From jprovine at stanford.edu Fri Jun 4 12:16:18 2010 From: jprovine at stanford.edu (J Provine) Date: Fri, 4 Jun 2010 12:16:18 -0700 Subject: unity (high temperature photo-polymer) and its developer (aka developer 9000) Message-ID: hello specmat, i don't know if these chemicals are currently ok for processing in SNF, but i'd to introduce them. unity and developer 9000 (MSDS attached) have been used at a few other NNIN sites as high temperature sacrificial polymers for encapsulation or patternable molds. i would like to use it in the dirty ald chamber in the fiji or in a ald chambers elsewhere around campus, but need the ability to pattern it in litho. please let me know. j -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Developer 9000 MSDS.pdf Type: application/pdf Size: 237177 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: UNITY MSDS.pdf Type: application/pdf Size: 22259 bytes Desc: not available URL: From mtang at stanford.edu Mon Jun 14 09:11:46 2010 From: mtang at stanford.edu (Mary Tang) Date: Mon, 14 Jun 2010 09:11:46 -0700 Subject: HgCdTe In-Reply-To: <000e01cb0ba2$58008e30$0801aa90$@edu> References: <000e01cb0ba2$58008e30$0801aa90$@edu> Message-ID: <4C1654C2.6000308@stanford.edu> Hi Matthias -- Our apologies in the delay for an official response. The SpecMat group would really like to support this work, but is also seriously concerned about opening up a can of worms since we do not currently have a strict set of procedures or mechanism of control over materials that go into the MRC. As you probably remember from the Cleanliness & Contamination meeting a few months ago, Eric Perozziello brought up a lot of user concerns over control of materials in the MRC. So, as far as the MRC is concerned, it sounded like you already had a resource on campus (you had mentioned working with EH&S to get etching approved for ion milling in another lab?) for etching. Since we are not really set up for handling of toxic materials in the MRC, if you have other resources for etching your material, SpecMat would prefer that you use them rather than the MRC. If you have no other etching resources, then we should talk about other possible alternatives. Please let us know if you would like to work with us on this. As for the Raith, these materials are not a problem, since this and similar ones are already being used on this system. Because material is not being etched, it is not subjected to high temperatures, and provided the vapor pressure is low, a broader range of materials are allowed on the Raith. Mary -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu Matthias Baenninger wrote: > > Hello Mary, > > > > I sent another email regarding my HgCdTe devices to the specmat list > about one and a half months ago. Actually, I sent two, one regarding > the Raith and one about the MRC etcher. > > > > I am now almost through the training on the Raith and it would be > important for me to know if I am actually going to be allowed to do my > litho on the Raith. Do you know if there has been any progress in > making a decision? > > > > Thanks, > > Matthias > > > > > > > > *From:* Mary Tang [mailto:mtang at stanford.edu] > *Sent:* Wednesday, April 14, 2010 4:54 PM > *To:* Matthias Baenninger > *Subject:* Re: MRC Etcher > > > > One more thing.... How much material/how big is your substrate? And > did you say you had EH&S OK to do this on an ion mill elsewhere on > campus? If you have an email from them, that would make things very easy. > > Mary > > Matthias Baenninger wrote: > > Hello Mary, > > > > We talked after the meeting this afternoon. It would be great if you > could forward me the specmat reply regarding the use of the MRC etcher > for CdTe/HgTe. > > > > Thanks, > > Matthias > > > > > > > > ----------------------------------- > > Matthias Baenninger, PhD > > Goldhaber-Gordon Group > > Stanford University > > McCullough Bldg., Room 224 > > 476 Lomita Mall > > Stanford > > CA 94305-4008 > > USA > > Phone: +1 (650) 723-5892 > > ----------------------------------- > > > > > > > > -- > Mary X. Tang, Ph.D. > Stanford Nanofabrication Facility > CIS Room 136, Mail Code 4070 > Stanford, CA 94305 > (650)723-9980 > mtang at stanford.edu > http://snf.stanford.edu > > > -------------- next part -------------- An HTML attachment was scrubbed... URL: From mbaennin at stanford.edu Tue Jun 15 11:11:58 2010 From: mbaennin at stanford.edu (Matthias Baenninger) Date: Tue, 15 Jun 2010 20:11:58 +0200 Subject: HgCdTe In-Reply-To: <4C1654C2.6000308@stanford.edu> References: <000e01cb0ba2$58008e30$0801aa90$@edu> <4C1654C2.6000308@stanford.edu> Message-ID: <001401cb0cb6$407bfdc0$c173f940$@edu> Hi Mary, Thank you for your reply. Great that using the Raith won't be a problem, this was the most urgent issue. As for the MRC etcher, we do have access to an ion mill on campus that we are using right now. The process has been approved by EH&S. However, the system has not been very reliable, that's why we have been looking for alternatives. We have also been looking into upgrading the system to make it more reliable or even purchasing an new one. Best, Matthias From: Mary Tang [mailto:mtang at stanford.edu] Sent: Monday, June 14, 2010 6:12 PM To: Matthias Baenninger Cc: specmat at snf.stanford.edu Subject: Re: HgCdTe Hi Matthias -- Our apologies in the delay for an official response. The SpecMat group would really like to support this work, but is