidharan Gandhi >Subject: RE: Visit to See Silane Setup on 01/06/09 > >Thulasi Gandhi, > >The link is a couple of pages deeper > >http://snf.stanford.edu/Materials/NewMatProc.html > >Ed > >At 01:50 PM 1/11/2010, you wrote: > >Dear Ed, > > > >I checked for the paperwork at the spectmat group, but could not find > >one. Should I send an email and request them? We want to make sure we > >get an approval from them before signing in for the training and making > > >a open purchase order for using the facility. Can you guide me through > >on this. > > > >Thanks > > > >Thulasi Gandhi > > > >-----Original Message----- > >From: Ed Myers [mailto:edmyers at stanford.edu] > >Sent: Monday, January 11, 2010 1:21 PM > >To: Thulasidharan Gandhi > >Cc: specmat at snf.stanford.edu; maurice stevens > >Subject: RE: Visit to See Silane Setup on 01/06/09 > > > >Thulasi Gandhi, > > > >Yes, we have a poly-silicon furnace plumbed with both dopants. Right > >now it is for clean samples, where your sample would be considered gold > > >contaminated. I have copied the specmat group which is responsible for > > >any changes to our cleanliness or contamination levels. To run what > >you ask, does require this group to assign a poly furnace to the gold > >contaminated equipment set. If you want to make this change, you will > >need to fill out the paperwork starting at > >http://snf.stanford.edu/Materials/Materials.html > > > >Also, there will be a memory effect as you switch dopant gases. This > >should be factored in to your process planning. If you don't remove or > > >seal the dopants, you will get a lot of compensated doping and not > >sharp dopant transitions. > > > >Regards, > >Ed > > > > > >At 11:01 AM 1/11/2010, Thulasidharan Gandhi wrote: > > >Dear Ed Myers, > > > > > >It was nice meeting you the other day and knowing about the research > > >capabilities you have. We have one final question before we go ahead > > >with the application for training and using your facility. > > > > > >This is what we are planning to do: We are planning to grow Si > >nanowires > > >onto alumina template. > > > > > >We will have gold deposited into the alumina template and grow the Si > > > >nanowires using silane at around 500C. In the growth of Si nanowires > > >we want to dope phosphor and boron alternatively to grow PN Si >nanowires. > > >The other day you told us that your system is capable of doping > >phosphor > > >and boron. We want to once again make sure whether it can be done by > > >switching the gas supply. > > > > > >Thanks > > > > > >Thulasi Gandhi > > > > > >-----Original Message----- > > >From: Ed Myers [mailto:edmyers at stanford.edu] > > >Sent: Wednesday, January 06, 2010 7:43 AM > > >To: Thulasidharan Gandhi > > >Subject: RE: Visit to See Silane Setup on 01/06/09 > > > > > >Thulasi Gandhi, > > > > > >Yes, I do have to make a change. Last night I was not by my calendar > > > >and I forgot about a 1:30-3pm training I have to provide today. Can > > >we meet after 3pm? > > > > > >Regards, > > >Ed > > > > > > > > >At 07:47 PM 1/5/2010, you wrote: > > > >Dear Ed Myers, > > > > > > > >Thats ok. I am not sure whether we can make it before 10 am. So i > > > >think 1-3 pm should be ok with us. I will meet you tomorrow at 1pm. > > > >Let me know if there is any changes. > > > > > > > >Thanks > > > > > > > >Thulasi Gandhi > > > > > > > > > > > >---------- > > > >From: Ed Myers [mailto:edmyers at stanford.edu] > > > >Sent: Tue 1/5/2010 7:12 PM > > > >To: Thulasidharan Gandhi > > > >Subject: Re: Visit to See Silane Setup on 01/06/09 > > > > > > > >Thulasi Gandhi, > > > > > > > >I found out late today, I have to participate in a phone conference > > > > >at 11am on Wednesday. On Wednesday, I have time before 10am or > > > >between 1-3pm. Sorry for the late change, but please let me know > > > >if either of these times will work for you. > > > > > > > >Regards, > > > >Ed > > > > > > > > > > > >At 02:51 PM 1/4/2010, you wrote: > > > > >Dear Edward Myers, > > > > > > > > > >I just spoke to you over the phone about visiting your lab on > > > > >Wednesday (01/06/09) at 11am. You can email me back the >directions. > > > > > > > > > >Thanks for your help. > > > > > > > > > >Regards, > > > > > > > > > >Thulasi Gandhi > > > > > > > -------------- next part -------------- A non-text attachment was scrubbed... Name: Gold-Si-AAO.pdf Type: application/pdf Size: 344817 bytes Desc: not available URL: From mtang at stanford.edu Wed Jan 13 16:49:24 2010 From: mtang at stanford.edu (Mary Tang) Date: Wed, 13 Jan 2010 16:49:24 -0800 Subject: FW: Gold In-Reply-To: <6.2.5.6.2.20100113132934.0504fd00@stanford.edu> References: <6.2.5.6.2.20100113132934.0504fd00@stanford.edu> Message-ID: <4B4E6A14.4000604@stanford.edu> Hey Ed -- Good test case. We've talked about this for long enough. I suggest we approve one of our furnaces for this purpose, with a few, key caveats. Thermcopoly1? We'll need to inform the few people who use this system. Caveats might be: - substrates with noble metals allowed - no substrates containing materials that will react at process temperatures with Cl- Alternatively, we can start conservatively and define "trace" metals at concentrations typical for catalytic nanowire growth. Trace metals we've seen (that I know of) for nanowires include iron and silver -- I think there are concerns about the volatility of iron chlorides at thermal oxidation temperatures, but don't know about poly LPCVD temperatures. So, I don't know if we want to be more specific about what acceptable "trace" metals are. Trace noble metals only? I don't know, I think I favor allowing noble metals. Should we be concerned if the nanoporous alumina substrate has any other major components other than alumina? Mary Ed Myers wrote: > All, > > Here is a request from an anxious prospective lab member to convert > one of our doped poly furnaces to gold contaminated. They are under a > SBIR deadline, so they are anxious to have a resolution. > > Ed > > >> x-cr-puzzleid: {028F3430-F240-4D74-87CE-CA49A4A1876C} >> x-cr-hashedpuzzle: AUex AzNj BTV9 ED3A ESpk FqN2 GbDh HjbJ HmqB Hx/A >> IRYW IVcD I+Hu JBjW Kkrg >> L6h2;1;ZQBkAG0AeQBlAHIAcwBAAHMAdABhAG4AZgBvAHIAZAAuAGUAZAB1AA==;Sosha1_v1;7;{028F3430-F240-4D74-87CE-CA49A4A1876C};dABoAHUAbABhAHMAaQBkAGgAYQByAGEAbgAuAGcAYQBuAGQAaABpAEAAZAB4AHIAYQB5AC4AYwBvAG0A;Wed, >> 13 Jan 2010 21:22:48 GMT;RgBXADoAIABHAG8AbABkAA== >> Subject: FW: Gold >> Date: Wed, 13 Jan 2010 13:22:48 -0800 >> X-MS-Has-Attach: yes >> X-MS-TNEF-Correlator: >> Thread-Topic: Gold >> Thread-Index: AcqTCLmLOumGV0zxQ22RekcwmIFejAAAPdLQAGMrzvA= >> From: "Thulasidharan Gandhi" >> To: "Ed Myers" >> >> Dear Ed, >> >> This is the package which I sent to specmat group. Can you let me know >> if you need anything else. >> >> Thanks >> >> Thulasi Gandhi >> >> >> >> To SpecMat Committee: >> >> We would like to grow Si nanowires using a template process using >> Stanford Nanofabrication facility. The template which we will be using >> is nanoporous alumina template with few nanometers of gold >> electrodeposited into the pores which will act as a catalyst for growth >> of Si nanowires. Since gold is a contamination I would like to request >> you permission to assign a poly furnace for growth of Si nanowires under >> the gold contamination equipment set. I have attached a paper which >> shows the growth process of Si nanowires using a template process using >> gold as a catalyst. If you need any other information, I will be ready >> to provide you. >> >> Thanks >> >> Thulasi Gandhi >> >> 1) Contact Information: >> >> DxRay Inc >> 19355 Business Center Drive, Suite 10, Northridge, CA-91324 Contact >> Person: Thulasi Gandhi Ph no: 8182800177 ext107 email:tgandhi at dxray.com >> >> 2)Material: The Material which we are proposing to use is gold. >> >> 3)Process: The process which we will be developing is CVD growth of Si >> nanowires onto a nanoporus alumina template using gold as a catalyst. >> >> 4)Quantity: The substrate size is around 1/2" in diameter >> >> 5)Storage: There won't be any storage of the substrates at SNF. >> >> 6)Disposal: There won't be any disposal of the substrates at SNF. >> >> >> >> -----Original Message----- >> From: Ed Myers [mailto:edmyers at stanford.edu] >> Sent: Monday, January 11, 2010 1:55 PM >> To: Thulasidharan Gandhi >> Subject: RE: Visit to See Silane Setup on 01/06/09 >> >> Thulasi Gandhi, >> >> The link is a couple of pages deeper >> >> http://snf.stanford.edu/Materials/NewMatProc.html >> >> Ed >> >> At 01:50 PM 1/11/2010, you wrote: >> >Dear Ed, >> > >> >I checked for the paperwork at the spectmat group, but could not find >> >one. Should I send an email and request them? We want to make sure we >> >get an approval from them before signing in for the training and making >> >> >a open purchase order for using the facility. Can you guide me through >> >on this. >> > >> >Thanks >> > >> >Thulasi Gandhi >> > >> >-----Original Message----- >> >From: Ed Myers [mailto:edmyers at stanford.edu] >> >Sent: Monday, January 11, 2010 1:21 PM >> >To: Thulasidharan Gandhi >> >Cc: specmat at snf.stanford.edu; maurice stevens >> >Subject: RE: Visit to See Silane Setup on 01/06/09 >> > >> >Thulasi Gandhi, >> > >> >Yes, we have a poly-silicon furnace plumbed with both dopants. Right >> >now it is for clean samples, where your sample would be considered gold >> >> >contaminated. I have copied the specmat group which is responsible for >> >> >any changes to our cleanliness or contamination levels. To run what >> >you ask, does require this group to assign a poly furnace to the gold >> >contaminated equipment set. If you want to make this change, you will >> >need to fill out the paperwork starting at >> >http://snf.stanford.edu/Materials/Materials.html >> > >> >Also, there will be a memory effect as you switch dopant gases. This >> >should be factored in to your process planning. If you don't remove or >> >> >seal the dopants, you will get a lot of compensated doping and not >> >sharp dopant transitions. >> > >> >Regards, >> >Ed >> > >> > >> >At 11:01 AM 1/11/2010, Thulasidharan Gandhi wrote: >> > >Dear Ed Myers, >> > > >> > >It was nice meeting you the other day and knowing about the research >> > >capabilities you have. We have one final question before we go ahead >> > >with the application for training and using your facility. >> > > >> > >This is what we are planning to do: We are planning to grow Si >> >nanowires >> > >onto alumina template. >> > > >> > >We will have gold deposited into the alumina template and grow the Si >> >> > >nanowires using silane at around 500C. In the growth of Si nanowires >> > >we want to dope phosphor and boron alternatively to grow PN Si >> nanowires. >> > >The other day you told us that your system is capable of doping >> >phosphor >> > >and boron. We want to once again make sure whether it can be done by >> > >switching the gas supply. >> > > >> > >Thanks >> > > >> > >Thulasi Gandhi >> > > >> > >-----Original Message----- >> > >From: Ed Myers [mailto:edmyers at stanford.edu] >> > >Sent: Wednesday, January 06, 2010 7:43 AM >> > >To: Thulasidharan Gandhi >> > >Subject: RE: Visit to See Silane Setup on 01/06/09 >> > > >> > >Thulasi Gandhi, >> > > >> > >Yes, I do have to make a change. Last night I was not by my calendar >> >> > >and I forgot about a 1:30-3pm training I have to provide today. Can >> > >we meet after 3pm? >> > > >> > >Regards, >> > >Ed >> > > >> > > >> > >At 07:47 PM 1/5/2010, you wrote: >> > > >Dear Ed Myers, >> > > > >> > > >Thats ok. I am not sure whether we can make it before 10 am. So i >> > > >think 1-3 pm should be ok with us. I will meet you tomorrow at 1pm. >> > > >Let me know if there is any changes. >> > > > >> > > >Thanks >> > > > >> > > >Thulasi Gandhi >> > > > >> > > > >> > > >---------- >> > > >From: Ed Myers [mailto:edmyers at stanford.edu] >> > > >Sent: Tue 1/5/2010 7:12 PM >> > > >To: Thulasidharan Gandhi >> > > >Subject: Re: Visit to See Silane Setup on 01/06/09 >> > > > >> > > >Thulasi Gandhi, >> > > > >> > > >I found out late today, I have to participate in a phone conference >> >> > > >at 11am on Wednesday. On Wednesday, I have time before 10am or >> > > >between 1-3pm. Sorry for the late change, but please let me know >> > > >if either of these times will work for you. >> > > > >> > > >Regards, >> > > >Ed >> > > > >> > > > >> > > >At 02:51 PM 1/4/2010, you wrote: >> > > > >Dear Edward Myers, >> > > > > >> > > > >I just spoke to you over the phone about visiting your lab on >> > > > >Wednesday (01/06/09) at 11am. You can email me back the >> directions. >> > > > > >> > > > >Thanks for your help. >> > > > > >> > > > >Regards, >> > > > > >> > > > >Thulasi Gandhi >> > > > >> >> >> -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From roberth at quswami.com Thu Jan 14 08:23:14 2010 From: roberth at quswami.com (Robert Huang) Date: Thu, 14 Jan 2010 08:23:14 -0800 Subject: processing of Ti foil in SNF... References: <3F24868DDBDC7B46B2289E33B58C4CB11F6F91A1AA@QUSWAMI-DSRV1.quswami.local> <3F24868DDBDC7B46B2289E33B58C4CB11F6F91A1AC@QUSWAMI-DSRV1.quswami.local> <6.2.5.6.2.20091215145331.04b81a70@stanford.edu> Message-ID: <3F24868DDBDC7B46B2289E33B58C4CB11F807ABB4D@QUSWAMI-DSRV1.quswami.local> Hi Ed, There is one additional tool that we'd like to process the 99.99+% purity Ti foils on: Wbsolvent - for an acetone/IPA clean I'm assuming this is also OK, but please confirm. Regards, Robert -----Original Message----- From: Robert Huang Sent: Wednesday, December 16, 2009 8:54 AM To: 'Ed Myers'; specmat at snf.stanford.edu Subject: RE: final correction...RE: processing of Ti foil in SNF? Hi Ed, Thanks for the reply. We expect the anneal condition to be between 400C and 600C for several hours. Regards, Robert -----Original Message----- From: Ed Myers [mailto:edmyers at stanford.edu] Sent: Tuesday, December 15, 2009 2:55 PM To: Robert Huang; specmat at snf.stanford.edu Subject: Re: final correction...RE: processing of Ti foil in SNF? Robert, My concern is your anneal temperature. Ti can oxidize extremely fast and the atmospheric tubes will have a background of oxygen. I don't see a problem with what you have proposed depending on your anneal, which you have not outlined. Regards, Ed At 09:11 AM 12/15/2009, Robert Huang wrote: >OK, I think I will get it right this time - for all 3 units: > >0.25mm=250um (not nm!)=10mils > >Sorry for the confusion and multiple emails. > >Robert > >From: Robert Huang >Sent: Tuesday, December 15, 2009 9:05 AM >To: Robert Huang; specmat at snf.stanford.edu >Subject: RE: processing of Ti foil in SNF? > >Hi there, > >Just one correction to my email, the thickness >of the material is 10mils, not 1mil (the >dimensions I gave of 0.25mm and 250nm are correct). > >Thanks. > >Robert > >From: Robert Huang >Sent: Monday, December 14, 2009 11:32 AM >To: specmat at snf.stanford.edu >Subject: processing of Ti foil in SNF? > >SNF Specmat Committee: > >I am interested in processing pieces of Ti foil >in SNF on the following pieces of equipment: > >1) Wbgeneral for cleaning/rinsing >2) Innotec for a metal deposition >3) Tylan 4 (metal-contaminated) for an anneal > >The sample size will be <2"x2" (that's currently >the total sample size that I will have) and the >thickness is 0.25mm (250nm/1mil) . The source >for the material will be Alfa Aesar, and it is >99.99+% purity. Here is Alfa Aesar's website >for this material, and I am attaching their MSDS. > >http://www.alfa.com/en/GP100w.pgm?DSSTK=013975 > >Thanks in advance for taking this into >consideration. I am hoping this is >straightforward and can be approved quickly >given Ti is already a material commonly used >throughout SNF, this material is 99.99+% pure >Ti, and the tools that I plan to use are all in >the Au-contaminated category. If any questions, >don't hesitate to contact me either by email or >phone, roberth at quswami.com, 408-854-0450. > >Regards, > >Robert Huang From edmyers at stanford.edu Thu Jan 14 08:42:05 2010 From: edmyers at stanford.edu (Ed Myers) Date: Thu, 14 Jan 2010 08:42:05 -0800 Subject: Fwd: Re: Fwd: GeTe Inquiry Message-ID: <6.2.5.6.2.20100114084156.04f689e8@stanford.edu> > >Sender: marissa.caldwell at gmail.com >From: Marissa Anne Caldwell >Date: Thu, 14 Jan 2010 08:35:53 -0800 >X-Google-Sender-Auth: 1eeb5437e0f78056 >Subject: Re: Fwd: GeTe Inquiry >To: Ed Myers > >Hi Ed, >Could you please let me know approximately when the specmat committee >is scheduled to meet again? I am waiting to hear back in order to >continue my experiments. > >Thanks, >~Marissa > >On Mon, Jan 11, 2010 at 10:08 AM, Marissa Anne Caldwell > wrote: > > Hi Ed, > > Just following up on this specmat request. When can I expect to hear back? > > > > Thanks and hope you had a nice holiday. > > ~Marissa > > > > On Mon, Dec 7, 2009 at 4:40 PM, Marissa Anne Caldwell > > wrote: > >> Hi Ed, > >> Apologies, the details were deeper in the email thread. Here they are: > >> Tools needed: Karlsuss, Headway, innotec > >> > >> Process flow: > >> 1) Spin on standard shipley photoresist (PR) using headway > >> 2) Align/expose mask using Karlsuss > >> 3) Develop PR at wbmisc (next to headway) > >> 4) Deposit Au using innotec > >> > >> For your information: The GeTe will be used in the form of > >> nanoparticle films. I make GeTe nanoparticles off-site and deposit > >> them on substrates in films. The GeTe nanoparticles would be > >> deposited onto substrates outside of SNF and would only be used as > >> pre-deposited (i.e. supported) films in SNF. There would be no > >> handling of unsupported (free) nanoparticles at any time during the > >> work in the SNF. > >> > >> I really appreciate your quick response and help. Please let me know > >> what else I can do to continue this process. Will you forward the > >> email onto specmat, or is there a different email I should use to > >> contact them? > >> > >> Thanks! > >> ~Marissa > >> > >> On Mon, Dec 7, 2009 at 4:19 PM, Ed Myers wrote: > >>> Marissa, > >>> > >>> Equally important as the MSDS is the process flow of the material through > >>> the fab and what tools you plan on using. Specmat will also want to see > >>> this type of information. > >>> > >>> Regards, > >>> Ed > >>> > >>> At 02:41 PM 12/7/2009, you wrote: > >>>> > >>>> Hi Mr. Meyers, > >>>> I had tried to email this to the specmat committee, but I keep getting > >>>> an error of a permanent failure and the message bounced back to me. > >>>> Can you please let me know who I should send my inquiry to? I found > >>>> your name on the organizational chart under "new materials". > >>>> > >>>> Thanks in advance for your help. > >>>> > >>>> ~Marissa > >>>> > >>>> > >>>> ---------- Forwarded message ---------- > >>>> From: Marissa Anne Caldwell > >>>> Date: Mon, Dec 7, 2009 at 2:37 PM > >>>> Subject: GeTe Inquiry > >>>> To: specmat > >>>> > >>>> > >>>> Hi, > >>>> I would like to bring in some films of GeTe nanoparticles to be > >>>> processed in SNF. I believe another user (aaron gibby) has already > >>>> worked with GeTe in the lab. I would be using the litho tools > >>>> (headway, Karlsuss), wbgeneral and the aja sputter tool. See > >>>> attached for a MSDS of GeTe (the nanoparticles are synthesized by > >>>> myself, so do not have a MSDS of them specifically). The GeTe > >>>> nanoparticles would be > >>>> deposited onto substrates outside of SNF and would only be used as > >>>> pre-deposited (i.e. supported) films in SNF. There would be no > >>>> handling of unsupported (free) nanoparticles at any time during the > >>>> work in the SNF. Is there any way I can see if there is already an > >>>> approved request for GeTe? Any help and guidance would be > >>>> appreciated. > >>>> > >>>> Thanks and I look forward to your response. > >>>> ~Marissa Caldwell > >>>> macaldwe at stanford.edu > >>>> Coral login: macaldwe > >>>> Advisor: Prof. H.-S. Philip Wong > >>>> > >>>> Content-Type: application/pdf; name="GeTe MSDS.pdf" > >>>> Content-Disposition: attachment; filename="GeTe MSDS.pdf" > >>>> X-Attachment-Id: f_g2xtpgel0 > >>> > >>> > >>> > >> > > From mtang at stanford.edu Thu Jan 14 09:16:04 2010 From: mtang at stanford.edu (Mary Tang) Date: Thu, 14 Jan 2010 09:16:04 -0800 Subject: Fwd: Re: Fwd: GeTe Inquiry In-Reply-To: <6.2.5.6.2.20100114084156.04f689e8@stanford.edu> References: <6.2.5.6.2.20100114084156.04f689e8@stanford.edu> Message-ID: <4B4F5154.2040003@stanford.edu> Hey Ed et al --- This looks pretty straightforward to me and I'd vote to go ahead and approve it. By the way, the nanoparticle spin coater (Paul Jerabek's old Laurell) that we placed in the wafersaw room solvent hood died just before shutdown. It looks like the brush motor has no brushes. I've been looking at simple tabletop systems -- it looks like we can get one for a little over $4K for a 100 mm system (and around $5K for a system that goes up to 8".) The nice thing about them is the low profile and that the bowl can be easily lined. (I'll look around some more, but believe these are all pretty much the same rebranded item.) Mary Ed Myers wrote: > >> >> Sender: marissa.caldwell at gmail.com >> From: Marissa Anne Caldwell >> Date: Thu, 14 Jan 2010 08:35:53 -0800 >> X-Google-Sender-Auth: 1eeb5437e0f78056 >> Subject: Re: Fwd: GeTe Inquiry >> To: Ed Myers >> >> Hi Ed, >> Could you please let me know approximately when the specmat committee >> is scheduled to meet again? I am waiting to hear back in order to >> continue my experiments. >> >> Thanks, >> ~Marissa >> >> On Mon, Jan 11, 2010 at 10:08 AM, Marissa Anne Caldwell >> wrote: >> > Hi Ed, >> > Just following up on this specmat request. When can I expect to >> hear back? >> > >> > Thanks and hope you had a nice holiday. >> > ~Marissa >> > >> > On Mon, Dec 7, 2009 at 4:40 PM, Marissa Anne Caldwell >> > wrote: >> >> Hi Ed, >> >> Apologies, the details were deeper in the email thread. Here they >> are: >> >> Tools needed: Karlsuss, Headway, innotec >> >> >> >> Process flow: >> >> 1) Spin on standard shipley photoresist (PR) using headway >> >> 2) Align/expose mask using Karlsuss >> >> 3) Develop PR at wbmisc (next to headway) >> >> 4) Deposit Au using innotec >> >> >> >> For your information: The GeTe will be used in the form of >> >> nanoparticle films. I make GeTe nanoparticles off-site and deposit >> >> them on substrates in films. The GeTe nanoparticles would be >> >> deposited onto substrates outside of SNF and would only be used as >> >> pre-deposited (i.e. supported) films in SNF. There would be no >> >> handling of unsupported (free) nanoparticles at any time during the >> >> work in the SNF. >> >> >> >> I really appreciate your quick response and help. Please let me know >> >> what else I can do to continue this process. Will you forward the >> >> email onto specmat, or is there a different email I should use to >> >> contact them? >> >> >> >> Thanks! >> >> ~Marissa >> >> >> >> On Mon, Dec 7, 2009 at 4:19 PM, Ed Myers >> wrote: >> >>> Marissa, >> >>> >> >>> Equally important as the MSDS is the process flow of the material >> through >> >>> the fab and what tools you plan on using. Specmat will also want >> to see >> >>> this type of information. >> >>> >> >>> Regards, >> >>> Ed >> >>> >> >>> At 02:41 PM 12/7/2009, you wrote: >> >>>> >> >>>> Hi Mr. Meyers, >> >>>> I had tried to email this to the specmat committee, but I keep >> getting >> >>>> an error of a permanent failure and the message bounced back to me. >> >>>> Can you please let me know who I should send my inquiry to? I found >> >>>> your name on the organizational chart under "new materials". >> >>>> >> >>>> Thanks in advance for your help. >> >>>> >> >>>> ~Marissa >> >>>> >> >>>> >> >>>> ---------- Forwarded message ---------- >> >>>> From: Marissa Anne Caldwell >> >>>> Date: Mon, Dec 7, 2009 at 2:37 PM >> >>>> Subject: GeTe Inquiry >> >>>> To: specmat >> >>>> >> >>>> >> >>>> Hi, >> >>>> I would like to bring in some films of GeTe nanoparticles to be >> >>>> processed in SNF. I believe another user (aaron gibby) has already >> >>>> worked with GeTe in the lab. I would be using the litho tools >> >>>> (headway, Karlsuss), wbgeneral and the aja sputter tool. See >> >>>> attached for a MSDS of GeTe (the nanoparticles are synthesized by >> >>>> myself, so do not have a MSDS of them specifically). The GeTe >> >>>> nanoparticles would be >> >>>> deposited onto substrates outside of SNF and would only be used as >> >>>> pre-deposited (i.e. supported) films in SNF. There would be no >> >>>> handling of unsupported (free) nanoparticles at any time during the >> >>>> work in the SNF. Is there any way I can see if there is already an >> >>>> approved request for GeTe? Any help and guidance would be >> >>>> appreciated. >> >>>> >> >>>> Thanks and I look forward to your response. >> >>>> ~Marissa Caldwell >> >>>> macaldwe at stanford.edu >> >>>> Coral login: macaldwe >> >>>> Advisor: Prof. H.-S. Philip Wong >> >>>> >> >>>> Content-Type: application/pdf; name="GeTe MSDS.pdf" >> >>>> Content-Disposition: attachment; filename="GeTe MSDS.pdf" >> >>>> X-Attachment-Id: f_g2xtpgel0 >> >>> >> >>> >> >>> >> >> >> > > > -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From mtang at stanford.edu Thu Jan 14 09:20:02 2010 From: mtang at stanford.edu (Mary Tang) Date: Thu, 14 Jan 2010 09:20:02 -0800 Subject: processing of Ti foil in SNF... In-Reply-To: <3F24868DDBDC7B46B2289E33B58C4CB11F807ABB4D@QUSWAMI-DSRV1.quswami.local> References: <3F24868DDBDC7B46B2289E33B58C4CB11F6F91A1AA@QUSWAMI-DSRV1.quswami.local> <3F24868DDBDC7B46B2289E33B58C4CB11F6F91A1AC@QUSWAMI-DSRV1.quswami.local> <6.2.5.6.2.20091215145331.04b81a70@stanford.edu> <3F24868DDBDC7B46B2289E33B58C4CB11F807ABB4D@QUSWAMI-DSRV1.quswami.local> Message-ID: <4B4F5242.8010701@stanford.edu> Hi Robert -- wbsolvent for Acetone/IPA of Ti foils is no problem. I may have missed something in the email exchange, but was wondering whether it might be better to anneal in fga2 (gold contaminated) than in tylan4 -- the temperature control in this range is better and the forming gas ambient might have less oxygen. Mary Robert Huang wrote: > Hi Ed, > > There is one additional tool that we'd like to process the 99.99+% purity Ti foils on: > > Wbsolvent - for an acetone/IPA clean > > I'm assuming this is also OK, but please confirm. > > Regards, > > Robert > > -----Original Message----- > From: Robert Huang > Sent: Wednesday, December 16, 2009 8:54 AM > To: 'Ed Myers'; specmat at snf.stanford.edu > Subject: RE: final correction...RE: processing of Ti foil in SNF? > > Hi Ed, > > Thanks for the reply. We expect the anneal condition to be between 400C and 600C for several hours. > > Regards, > > Robert > > -----Original Message----- > From: Ed Myers [mailto:edmyers at stanford.edu] > Sent: Tuesday, December 15, 2009 2:55 PM > To: Robert Huang; specmat at snf.stanford.edu > Subject: Re: final correction...RE: processing of Ti foil in SNF? > > Robert, > > My concern is your anneal temperature. Ti can > oxidize extremely fast and the atmospheric tubes > will have a background of oxygen. I don't see a > problem with what you have proposed depending on > your anneal, which you have not outlined. > > Regards, > Ed > > At 09:11 AM 12/15/2009, Robert Huang wrote: > >> OK, I think I will get it right this time - for all 3 units: >> >> 0.25mm=250um (not nm!)=10mils >> >> Sorry for the confusion and multiple emails. >> >> Robert >> >> From: Robert Huang >> Sent: Tuesday, December 15, 2009 9:05 AM >> To: Robert Huang; specmat at snf.stanford.edu >> Subject: RE: processing of Ti foil in SNF? >> >> Hi there, >> >> Just one correction to my email, the thickness >> of the material is 10mils, not 1mil (the >> dimensions I gave of 0.25mm and 250nm are correct). >> >> Thanks. >> >> Robert >> >> From: Robert Huang >> Sent: Monday, December 14, 2009 11:32 AM >> To: specmat at snf.stanford.edu >> Subject: processing of Ti foil in SNF? >> >> SNF Specmat Committee: >> >> I am interested in processing pieces of Ti foil >> in SNF on the following pieces of equipment: >> >> 1) Wbgeneral for cleaning/rinsing >> 2) Innotec for a metal deposition >> 3) Tylan 4 (metal-contaminated) for an anneal >> >> The sample size will be <2"x2" (that's currently >> the total sample size that I will have) and the >> thickness is 0.25mm (250nm/1mil) . The source >> for the material will be Alfa Aesar, and it is >> 99.99+% purity. Here is Alfa Aesar's website >> for this material, and I am attaching their MSDS. >> >> http://www.alfa.com/en/GP100w.pgm?DSSTK=013975 >> >> Thanks in advance for taking this into >> consideration. I am hoping this is >> straightforward and can be approved quickly >> given Ti is already a material commonly used >> throughout SNF, this material is 99.99+% pure >> Ti, and the tools that I plan to use are all in >> the Au-contaminated category. If any questions, >> don't hesitate to contact me either by email or >> phone, roberth at quswami.com, 408-854-0450. >> >> Regards, >> >> Robert Huang >> > > > -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From mtang at stanford.edu Thu Jan 14 10:12:36 2010 From: mtang at stanford.edu (Mary Tang) Date: Thu, 14 Jan 2010 10:12:36 -0800 Subject: Alternative oxide etchant In-Reply-To: <495DF0BDB83345CC9628204A5B2C5E79@eadelld430> References: <495DF0BDB83345CC9628204A5B2C5E79@eadelld430> Message-ID: <4B4F5E94.1070009@stanford.edu> Hi Erhan -- Not that I know of nor can find in my records. But if you can provide an MSDS and let us know where you want to use this (wbgeneral, I presume?) we should be able to approve in short order, assuming that there are no unusual provisions required for handling or disposing of waste. Mary Erhan Ata wrote: > > > > Hi Mary, > > I was wondering whether any of the following chemicals was ever > qualified by SpecMat team. > We found these etchants quite compelling for our processes, and if > they are qualified by SNF already would be nice to know that we can do > some quick tests with them. If not, probably alternate labs will be > quicker. > > ** SACHEM SelectEtch^(TM)SE-1100 series (SE-1100, 1120, 1130, 1140) ** > http://www.sacheminc.com/industries/integrated-circuits/selectetch-selective-front-end-of-line-feol-oxide-etchants.html > > Happy new year. > > /Erhan Ata, > Fortemedia, Inc./ > > > -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From roberth at quswami.com Thu Jan 14 13:05:54 2010 From: roberth at quswami.com (Robert Huang) Date: Thu, 14 Jan 2010 13:05:54 -0800 Subject: processing of Ti foil in SNF... In-Reply-To: <4B4F5242.8010701@stanford.edu> References: <3F24868DDBDC7B46B2289E33B58C4CB11F6F91A1AA@QUSWAMI-DSRV1.quswami.local> <3F24868DDBDC7B46B2289E33B58C4CB11F6F91A1AC@QUSWAMI-DSRV1.quswami.local> <6.2.5.6.2.20091215145331.04b81a70@stanford.edu> <3F24868DDBDC7B46B2289E33B58C4CB11F807ABB4D@QUSWAMI-DSRV1.quswami.local> <4B4F5242.8010701@stanford.edu> Message-ID: <3F24868DDBDC7B46B2289E33B58C4CB11F807ABB52@QUSWAMI-DSRV1.quswami.local> Hi Mary, Thanks for your response. Tylan4 has been our baseline tool for anneals, so I'd prefer to continue to use it for this work as well. In addition, we are concerned about contamination from the furnace (primarily metals, but any material that could alter our device electrically), so I also prefer tylan4. Before our actual product runs, we always run a TCACLEAN. For processing of these Ti foils, if you like, I can also run TCACLEAN afterwards. Regards, Robert -----Original Message----- From: Mary Tang [mailto:mtang at stanford.edu] Sent: Thursday, January 14, 2010 9:20 AM To: Robert Huang Cc: Ed Myers; specmat at snf.stanford.edu; Nancy Latta Subject: Re: processing of Ti foil in SNF... Hi Robert -- wbsolvent for Acetone/IPA of Ti foils is no problem. I may have missed something in the email exchange, but was wondering whether it might be better to anneal in fga2 (gold contaminated) than in tylan4 -- the temperature control in this range is better and the forming gas ambient might have less oxygen. Mary Robert Huang wrote: > Hi Ed, > > There is one additional tool that we'd like to process the 99.99+% purity Ti foils on: > > Wbsolvent - for an acetone/IPA clean > > I'm assuming this is also OK, but please confirm. > > Regards, > > Robert > > -----Original Message----- > From: Robert Huang > Sent: Wednesday, December 16, 2009 8:54 AM > To: 'Ed Myers'; specmat at snf.stanford.edu > Subject: RE: final correction...RE: processing of Ti foil in SNF? > > Hi Ed, > > Thanks for the reply. We expect the anneal condition to be between 400C and 600C for several hours. > > Regards, > > Robert > > -----Original Message----- > From: Ed Myers [mailto:edmyers at stanford.edu] > Sent: Tuesday, December 15, 2009 2:55 PM > To: Robert Huang; specmat at snf.stanford.edu > Subject: Re: final correction...RE: processing of Ti foil in SNF? > > Robert, > > My concern is your anneal temperature. Ti can > oxidize extremely fast and the atmospheric tubes > will have a background of oxygen. I don't see a > problem with what you have proposed depending on > your anneal, which you have not outlined. > > Regards, > Ed > > At 09:11 AM 12/15/2009, Robert Huang wrote: > >> OK, I think I will get it right this time - for all 3 units: >> >> 0.25mm=250um (not nm!)=10mils >> >> Sorry for the confusion and multiple emails. >> >> Robert >> >> From: Robert Huang >> Sent: Tuesday, December 15, 2009 9:05 AM >> To: Robert Huang; specmat at snf.stanford.edu >> Subject: RE: processing of Ti foil in SNF? >> >> Hi there, >> >> Just one correction to my email, the thickness >> of the material is 10mils, not 1mil (the >> dimensions I gave of 0.25mm and 250nm are correct). >> >> Thanks. >> >> Robert >> >> From: Robert Huang >> Sent: Monday, December 14, 2009 11:32 AM >> To: specmat at snf.stanford.edu >> Subject: processing of Ti foil in SNF? >> >> SNF Specmat Committee: >> >> I am interested in processing pieces of Ti foil >> in SNF on the following pieces of equipment: >> >> 1) Wbgeneral for cleaning/rinsing >> 2) Innotec for a metal deposition >> 3) Tylan 4 (metal-contaminated) for an anneal >> >> The sample size will be <2"x2" (that's currently >> the total sample size that I will have) and the >> thickness is 0.25mm (250nm/1mil) . The source >> for the material will be Alfa Aesar, and it is >> 99.99+% purity. Here is Alfa Aesar's website >> for this material, and I am attaching their MSDS. >> >> http://www.alfa.com/en/GP100w.pgm?DSSTK=013975 >> >> Thanks in advance for taking this into >> consideration. I am hoping this is >> straightforward and can be approved quickly >> given Ti is already a material commonly used >> throughout SNF, this material is 99.99+% pure >> Ti, and the tools that I plan to use are all in >> the Au-contaminated category. If any questions, >> don't hesitate to contact me either by email or >> phone, roberth at quswami.com, 408-854-0450. >> >> Regards, >> >> Robert Huang >> > > > -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From mtang at stanford.edu Thu Jan 14 17:47:41 2010 From: mtang at stanford.edu (Mary Tang) Date: Thu, 14 Jan 2010 17:47:41 -0800 Subject: Fwd: Re: Fwd: GeTe Inquiry In-Reply-To: <6.2.5.6.2.20100114084156.04f689e8@stanford.edu> References: <6.2.5.6.2.20100114084156.04f689e8@stanford.edu> Message-ID: <4B4FC93D.7020502@stanford.edu> Hi all -- Marissa just asked about the status, so I said it was officially OK. Mary Ed Myers wrote: > >> >> Sender: marissa.caldwell at gmail.com >> From: Marissa Anne Caldwell >> Date: Thu, 14 Jan 2010 08:35:53 -0800 >> X-Google-Sender-Auth: 1eeb5437e0f78056 >> Subject: Re: Fwd: GeTe Inquiry >> To: Ed Myers >> >> Hi Ed, >> Could you please let me know approximately when the specmat committee >> is scheduled to meet again? I am waiting to hear back in order to >> continue my experiments. >> >> Thanks, >> ~Marissa >> >> On Mon, Jan 11, 2010 at 10:08 AM, Marissa Anne Caldwell >> wrote: >> > Hi Ed, >> > Just following up on this specmat request. When can I expect to >> hear back? >> > >> > Thanks and hope you had a nice holiday. >> > ~Marissa >> > >> > On Mon, Dec 7, 2009 at 4:40 PM, Marissa Anne Caldwell >> > wrote: >> >> Hi Ed, >> >> Apologies, the details were deeper in the email thread. Here they >> are: >> >> Tools needed: Karlsuss, Headway, innotec >> >> >> >> Process flow: >> >> 1) Spin on standard shipley photoresist (PR) using headway >> >> 2) Align/expose mask using Karlsuss >> >> 3) Develop PR at wbmisc (next to headway) >> >> 4) Deposit Au using innotec >> >> >> >> For your information: The GeTe will be used in the form of >> >> nanoparticle films. I make GeTe nanoparticles off-site and deposit >> >> them on substrates in films. The GeTe nanoparticles would be >> >> deposited onto substrates outside of SNF and would only be used as >> >> pre-deposited (i.e. supported) films in SNF. There would be no >> >> handling of unsupported (free) nanoparticles at any time during the >> >> work in the SNF. >> >> >> >> I really appreciate your quick response and help. Please let me know >> >> what else I can do to continue this process. Will you forward the >> >> email onto specmat, or is there a different email I should use to >> >> contact them? >> >> >> >> Thanks! >> >> ~Marissa >> >> >> >> On Mon, Dec 7, 2009 at 4:19 PM, Ed Myers >> wrote: >> >>> Marissa, >> >>> >> >>> Equally important as the MSDS is the process flow of the material >> through >> >>> the fab and what tools you plan on using. Specmat will also want >> to see >> >>> this type of information. >> >>> >> >>> Regards, >> >>> Ed >> >>> >> >>> At 02:41 PM 12/7/2009, you wrote: >> >>>> >> >>>> Hi Mr. Meyers, >> >>>> I had tried to email this to the specmat committee, but I keep >> getting >> >>>> an error of a permanent failure and the message bounced back to me. >> >>>> Can you please let me know who I should send my inquiry to? I found >> >>>> your name on the organizational chart under "new materials". >> >>>> >> >>>> Thanks in advance for your help. >> >>>> >> >>>> ~Marissa >> >>>> >> >>>> >> >>>> ---------- Forwarded message ---------- >> >>>> From: Marissa Anne Caldwell >> >>>> Date: Mon, Dec 7, 2009 at 2:37 PM >> >>>> Subject: GeTe Inquiry >> >>>> To: specmat >> >>>> >> >>>> >> >>>> Hi, >> >>>> I would like to bring in some films of GeTe nanoparticles to be >> >>>> processed in SNF. I believe another user (aaron gibby) has already >> >>>> worked with GeTe in the lab. I would be using the litho tools >> >>>> (headway, Karlsuss), wbgeneral and the aja sputter tool. See >> >>>> attached for a MSDS of GeTe (the nanoparticles are synthesized by >> >>>> myself, so do not have a MSDS of them specifically). The GeTe >> >>>> nanoparticles would be >> >>>> deposited onto substrates outside of SNF and would only be used as >> >>>> pre-deposited (i.e. supported) films in SNF. There would be no >> >>>> handling of unsupported (free) nanoparticles at any time during the >> >>>> work in the SNF. Is there any way I can see if there is already an >> >>>> approved request for GeTe? Any help and guidance would be >> >>>> appreciated. >> >>>> >> >>>> Thanks and I look forward to your response. >> >>>> ~Marissa Caldwell >> >>>> macaldwe at stanford.edu >> >>>> Coral login: macaldwe >> >>>> Advisor: Prof. H.-S. Philip Wong >> >>>> >> >>>> Content-Type: application/pdf; name="GeTe MSDS.pdf" >> >>>> Content-Disposition: attachment; filename="GeTe MSDS.pdf" >> >>>> X-Attachment-Id: f_g2xtpgel0 >> >>> >> >>> >> >>> >> >> >> > > > -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From edmyers at stanford.edu Fri Jan 15 13:28:09 2010 From: edmyers at stanford.edu (Ed Myers) Date: Fri, 15 Jan 2010 13:28:09 -0800 Subject: FW: Gold In-Reply-To: <4B4E6A14.4000604@stanford.edu> References: <6.2.5.6.2.20100113132934.0504fd00@stanford.edu> <4B4E6A14.4000604@stanford.edu> Message-ID: <6.2.5.6.2.20100115132723.04c4a2b0@stanford.edu> All, The potential lab member is anxious as they have a SBIR deadline. Ed Dear Ed, Wanted to follow up on the SPECMAT approval. Can you let me know a time frame by which we will know the approval. Thanks Thulasi At 04:49 PM 1/13/2010, Mary Tang wrote: >Hey Ed -- > > >Good test case. We've talked about this for long enough. I suggest >we approve one of our furnaces for this purpose, with a few, key caveats. >Thermcopoly1? We'll need to inform the few people who use this system. >Caveats might be: > >- substrates with noble metals allowed >- no substrates containing materials that will react at process >temperatures with Cl- > > >Alternatively, we can start conservatively and define "trace" metals >at concentrations typical for catalytic nanowire growth. Trace >metals we've seen (that I know of) for nanowires include iron and >silver -- I think there are concerns about the volatility of iron >chlorides at thermal oxidation temperatures, but don't know about >poly LPCVD temperatures. So, I don't know if we want to be more >specific about what acceptable "trace" metals are. Trace noble >metals only? I don't know, I think I favor allowing noble metals. > > >Should we be concerned if the nanoporous alumina substrate has any >other major components other than alumina? > > >Mary > > > > >Ed Myers wrote: >>All, >> >>Here is a request from an anxious prospective lab member to convert >>one of our doped poly furnaces to gold contaminated. They are >>under a SBIR deadline, so they are anxious to have a resolution. >> >>Ed >> >> >>>x-cr-puzzleid: {028F3430-F240-4D74-87CE-CA49A4A1876C} >>>x-cr-hashedpuzzle: AUex AzNj BTV9 ED3A ESpk FqN2 GbDh HjbJ HmqB >>>Hx/A IRYW IVcD I+Hu JBjW Kkrg >>>L6h2;1;ZQBkAG0AeQBlAHIAcwBAAHMAdABhAG4AZgBvAHIAZAAuAGUAZAB1AA==;Sosha1_v1;7;{028F3430-F240-4D74-87CE-CA49A4A1876C};dABoAHUAbABhAHMAaQBkAGgAYQByAGEAbgAuAGcAYQBuAGQAaABpAEAAZAB4AHIAYQB5AC4AYwBvAG0A;Wed, >>>13 Jan 2010 21:22:48 GMT;RgBXADoAIABHAG8AbABkAA== >>>Subject: FW: Gold >>>Date: Wed, 13 Jan 2010 13:22:48 -0800 >>>X-MS-Has-Attach: yes >>>X-MS-TNEF-Correlator: >>>Thread-Topic: Gold >>>Thread-Index: AcqTCLmLOumGV0zxQ22RekcwmIFejAAAPdLQAGMrzvA= >>>From: "Thulasidharan Gandhi" >>>To: "Ed Myers" >>> >>>Dear Ed, >>> >>>This is the package which I sent to specmat group. Can you let me know >>>if you need anything else. >>> >>>Thanks >>> >>>Thulasi Gandhi >>> >>> >>> >>>To SpecMat Committee: >>> >>>We would like to grow Si nanowires using a template process using >>>Stanford Nanofabrication facility. The template which we will be using >>>is nanoporous alumina template with few nanometers of gold >>>electrodeposited into the pores which will act as a catalyst for growth >>>of Si nanowires. Since gold is a contamination I would like to request >>>you permission to assign a poly furnace for growth of Si nanowires under >>>the gold contamination equipment set. I have attached a paper which >>>shows the growth process of Si nanowires using a template process using >>>gold as a catalyst. If you need any other information, I will be ready >>>to provide you. >>> >>>Thanks >>> >>>Thulasi Gandhi >>> >>>1) Contact Information: >>> >>>DxRay Inc >>>19355 Business Center Drive, Suite 10, Northridge, CA-91324 Contact >>>Person: Thulasi Gandhi Ph no: 8182800177 ext107 email:tgandhi at dxray.com >>> >>>2)Material: The Material which we are proposing to use is gold. >>> >>>3)Process: The process which we will be developing is CVD growth of Si >>>nanowires onto a nanoporus alumina template using gold as a catalyst. >>> >>>4)Quantity: The substrate size is around 1/2" in diameter >>> >>>5)Storage: There won't be any storage of the substrates at SNF. >>> >>>6)Disposal: There won't be any disposal of the substrates at SNF. >>> >>> >>> >>>-----Original Message----- >>>From: Ed Myers [mailto:edmyers at stanford.edu] >>>Sent: Monday, January 11, 2010 1:55 PM >>>To: Thulasidharan Gandhi >>>Subject: RE: Visit to See Silane Setup on 01/06/09 >>> >>>Thulasi Gandhi, >>> >>>The link is a couple of pages deeper >>> >>>http://snf.stanford.edu/Materials/NewMatProc.html >>> >>>Ed >>> >>>At 01:50 PM 1/11/2010, you wrote: >>> >Dear Ed, >>> > >>> >I checked for the paperwork at the spectmat group, but could not find >>> >one. Should I send an email and request them? We want to make sure we >>> >get an approval from them before signing in for the training and making >>> >>> >a open purchase order for using the facility. Can you guide me through >>> >on this. >>> > >>> >Thanks >>> > >>> >Thulasi Gandhi >>> > >>> >-----Original Message----- >>> >From: Ed Myers [mailto:edmyers at stanford.edu] >>> >Sent: Monday, January 11, 2010 1:21 PM >>> >To: Thulasidharan Gandhi >>> >Cc: specmat at snf.stanford.edu; maurice stevens >>> >Subject: RE: Visit to See Silane Setup on 01/06/09 >>> > >>> >Thulasi Gandhi, >>> > >>> >Yes, we have a poly-silicon furnace plumbed with both dopants. Right >>> >now it is for clean samples, where your sample would be considered gold >>> >>> >contaminated. I have copied the specmat group which is responsible for >>> >>> >any changes to our cleanliness or contamination levels. To run what >>> >you ask, does require this group to assign a poly furnace to the gold >>> >contaminated equipment set. If you want to make this change, you will >>> >need to fill out the paperwork starting at >>> >http://snf.stanford.edu/Materials/Materials.html >>> > >>> >Also, there will be a memory effect as you switch dopant gases. This >>> >should be factored in to your process planning. If you don't remove or >>> >>> >seal the dopants, you will get a lot of compensated doping and not >>> >sharp dopant transitions. >>> > >>> >Regards, >>> >Ed >>> > >>> > >>> >At 11:01 AM 1/11/2010, Thulasidharan Gandhi wrote: >>> > >Dear Ed Myers, >>> > > >>> > >It was nice meeting you the other day and knowing about the research >>> > >capabilities you have. We have one final question before we go ahead >>> > >with the application for training and using your facility. >>> > > >>> > >This is what we are planning to do: We are planning to grow Si >>> >nanowires >>> > >onto alumina template. >>> > > >>> > >We will have gold deposited into the alumina template and grow the Si >>> >>> > >nanowires using silane at around 500C. In the growth of Si nanowires >>> > >we want to dope phosphor and boron alternatively to grow PN Si >>>nanowires. >>> > >The other day you told us that your system is capable of doping >>> >phosphor >>> > >and boron. We want to once again make sure whether it can be done by >>> > >switching the gas supply. >>> > > >>> > >Thanks >>> > > >>> > >Thulasi Gandhi >>> > > >>> > >-----Original Message----- >>> > >From: Ed Myers [mailto:edmyers at stanford.edu] >>> > >Sent: Wednesday, January 06, 2010 7:43 AM >>> > >To: Thulasidharan Gandhi >>> > >Subject: RE: Visit to See Silane Setup on 01/06/09 >>> > > >>> > >Thulasi Gandhi, >>> > > >>> > >Yes, I do have to make a change. Last night I was not by my calendar >>> >>> > >and I forgot about a 1:30-3pm training I have to provide today. Can >>> > >we meet after 3pm? >>> > > >>> > >Regards, >>> > >Ed >>> > > >>> > > >>> > >At 07:47 PM 1/5/2010, you wrote: >>> > > >Dear Ed Myers, >>> > > > >>> > > >Thats ok. I am not sure whether we can make it before 10 am. So i >>> > > >think 1-3 pm should be ok with us. I will meet you tomorrow at 1pm. >>> > > >Let me know if there is any changes. >>> > > > >>> > > >Thanks >>> > > > >>> > > >Thulasi Gandhi >>> > > > >>> > > > >>> > > >---------- >>> > > >From: Ed Myers [mailto:edmyers at stanford.edu] >>> > > >Sent: Tue 1/5/2010 7:12 PM >>> > > >To: Thulasidharan Gandhi >>> > > >Subject: Re: Visit to See Silane Setup on 01/06/09 >>> > > > >>> > > >Thulasi Gandhi, >>> > > > >>> > > >I found out late today, I have to participate in a phone conference >>> >>> > > >at 11am on Wednesday. On Wednesday, I have time before 10am or >>> > > >between 1-3pm. Sorry for the late change, but please let me know >>> > > >if either of these times will work for you. >>> > > > >>> > > >Regards, >>> > > >Ed >>> > > > >>> > > > >>> > > >At 02:51 PM 1/4/2010, you wrote: >>> > > > >Dear Edward Myers, >>> > > > > >>> > > > >I just spoke to you over the phone about visiting your lab on >>> > > > >Wednesday (01/06/09) at 11am. You can email me back the >>>directions. >>> > > > > >>> > > > >Thanks for your help. >>> > > > > >>> > > > >Regards, >>> > > > > >>> > > > >Thulasi Gandhi >>> > > > >>> >>> > > >-- >Mary X. Tang, Ph.D. >Stanford Nanofabrication Facility >CIS Room 136, Mail Code 4070 >Stanford, CA 94305 >(650)723-9980 >mtang at stanford.edu >http://snf.stanford.edu From nlatta at stanford.edu Fri Jan 15 17:12:11 2010 From: nlatta at stanford.edu (Nancy Latta) Date: Fri, 15 Jan 2010 17:12:11 -0800 Subject: FW: Gold In-Reply-To: <6.2.5.6.2.20100115132723.04c4a2b0@stanford.edu> References: <6.2.5.6.2.20100113132934.0504fd00@stanford.edu> <4B4E6A14.4000604@stanford.edu> <6.2.5.6.2.20100115132723.04c4a2b0@stanford.edu> Message-ID: <4B51126B.4070008@stanford.edu> Ya know, bleed as I might for this potential labmember, I think that it is important that we do the best we can to serve folks with existing poly needs. We definitely need to have a dirty poly tube. Just a matter of which tube affects the folks who will be displaced from it the least. Ideas on how to reach that conclusion? Poll? Coral search? -Nancy Ed Myers wrote: > All, > > The potential lab member is anxious as they have a SBIR deadline. > Ed > > > Dear Ed, > > Wanted to follow up on the SPECMAT approval. Can you let me know a time > frame by which we will know the approval. > > Thanks > > Thulasi > > At 04:49 PM 1/13/2010, Mary Tang wrote: >> Hey Ed -- >> >> >> Good test case. We've talked about this for long enough. I suggest >> we approve one of our furnaces for this purpose, with a few, key >> caveats. >> Thermcopoly1? We'll need to inform the few people who use this system. >> Caveats might be: >> >> - substrates with noble metals allowed >> - no substrates containing materials that will react at process >> temperatures with Cl- >> >> >> Alternatively, we can start conservatively and define "trace" metals >> at concentrations typical for catalytic nanowire growth. Trace >> metals we've seen (that I know of) for nanowires include iron and >> silver -- I think there are concerns about the volatility of iron >> chlorides at thermal oxidation temperatures, but don't know about >> poly LPCVD temperatures. So, I don't know if we want to be more >> specific about what acceptable "trace" metals are. Trace noble >> metals only? I don't know, I think I favor allowing noble metals. >> >> >> Should we be concerned if the nanoporous alumina substrate has any >> other major components other than alumina? >> >> >> Mary >> >> >> >> >> Ed Myers wrote: >>> All, >>> >>> Here is a request from an anxious prospective lab member to convert >>> one of our doped poly furnaces to gold contaminated. They are under >>> a SBIR deadline, so they are anxious to have a resolution. >>> >>> Ed >>> >>> >>>> x-cr-puzzleid: {028F3430-F240-4D74-87CE-CA49A4A1876C} >>>> x-cr-hashedpuzzle: AUex AzNj BTV9 ED3A ESpk FqN2 GbDh HjbJ HmqB >>>> Hx/A IRYW IVcD I+Hu JBjW Kkrg >>>> L6h2;1;ZQBkAG0AeQBlAHIAcwBAAHMAdABhAG4AZgBvAHIAZAAuAGUAZAB1AA==;Sosha1_v1;7;{028F3430-F240-4D74-87CE-CA49A4A1876C};dABoAHUAbABhAHMAaQBkAGgAYQByAGEAbgAuAGcAYQBuAGQAaABpAEAAZAB4AHIAYQB5AC4AYwBvAG0A;Wed, >>>> 13 Jan 2010 21:22:48 GMT;RgBXADoAIABHAG8AbABkAA== >>>> Subject: FW: Gold >>>> Date: Wed, 13 Jan 2010 13:22:48 -0800 >>>> X-MS-Has-Attach: yes >>>> X-MS-TNEF-Correlator: >>>> Thread-Topic: Gold >>>> Thread-Index: AcqTCLmLOumGV0zxQ22RekcwmIFejAAAPdLQAGMrzvA= >>>> From: "Thulasidharan Gandhi" >>>> To: "Ed Myers" >>>> >>>> Dear Ed, >>>> >>>> This is the package which I sent to specmat group. Can you let me know >>>> if you need anything else. >>>> >>>> Thanks >>>> >>>> Thulasi Gandhi >>>> >>>> >>>> >>>> To SpecMat Committee: >>>> >>>> We would like to grow Si nanowires using a template process using >>>> Stanford Nanofabrication facility. The template which we will be using >>>> is nanoporous alumina template with few nanometers of gold >>>> electrodeposited into the pores which will act as a catalyst for >>>> growth >>>> of Si nanowires. Since gold is a contamination I would like to request >>>> you permission to assign a poly furnace for growth of Si nanowires >>>> under >>>> the gold contamination equipment set. I have attached a paper which >>>> shows the growth process of Si nanowires using a template process >>>> using >>>> gold as a catalyst. If you need any other information, I will be ready >>>> to provide you. >>>> >>>> Thanks >>>> >>>> Thulasi Gandhi >>>> >>>> 1) Contact Information: >>>> >>>> DxRay Inc >>>> 19355 Business Center Drive, Suite 10, Northridge, CA-91324 Contact >>>> Person: Thulasi Gandhi Ph no: 8182800177 ext107 >>>> email:tgandhi at dxray.com >>>> >>>> 2)Material: The Material which we are proposing to use is gold. >>>> >>>> 3)Process: The process which we will be developing is CVD growth of Si >>>> nanowires onto a nanoporus alumina template using gold as a catalyst. >>>> >>>> 4)Quantity: The substrate size is around 1/2" in diameter >>>> >>>> 5)Storage: There won't be any storage of the substrates at SNF. >>>> >>>> 6)Disposal: There won't be any disposal of the substrates at SNF. >>>> >>>> >>>> >>>> -----Original Message----- >>>> From: Ed Myers [mailto:edmyers at stanford.edu] >>>> Sent: Monday, January 11, 2010 1:55 PM >>>> To: Thulasidharan Gandhi >>>> Subject: RE: Visit to See Silane Setup on 01/06/09 >>>> >>>> Thulasi Gandhi, >>>> >>>> The link is a couple of pages deeper >>>> >>>> http://snf.stanford.edu/Materials/NewMatProc.html >>>> >>>> Ed >>>> >>>> At 01:50 PM 1/11/2010, you wrote: >>>> >Dear Ed, >>>> > >>>> >I checked for the paperwork at the spectmat group, but could not find >>>> >one. Should I send an email and request them? We want to make sure we >>>> >get an approval from them before signing in for the training and >>>> making >>>> >>>> >a open purchase order for using the facility. Can you guide me >>>> through >>>> >on this. >>>> > >>>> >Thanks >>>> > >>>> >Thulasi Gandhi >>>> > >>>> >-----Original Message----- >>>> >From: Ed Myers [mailto:edmyers at stanford.edu] >>>> >Sent: Monday, January 11, 2010 1:21 PM >>>> >To: Thulasidharan Gandhi >>>> >Cc: specmat at snf.stanford.edu; maurice stevens >>>> >Subject: RE: Visit to See Silane Setup on 01/06/09 >>>> > >>>> >Thulasi Gandhi, >>>> > >>>> >Yes, we have a poly-silicon furnace plumbed with both dopants. Right >>>> >now it is for clean samples, where your sample would be considered >>>> gold >>>> >>>> >contaminated. I have copied the specmat group which is >>>> responsible for >>>> >>>> >any changes to our cleanliness or contamination levels. To run what >>>> >you ask, does require this group to assign a poly furnace to the gold >>>> >contaminated equipment set. If you want to make this change, you >>>> will >>>> >need to fill out the paperwork starting at >>>> >http://snf.stanford.edu/Materials/Materials.html >>>> > >>>> >Also, there will be a memory effect as you switch dopant gases. This >>>> >should be factored in to your process planning. If you don't >>>> remove or >>>> >>>> >seal the dopants, you will get a lot of compensated doping and not >>>> >sharp dopant transitions. >>>> > >>>> >Regards, >>>> >Ed >>>> > >>>> > >>>> >At 11:01 AM 1/11/2010, Thulasidharan Gandhi wrote: >>>> > >Dear Ed Myers, >>>> > > >>>> > >It was nice meeting you the other day and knowing about the >>>> research >>>> > >capabilities you have. We have one final question before we go >>>> ahead >>>> > >with the application for training and using your facility. >>>> > > >>>> > >This is what we are planning to do: We are planning to grow Si >>>> >nanowires >>>> > >onto alumina template. >>>> > > >>>> > >We will have gold deposited into the alumina template and grow >>>> the Si >>>> >>>> > >nanowires using silane at around 500C. In the growth of Si >>>> nanowires >>>> > >we want to dope phosphor and boron alternatively to grow PN Si >>>> nanowires. >>>> > >The other day you told us that your system is capable of doping >>>> >phosphor >>>> > >and boron. We want to once again make sure whether it can be >>>> done by >>>> > >switching the gas supply. >>>> > > >>>> > >Thanks >>>> > > >>>> > >Thulasi Gandhi >>>> > > >>>> > >-----Original Message----- >>>> > >From: Ed Myers [mailto:edmyers at stanford.edu] >>>> > >Sent: Wednesday, January 06, 2010 7:43 AM >>>> > >To: Thulasidharan Gandhi >>>> > >Subject: RE: Visit to See Silane Setup on 01/06/09 >>>> > > >>>> > >Thulasi Gandhi, >>>> > > >>>> > >Yes, I do have to make a change. Last night I was not by my >>>> calendar >>>> >>>> > >and I forgot about a 1:30-3pm training I have to provide today. >>>> Can >>>> > >we meet after 3pm? >>>> > > >>>> > >Regards, >>>> > >Ed >>>> > > >>>> > > >>>> > >At 07:47 PM 1/5/2010, you wrote: >>>> > > >Dear Ed Myers, >>>> > > > >>>> > > >Thats ok. I am not sure whether we can make it before 10 am. So i >>>> > > >think 1-3 pm should be ok with us. I will meet you tomorrow at >>>> 1pm. >>>> > > >Let me know if there is any changes. >>>> > > > >>>> > > >Thanks >>>> > > > >>>> > > >Thulasi Gandhi >>>> > > > >>>> > > > >>>> > > >---------- >>>> > > >From: Ed Myers [mailto:edmyers at stanford.edu] >>>> > > >Sent: Tue 1/5/2010 7:12 PM >>>> > > >To: Thulasidharan Gandhi >>>> > > >Subject: Re: Visit to See Silane Setup on 01/06/09 >>>> > > > >>>> > > >Thulasi Gandhi, >>>> > > > >>>> > > >I found out late today, I have to participate in a phone >>>> conference >>>> >>>> > > >at 11am on Wednesday. On Wednesday, I have time before 10am or >>>> > > >between 1-3pm. Sorry for the late change, but please let me know >>>> > > >if either of these times will work for you. >>>> > > > >>>> > > >Regards, >>>> > > >Ed >>>> > > > >>>> > > > >>>> > > >At 02:51 PM 1/4/2010, you wrote: >>>> > > > >Dear Edward Myers, >>>> > > > > >>>> > > > >I just spoke to you over the phone about visiting your lab on >>>> > > > >Wednesday (01/06/09) at 11am. You can email me back the >>>> directions. >>>> > > > > >>>> > > > >Thanks for your help. >>>> > > > > >>>> > > > >Regards, >>>> > > > > >>>> > > > >Thulasi Gandhi >>>> > > > >>>> >>>> >> From maurice at stanford.edu Fri Jan 22 07:35:54 2010 From: maurice at stanford.edu (maurice stevens) Date: Fri, 22 Jan 2010 07:35:54 -0800 Subject: FW: Gold In-Reply-To: <4B51126B.4070008@stanford.edu> References: <6.2.5.6.2.20100113132934.0504fd00@stanford.edu> <4B4E6A14.4000604@stanford.edu> <6.2.5.6.2.20100115132723.04c4a2b0@stanford.edu> <4B51126B.4070008@stanford.edu> Message-ID: <4B59C5DA.9060206@stanford.edu> I think thermcopoly is our choice for a gold tube. Tylanpoly doesn't have doping and it is our work horse. Thermcopoly2 has Ge...so I think it needs to stay clean. So I think we move thermcopoly users to thermcopoly2. (This will not make Robin's group happy.) All agree? How soon do we want to do this? Should I send out an Email? -m Nancy Latta wrote: > Ya know, bleed as I might for this potential labmember, I think that > it is important that we do the best we can to serve folks with > existing poly needs. We definitely need to have a dirty poly tube. > Just a matter of which tube affects the folks who will be displaced > from it the least. > > Ideas on how to reach that conclusion? Poll? Coral search? > > -Nancy > > Ed Myers wrote: >> All, >> >> The potential lab member is anxious as they have a SBIR deadline. >> Ed >> >> >> Dear Ed, >> >> Wanted to follow up on the SPECMAT approval. Can you let me know a time >> frame by which we will know the approval. >> >> Thanks >> >> Thulasi >> >> At 04:49 PM 1/13/2010, Mary Tang wrote: >>> Hey Ed -- >>> >>> >>> Good test case. We've talked about this for long enough. I suggest >>> we approve one of our furnaces for this purpose, with a few, key >>> caveats. >>> Thermcopoly1? We'll need to inform the few people who use this system. >>> Caveats might be: >>> >>> - substrates with noble metals allowed >>> - no substrates containing materials that will react at process >>> temperatures with Cl- >>> >>> >>> Alternatively, we can start conservatively and define "trace" metals >>> at concentrations typical for catalytic nanowire growth. Trace >>> metals we've seen (that I know of) for nanowires include iron and >>> silver -- I think there are concerns about the volatility of iron >>> chlorides at thermal oxidation temperatures, but don't know about >>> poly LPCVD temperatures. So, I don't know if we want to be more >>> specific about what acceptable "trace" metals are. Trace noble >>> metals only? I don't know, I think I favor allowing noble metals. >>> >>> >>> Should we be concerned if the nanoporous alumina substrate has any >>> other major components other than alumina? >>> >>> >>> Mary >>> >>> >>> >>> >>> Ed Myers wrote: >>>> All, >>>> >>>> Here is a request from an anxious prospective lab member to convert >>>> one of our doped poly furnaces to gold contaminated. They are >>>> under a SBIR deadline, so they are anxious to have a resolution. >>>> >>>> Ed >>>> >>>> >>>>> x-cr-puzzleid: {028F3430-F240-4D74-87CE-CA49A4A1876C} >>>>> x-cr-hashedpuzzle: AUex AzNj BTV9 ED3A ESpk FqN2 GbDh HjbJ HmqB >>>>> Hx/A IRYW IVcD I+Hu JBjW Kkrg >>>>> L6h2;1;ZQBkAG0AeQBlAHIAcwBAAHMAdABhAG4AZgBvAHIAZAAuAGUAZAB1AA==;Sosha1_v1;7;{028F3430-F240-4D74-87CE-CA49A4A1876C};dABoAHUAbABhAHMAaQBkAGgAYQByAGEAbgAuAGcAYQBuAGQAaABpAEAAZAB4AHIAYQB5AC4AYwBvAG0A;Wed, >>>>> 13 Jan 2010 21:22:48 GMT;RgBXADoAIABHAG8AbABkAA== >>>>> Subject: FW: Gold >>>>> Date: Wed, 13 Jan 2010 13:22:48 -0800 >>>>> X-MS-Has-Attach: yes >>>>> X-MS-TNEF-Correlator: >>>>> Thread-Topic: Gold >>>>> Thread-Index: AcqTCLmLOumGV0zxQ22RekcwmIFejAAAPdLQAGMrzvA= >>>>> From: "Thulasidharan Gandhi" >>>>> To: "Ed Myers" >>>>> >>>>> Dear Ed, >>>>> >>>>> This is the package which I sent to specmat group. Can you let me >>>>> know >>>>> if you need anything else. >>>>> >>>>> Thanks >>>>> >>>>> Thulasi Gandhi >>>>> >>>>> >>>>> >>>>> To SpecMat Committee: >>>>> >>>>> We would like to grow Si nanowires using a template process using >>>>> Stanford Nanofabrication facility. The template which we will be >>>>> using >>>>> is nanoporous alumina template with few nanometers of gold >>>>> electrodeposited into the pores which will act as a catalyst for >>>>> growth >>>>> of Si nanowires. Since gold is a contamination I would like to >>>>> request >>>>> you permission to assign a poly furnace for growth of Si nanowires >>>>> under >>>>> the gold contamination equipment set. I have attached a paper which >>>>> shows the growth process of Si nanowires using a template process >>>>> using >>>>> gold as a catalyst. If you need any other information, I will be >>>>> ready >>>>> to provide you. >>>>> >>>>> Thanks >>>>> >>>>> Thulasi Gandhi >>>>> >>>>> 1) Contact Information: >>>>> >>>>> DxRay Inc >>>>> 19355 Business Center Drive, Suite 10, Northridge, CA-91324 Contact >>>>> Person: Thulasi Gandhi Ph no: 8182800177 ext107 >>>>> email:tgandhi at dxray.com >>>>> >>>>> 2)Material: The Material which we are proposing to use is gold. >>>>> >>>>> 3)Process: The process which we will be developing is CVD growth >>>>> of Si >>>>> nanowires onto a nanoporus alumina template using gold as a catalyst. >>>>> >>>>> 4)Quantity: The substrate size is around 1/2" in diameter >>>>> >>>>> 5)Storage: There won't be any storage of the substrates at SNF. >>>>> >>>>> 6)Disposal: There won't be any disposal of the substrates at SNF. >>>>> >>>>> >>>>> >>>>> -----Original Message----- >>>>> From: Ed Myers [mailto:edmyers at stanford.edu] >>>>> Sent: Monday, January 11, 2010 1:55 PM >>>>> To: Thulasidharan Gandhi >>>>> Subject: RE: Visit to See Silane Setup on 01/06/09 >>>>> >>>>> Thulasi Gandhi, >>>>> >>>>> The link is a couple of pages deeper >>>>> >>>>> http://snf.stanford.edu/Materials/NewMatProc.html >>>>> >>>>> Ed >>>>> >>>>> At 01:50 PM 1/11/2010, you wrote: >>>>> >Dear Ed, >>>>> > >>>>> >I checked for the paperwork at the spectmat group, but could not >>>>> find >>>>> >one. Should I send an email and request them? We want to make >>>>> sure we >>>>> >get an approval from them before signing in for the training and >>>>> making >>>>> >>>>> >a open purchase order for using the facility. Can you guide me >>>>> through >>>>> >on this. >>>>> > >>>>> >Thanks >>>>> > >>>>> >Thulasi Gandhi >>>>> > >>>>> >-----Original Message----- >>>>> >From: Ed Myers [mailto:edmyers at stanford.edu] >>>>> >Sent: Monday, January 11, 2010 1:21 PM >>>>> >To: Thulasidharan Gandhi >>>>> >Cc: specmat at snf.stanford.edu; maurice stevens >>>>> >Subject: RE: Visit to See Silane Setup on 01/06/09 >>>>> > >>>>> >Thulasi Gandhi, >>>>> > >>>>> >Yes, we have a poly-silicon furnace plumbed with both dopants. >>>>> Right >>>>> >now it is for clean samples, where your sample would be >>>>> considered gold >>>>> >>>>> >contaminated. I have copied the specmat group which is >>>>> responsible for >>>>> >>>>> >any changes to our cleanliness or contamination levels. To run what >>>>> >you ask, does require this group to assign a poly furnace to the >>>>> gold >>>>> >contaminated equipment set. If you want to make this change, you >>>>> will >>>>> >need to fill out the paperwork starting at >>>>> >http://snf.stanford.edu/Materials/Materials.html >>>>> > >>>>> >Also, there will be a memory effect as you switch dopant gases. >>>>> This >>>>> >should be factored in to your process planning. If you don't >>>>> remove or >>>>> >>>>> >seal the dopants, you will get a lot of compensated doping and not >>>>> >sharp dopant transitions. >>>>> > >>>>> >Regards, >>>>> >Ed >>>>> > >>>>> > >>>>> >At 11:01 AM 1/11/2010, Thulasidharan Gandhi wrote: >>>>> > >Dear Ed Myers, >>>>> > > >>>>> > >It was nice meeting you the other day and knowing about the >>>>> research >>>>> > >capabilities you have. We have one final question before we go >>>>> ahead >>>>> > >with the application for training and using your facility. >>>>> > > >>>>> > >This is what we are planning to do: We are planning to grow Si >>>>> >nanowires >>>>> > >onto alumina template. >>>>> > > >>>>> > >We will have gold deposited into the alumina template and grow >>>>> the Si >>>>> >>>>> > >nanowires using silane at around 500C. In the growth of Si >>>>> nanowires >>>>> > >we want to dope phosphor and boron alternatively to grow PN Si >>>>> nanowires. >>>>> > >The other day you told us that your system is capable of doping >>>>> >phosphor >>>>> > >and boron. We want to once again make sure whether it can be >>>>> done by >>>>> > >switching the gas supply. >>>>> > > >>>>> > >Thanks >>>>> > > >>>>> > >Thulasi Gandhi >>>>> > > >>>>> > >-----Original Message----- >>>>> > >From: Ed Myers [mailto:edmyers at stanford.edu] >>>>> > >Sent: Wednesday, January 06, 2010 7:43 AM >>>>> > >To: Thulasidharan Gandhi >>>>> > >Subject: RE: Visit to See Silane Setup on 01/06/09 >>>>> > > >>>>> > >Thulasi Gandhi, >>>>> > > >>>>> > >Yes, I do have to make a change. Last night I was not by my >>>>> calendar >>>>> >>>>> > >and I forgot about a 1:30-3pm training I have to provide >>>>> today. Can >>>>> > >we meet after 3pm? >>>>> > > >>>>> > >Regards, >>>>> > >Ed >>>>> > > >>>>> > > >>>>> > >At 07:47 PM 1/5/2010, you wrote: >>>>> > > >Dear Ed Myers, >>>>> > > > >>>>> > > >Thats ok. I am not sure whether we can make it before 10 am. >>>>> So i >>>>> > > >think 1-3 pm should be ok with us. I will meet you tomorrow >>>>> at 1pm. >>>>> > > >Let me know if there is any changes. >>>>> > > > >>>>> > > >Thanks >>>>> > > > >>>>> > > >Thulasi Gandhi >>>>> > > > >>>>> > > > >>>>> > > >---------- >>>>> > > >From: Ed Myers [mailto:edmyers at stanford.edu] >>>>> > > >Sent: Tue 1/5/2010 7:12 PM >>>>> > > >To: Thulasidharan Gandhi >>>>> > > >Subject: Re: Visit to See Silane Setup on 01/06/09 >>>>> > > > >>>>> > > >Thulasi Gandhi, >>>>> > > > >>>>> > > >I found out late today, I have to participate in a phone >>>>> conference >>>>> >>>>> > > >at 11am on Wednesday. On Wednesday, I have time before 10am or >>>>> > > >between 1-3pm. Sorry for the late change, but please let me >>>>> know >>>>> > > >if either of these times will work for you. >>>>> > > > >>>>> > > >Regards, >>>>> > > >Ed >>>>> > > > >>>>> > > > >>>>> > > >At 02:51 PM 1/4/2010, you wrote: >>>>> > > > >Dear Edward Myers, >>>>> > > > > >>>>> > > > >I just spoke to you over the phone about visiting your lab on >>>>> > > > >Wednesday (01/06/09) at 11am. You can email me back the >>>>> directions. >>>>> > > > > >>>>> > > > >Thanks for your help. >>>>> > > > > >>>>> > > > >Regards, >>>>> > > > > >>>>> > > > >Thulasi Gandhi >>>>> > > > >>>>> >>>>> >>> > > -- maurice at stanford.edu Maurice Stevens Stanford Nanofabrication Facility CIS Room 142, Mail Code 4070 Stanford, CA 94305 P. (650)725-3660 F. (650)725.6278 From mtang at stanford.edu Fri Jan 22 07:46:50 2010 From: mtang at stanford.edu (Mary Tang) Date: Fri, 22 Jan 2010 07:46:50 -0800 Subject: FW: Gold In-Reply-To: <4B59C5DA.9060206@stanford.edu> References: <6.2.5.6.2.20100113132934.0504fd00@stanford.edu> <4B4E6A14.4000604@stanford.edu> <6.2.5.6.2.20100115132723.04c4a2b0@stanford.edu> <4B51126B.4070008@stanford.edu> <4B59C5DA.9060206@stanford.edu> Message-ID: <4B59C86A.1090904@stanford.edu> Let's send out an email now. I suggest sending personal one to Robin and her group today describing the situation and offering to do what we can to support their technology needs (thermcopoly2?) If they are good players, they should respond to that one. The general announcement can go out Monday. Comments or suggestions? Mary maurice stevens wrote: > I think thermcopoly is our choice for a gold tube. > > Tylanpoly doesn't have doping and it is our work horse. Thermcopoly2 > has Ge...so I think it needs to stay clean. > > So I think we move thermcopoly users to thermcopoly2. (This will not > make Robin's group happy.) > > All agree? > How soon do we want to do this? > Should I send out an Email? > > > -m > > Nancy Latta wrote: >> Ya know, bleed as I might for this potential labmember, I think that >> it is important that we do the best we can to serve folks with >> existing poly needs. We definitely need to have a dirty poly tube. >> Just a matter of which tube affects the folks who will be displaced >> from it the least. >> >> Ideas on how to reach that conclusion? Poll? Coral search? >> >> -Nancy >> >> Ed Myers wrote: >>> All, >>> >>> The potential lab member is anxious as they have a SBIR deadline. >>> Ed >>> >>> >>> Dear Ed, >>> >>> Wanted to follow up on the SPECMAT approval. Can you let me know a time >>> frame by which we will know the approval. >>> >>> Thanks >>> >>> Thulasi >>> >>> At 04:49 PM 1/13/2010, Mary Tang wrote: >>>> Hey Ed -- >>>> >>>> >>>> Good test case. We've talked about this for long enough. I >>>> suggest we approve one of our furnaces for this purpose, with a >>>> few, key caveats. >>>> Thermcopoly1? We'll need to inform the few people who use this >>>> system. >>>> Caveats might be: >>>> >>>> - substrates with noble metals allowed >>>> - no substrates containing materials that will react at process >>>> temperatures with Cl- >>>> >>>> >>>> Alternatively, we can start conservatively and define "trace" >>>> metals at concentrations typical for catalytic nanowire growth. >>>> Trace metals we've seen (that I know of) for nanowires include iron >>>> and silver -- I think there are concerns about the volatility of >>>> iron chlorides at thermal oxidation temperatures, but don't know >>>> about poly LPCVD temperatures. So, I don't know if we want to be >>>> more specific about what acceptable "trace" metals are. Trace >>>> noble metals only? I don't know, I think I favor allowing noble >>>> metals. >>>> >>>> >>>> Should we be concerned if the nanoporous alumina substrate has any >>>> other major components other than alumina? >>>> >>>> >>>> Mary >>>> >>>> >>>> >>>> >>>> Ed Myers wrote: >>>>> All, >>>>> >>>>> Here is a request from an anxious prospective lab member to >>>>> convert one of our doped poly furnaces to gold contaminated. They >>>>> are under a SBIR deadline, so they are anxious to have a resolution. >>>>> >>>>> Ed >>>>> >>>>> >>>>>> x-cr-puzzleid: {028F3430-F240-4D74-87CE-CA49A4A1876C} >>>>>> x-cr-hashedpuzzle: AUex AzNj BTV9 ED3A ESpk FqN2 GbDh HjbJ HmqB >>>>>> Hx/A IRYW IVcD I+Hu JBjW Kkrg >>>>>> L6h2;1;ZQBkAG0AeQBlAHIAcwBAAHMAdABhAG4AZgBvAHIAZAAuAGUAZAB1AA==;Sosha1_v1;7;{028F3430-F240-4D74-87CE-CA49A4A1876C};dABoAHUAbABhAHMAaQBkAGgAYQByAGEAbgAuAGcAYQBuAGQAaABpAEAAZAB4AHIAYQB5AC4AYwBvAG0A;Wed, >>>>>> 13 Jan 2010 21:22:48 GMT;RgBXADoAIABHAG8AbABkAA== >>>>>> Subject: FW: Gold >>>>>> Date: Wed, 13 Jan 2010 13:22:48 -0800 >>>>>> X-MS-Has-Attach: yes >>>>>> X-MS-TNEF-Correlator: >>>>>> Thread-Topic: Gold >>>>>> Thread-Index: AcqTCLmLOumGV0zxQ22RekcwmIFejAAAPdLQAGMrzvA= >>>>>> From: "Thulasidharan Gandhi" >>>>>> To: "Ed Myers" >>>>>> >>>>>> Dear Ed, >>>>>> >>>>>> This is the package which I sent to specmat group. Can you let me >>>>>> know >>>>>> if you need anything else. >>>>>> >>>>>> Thanks >>>>>> >>>>>> Thulasi Gandhi >>>>>> >>>>>> >>>>>> >>>>>> To SpecMat Committee: >>>>>> >>>>>> We would like to grow Si nanowires using a template process using >>>>>> Stanford Nanofabrication facility. The template which we will be >>>>>> using >>>>>> is nanoporous alumina template with few nanometers of gold >>>>>> electrodeposited into the pores which will act as a catalyst for >>>>>> growth >>>>>> of Si nanowires. Since gold is a contamination I would like to >>>>>> request >>>>>> you permission to assign a poly furnace for growth of Si >>>>>> nanowires under >>>>>> the gold contamination equipment set. I have attached a paper which >>>>>> shows the growth process of Si nanowires using a template process >>>>>> using >>>>>> gold as a catalyst. If you need any other information, I will be >>>>>> ready >>>>>> to provide you. >>>>>> >>>>>> Thanks >>>>>> >>>>>> Thulasi Gandhi >>>>>> >>>>>> 1) Contact Information: >>>>>> >>>>>> DxRay Inc >>>>>> 19355 Business Center Drive, Suite 10, Northridge, CA-91324 Contact >>>>>> Person: Thulasi Gandhi Ph no: 8182800177 ext107 >>>>>> email:tgandhi at dxray.com >>>>>> >>>>>> 2)Material: The Material which we are proposing to use is gold. >>>>>> >>>>>> 3)Process: The process which we will be developing is CVD growth >>>>>> of Si >>>>>> nanowires onto a nanoporus alumina template using gold as a >>>>>> catalyst. >>>>>> >>>>>> 4)Quantity: The substrate size is around 1/2" in diameter >>>>>> >>>>>> 5)Storage: There won't be any storage of the substrates at SNF. >>>>>> >>>>>> 6)Disposal: There won't be any disposal of the substrates at SNF. >>>>>> >>>>>> >>>>>> >>>>>> -----Original Message----- >>>>>> From: Ed Myers [mailto:edmyers at stanford.edu] >>>>>> Sent: Monday, January 11, 2010 1:55 PM >>>>>> To: Thulasidharan Gandhi >>>>>> Subject: RE: Visit to See Silane Setup on 01/06/09 >>>>>> >>>>>> Thulasi Gandhi, >>>>>> >>>>>> The link is a couple of pages deeper >>>>>> >>>>>> http://snf.stanford.edu/Materials/NewMatProc.html >>>>>> >>>>>> Ed >>>>>> >>>>>> At 01:50 PM 1/11/2010, you wrote: >>>>>> >Dear Ed, >>>>>> > >>>>>> >I checked for the paperwork at the spectmat group, but could not >>>>>> find >>>>>> >one. Should I send an email and request them? We want to make >>>>>> sure we >>>>>> >get an approval from them before signing in for the training and >>>>>> making >>>>>> >>>>>> >a open purchase order for using the facility. Can you guide me >>>>>> through >>>>>> >on this. >>>>>> > >>>>>> >Thanks >>>>>> > >>>>>> >Thulasi Gandhi >>>>>> > >>>>>> >-----Original Message----- >>>>>> >From: Ed Myers [mailto:edmyers at stanford.edu] >>>>>> >Sent: Monday, January 11, 2010 1:21 PM >>>>>> >To: Thulasidharan Gandhi >>>>>> >Cc: specmat at snf.stanford.edu; maurice stevens >>>>>> >Subject: RE: Visit to See Silane Setup on 01/06/09 >>>>>> > >>>>>> >Thulasi Gandhi, >>>>>> > >>>>>> >Yes, we have a poly-silicon furnace plumbed with both dopants. >>>>>> Right >>>>>> >now it is for clean samples, where your sample would be >>>>>> considered gold >>>>>> >>>>>> >contaminated. I have copied the specmat group which is >>>>>> responsible for >>>>>> >>>>>> >any changes to our cleanliness or contamination levels. To run >>>>>> what >>>>>> >you ask, does require this group to assign a poly furnace to the >>>>>> gold >>>>>> >contaminated equipment set. If you want to make this change, >>>>>> you will >>>>>> >need to fill out the paperwork starting at >>>>>> >http://snf.stanford.edu/Materials/Materials.html >>>>>> > >>>>>> >Also, there will be a memory effect as you switch dopant gases. >>>>>> This >>>>>> >should be factored in to your process planning. If you don't >>>>>> remove or >>>>>> >>>>>> >seal the dopants, you will get a lot of compensated doping and not >>>>>> >sharp dopant transitions. >>>>>> > >>>>>> >Regards, >>>>>> >Ed >>>>>> > >>>>>> > >>>>>> >At 11:01 AM 1/11/2010, Thulasidharan Gandhi wrote: >>>>>> > >Dear Ed Myers, >>>>>> > > >>>>>> > >It was nice meeting you the other day and knowing about the >>>>>> research >>>>>> > >capabilities you have. We have one final question before we go >>>>>> ahead >>>>>> > >with the application for training and using your facility. >>>>>> > > >>>>>> > >This is what we are planning to do: We are planning to grow Si >>>>>> >nanowires >>>>>> > >onto alumina template. >>>>>> > > >>>>>> > >We will have gold deposited into the alumina template and grow >>>>>> the Si >>>>>> >>>>>> > >nanowires using silane at around 500C. In the growth of Si >>>>>> nanowires >>>>>> > >we want to dope phosphor and boron alternatively to grow PN Si >>>>>> nanowires. >>>>>> > >The other day you told us that your system is capable of doping >>>>>> >phosphor >>>>>> > >and boron. We want to once again make sure whether it can be >>>>>> done by >>>>>> > >switching the gas supply. >>>>>> > > >>>>>> > >Thanks >>>>>> > > >>>>>> > >Thulasi Gandhi >>>>>> > > >>>>>> > >-----Original Message----- >>>>>> > >From: Ed Myers [mailto:edmyers at stanford.edu] >>>>>> > >Sent: Wednesday, January 06, 2010 7:43 AM >>>>>> > >To: Thulasidharan Gandhi >>>>>> > >Subject: RE: Visit to See Silane Setup on 01/06/09 >>>>>> > > >>>>>> > >Thulasi Gandhi, >>>>>> > > >>>>>> > >Yes, I do have to make a change. Last night I was not by my >>>>>> calendar >>>>>> >>>>>> > >and I forgot about a 1:30-3pm training I have to provide >>>>>> today. Can >>>>>> > >we meet after 3pm? >>>>>> > > >>>>>> > >Regards, >>>>>> > >Ed >>>>>> > > >>>>>> > > >>>>>> > >At 07:47 PM 1/5/2010, you wrote: >>>>>> > > >Dear Ed Myers, >>>>>> > > > >>>>>> > > >Thats ok. I am not sure whether we can make it before 10 am. >>>>>> So i >>>>>> > > >think 1-3 pm should be ok with us. I will meet you tomorrow >>>>>> at 1pm. >>>>>> > > >Let me know if there is any changes. >>>>>> > > > >>>>>> > > >Thanks >>>>>> > > > >>>>>> > > >Thulasi Gandhi >>>>>> > > > >>>>>> > > > >>>>>> > > >---------- >>>>>> > > >From: Ed Myers [mailto:edmyers at stanford.edu] >>>>>> > > >Sent: Tue 1/5/2010 7:12 PM >>>>>> > > >To: Thulasidharan Gandhi >>>>>> > > >Subject: Re: Visit to See Silane Setup on 01/06/09 >>>>>> > > > >>>>>> > > >Thulasi Gandhi, >>>>>> > > > >>>>>> > > >I found out late today, I have to participate in a phone >>>>>> conference >>>>>> >>>>>> > > >at 11am on Wednesday. On Wednesday, I have time before 10am or >>>>>> > > >between 1-3pm. Sorry for the late change, but please let me >>>>>> know >>>>>> > > >if either of these times will work for you. >>>>>> > > > >>>>>> > > >Regards, >>>>>> > > >Ed >>>>>> > > > >>>>>> > > > >>>>>> > > >At 02:51 PM 1/4/2010, you wrote: >>>>>> > > > >Dear Edward Myers, >>>>>> > > > > >>>>>> > > > >I just spoke to you over the phone about visiting your lab on >>>>>> > > > >Wednesday (01/06/09) at 11am. You can email me back the >>>>>> directions. >>>>>> > > > > >>>>>> > > > >Thanks for your help. >>>>>> > > > > >>>>>> > > > >Regards, >>>>>> > > > > >>>>>> > > > >Thulasi Gandhi >>>>>> > > > >>>>>> >>>>>> >>>> >> >> > -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From johnramunas at gmail.com Wed Jan 27 16:59:51 2010 From: johnramunas at gmail.com (John Ramunas) Date: Wed, 27 Jan 2010 16:59:51 -0800 Subject: Question about SNF capabilities Message-ID: <8dab3aaf1001271659s1787d224p5dbfddaf3828dc6a@mail.gmail.com> Dear SNF liaison, Could you please tell me if you know of a machine at SNF (or elsewhere on campus) for sterilizing objects for implantation, for example by ethylene oxide, or gamma irradiation, or another method? Thank you for your time. Sincerely, John Ramunas Stanford graduate student (650) 804-8954 -------------- next part -------------- An HTML attachment was scrubbed... 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