also seriously concerned about opening up a can of worms since we do not currently have a strict set of procedures or mechanism of control over materials that go into the MRC. As you probably remember from the Cleanliness & Contamination meeting a few months ago, Eric Perozziello brought up a lot of user concerns over control of materials in the MRC. So, as far as the MRC is concerned, it sounded like you already had a resource on campus (you had mentioned working with EH&S to get etching approved for ion milling in another lab?) for etching. Since we are not really set up for handling of toxic materials in the MRC, if you have other resources for etching your material, SpecMat would prefer that you use them rather than the MRC. If you have no other etching resources, then we should talk about other possible alternatives. Please let us know if you would like to work with us on this. As for the Raith, these materials are not a problem, since this and similar ones are already being used on this system. Because material is not being etched, it is not subjected to high temperatures, and provided the vapor pressure is low, a broader range of materials are allowed on the Raith. Mary -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu Matthias Baenninger wrote: Hello Mary, I sent another email regarding my HgCdTe devices to the specmat list about one and a half months ago. Actually, I sent two, one regarding the Raith and one about the MRC etcher. I am now almost through the training on the Raith and it would be important for me to know if I am actually going to be allowed to do my litho on the Raith. Do you know if there has been any progress in making a decision? Thanks, Matthias From: Mary Tang [mailto:mtang at stanford.edu] Sent: Wednesday, April 14, 2010 4:54 PM To: Matthias Baenninger Subject: Re: MRC Etcher One more thing.... How much material/how big is your substrate? And did you say you had EH&S OK to do this on an ion mill elsewhere on campus? If you have an email from them, that would make things very easy. Mary Matthias Baenninger wrote: Hello Mary, We talked after the meeting this afternoon. It would be great if you could forward me the specmat reply regarding the use of the MRC etcher for CdTe/HgTe. Thanks, Matthias ----------------------------------- Matthias Baenninger, PhD Goldhaber-Gordon Group Stanford University McCullough Bldg., Room 224 476 Lomita Mall Stanford CA 94305-4008 USA Phone: +1 (650) 723-5892 ----------------------------------- -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From jprovine at stanford.edu Mon Jun 21 08:49:04 2010 From: jprovine at stanford.edu (J Provine) Date: Mon, 21 Jun 2010 08:49:04 -0700 Subject: curious about recent inquiries Message-ID: hello specmat, i haven't heard anything about a couple of recent inquiries i've made: 1) list of precursor materials for the fiji/savanah ald systems. ted berg said these were all good to go, but i wanted to check the status officially. 2) sacrificial polymer Unity and its developer Developer 9000. please let me know what the status of these requests are and if i can provide any additional information. j -------------- next part -------------- An HTML attachment was scrubbed... URL: From mtang at stanford.edu Mon Jun 21 09:57:52 2010 From: mtang at stanford.edu (Mary Tang) Date: Mon, 21 Jun 2010 09:57:52 -0700 Subject: curious about recent inquiries In-Reply-To: References: Message-ID: <4C1F9A10.9070808@stanford.edu> Hi J -- Sorry about that, I guess I still haven't caught up on emails from vacation. 1. Precursor materials are OK provided: we maintain levels below threshold; the chemical is registered on the Stanford Chemicals database; the MSDS are on file both with SNF and Stanford. Please let us know in advance when chemicals are ordered and what kind of storage may be required. Let us know when they arrive and provide us with MSDS so this information can be entered in the Stanford chemicals database. Depending on the changeout frequency, we may need to come up with a tracking system. 2. The Unity polymer and developer 9000 are OK to use in the manual spin and develop stations, bake plates, and bake ovens other than singe and YES. Let us know if you plan to use this elsewhere. Also let us know how much you plan to order. Storage space is a concern, so the less you can order, the better. We'll need yellow tags on these chemicals. By the way, I was just talking with Jim McV. We will need to post plans for bringing up the new processes. We should identify processes/customers. We should have estimated timelines and budgets for supplies (chemicals, gases, wafers). (We [the new equipment group] should all give this some thought and meet up some time to make sure we all have the same agenda.) Mary J Provine wrote: > hello specmat, > i haven't heard anything about a couple of recent inquiries i've made: > 1) list of precursor materials for the fiji/savanah ald systems. ted > berg said these were all good to go, but i wanted to check the status > officially. > > 2) sacrificial polymer Unity and its developer Developer 9000. > > please let me know what the status of these requests are and if i can > provide any additional information. > > j -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From jprovine at stanford.edu Mon Jun 21 10:42:24 2010 From: jprovine at stanford.edu (J Provine) Date: Mon, 21 Jun 2010 10:42:24 -0700 Subject: curious about recent inquiries In-Reply-To: <4C1F9A10.9070808@stanford.edu> References: <4C1F9A10.9070808@stanford.edu> Message-ID: for unity (post-development), we would like to go into matrix, gasonics, and drytek2 (O2 plasma/ashing systems for isotropic release etching). the other point of unity was to provide a polymer as a sacrificial for ALD deposition - so it would go in the less clean chamber of the fiji. i'm setting up a tracking protocol for precursors on the ald systems...the wiki is the main information source to the users and i'm hoping coral will track material usage sufficiently. i'll present what i have when the next new equipment meeting happens. j On Mon, Jun 21, 2010 at 9:57 AM, Mary Tang wrote: > Hi J -- > > Sorry about that, I guess I still haven't caught up on emails from > vacation. > > > 1. Precursor materials are OK provided: we maintain levels below > threshold; the chemical is registered on the Stanford Chemicals database; > the MSDS are on file both with SNF and Stanford. Please let us know in > advance when chemicals are ordered and what kind of storage may be required. > Let us know when they arrive and provide us with MSDS so this information > can be entered in the Stanford chemicals database. Depending on the > changeout frequency, we may need to come up with a tracking system. > > > 2. The Unity polymer and developer 9000 are OK to use in the manual spin > and develop stations, bake plates, and bake ovens other than singe and YES. > Let us know if you plan to use this elsewhere. Also let us know how much > you plan to order. Storage space is a concern, so the less you can order, > the better. > > We'll need yellow tags on these chemicals. By the way, I was just talking > with Jim McV. We will need to post plans for bringing up the new processes. > We should identify processes/customers. We should have estimated timelines > and budgets for supplies (chemicals, gases, wafers). (We [the new equipment > group] should all give this some thought and meet up some time to make sure > we all have the same agenda.) > > > Mary > > > > > > J Provine wrote: > >> hello specmat, >> i haven't heard anything about a couple of recent inquiries i've made: >> 1) list of precursor materials for the fiji/savanah ald systems. ted berg >> said these were all good to go, but i wanted to check the status officially. >> >> 2) sacrificial polymer Unity and its developer Developer 9000. >> >> please let me know what the status of these requests are and if i can >> provide any additional information. >> >> j >> > > > -- > Mary X. Tang, Ph.D. > Stanford Nanofabrication Facility > CIS Room 136, Mail Code 4070 > Stanford, CA 94305 > (650)723-9980 > mtang at stanford.edu > http://snf.stanford.edu > > -------------- next part -------------- An HTML attachment was scrubbed... URL: From mtang at stanford.edu Wed Jun 23 14:29:56 2010 From: mtang at stanford.edu (Mary Tang) Date: Wed, 23 Jun 2010 14:29:56 -0700 Subject: [Fwd: SpecMat] Message-ID: <4C227CD4.4020409@stanford.edu> Hello fellow SpecMat'ers -- Here is a request (actually, two) from a UCSB student, soon to join the lab. Mary -------- Original Message -------- Subject: SpecMat Date: Wed, 23 Jun 2010 14:22:54 -0700 From: Kaveh Milaninia To: Mary It was very nice meeting you on Monday. I'm still waiting for my PI to come back from a talk in order to sign the papers needed to get access to the lab as well as the CIS grant. In the meantime I was wondering if I could make a couple SpecMat requests. 1. Acetone Vapor Clean: Materials: PMMA coated Silicon samples Process: A small 50 mL container is filled with approximately 20-30 mL of acetone and heated to 80C. The container itself is sealed with the exception of a very small, 1-2 mm hole, in the lid to allow for the escape of acetone vapor. Samples coated with a PMMA film are placed on the hole with the PMMA side down to allow for the removal of PMMA without excess capillary forces. 2. Carbon Nanofilm Anneal Material: Graphene on Silicon samples Process: Silicon pieces with graphene on top are cleaned under an atmosphere of hydrogen (4%) in argon at 300-400C to remove residual resist or other organic contaminants present on graphene surfaces. Argon is needed instead of nitrogen to ensure minimal oxygen in presence of and prevent the doping of the graphene samples. Please let me know if any further information is required. Thanks. Kaveh -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From edmyers at stanford.edu Wed Jun 23 15:25:28 2010 From: edmyers at stanford.edu (Ed Myers) Date: Wed, 23 Jun 2010 15:25:28 -0700 Subject: [Fwd: SpecMat] In-Reply-To: <4C227CD4.4020409@stanford.edu> References: <4C227CD4.4020409@stanford.edu> Message-ID: <6.2.5.6.2.20100623152447.0529cbf0@stanford.edu> Mary, I don't think we have H2 in Argon. Ed At 02:29 PM 6/23/2010, Mary Tang wrote: >Hello fellow SpecMat'ers -- > >Here is a request (actually, two) from a UCSB student, soon to join the lab. > > >Mary > >-------- Original Message -------- >Subject: SpecMat >Date: Wed, 23 Jun 2010 14:22:54 -0700 >From: Kaveh Milaninia >To: > > >Mary > >It was very nice meeting you on Monday. I'm still waiting for my PI >to come back from a talk in order to sign the papers needed to get >access to the lab as well as the CIS grant. In the meantime I was >wondering if I could make a couple SpecMat requests. > >1. Acetone Vapor Clean: >Materials: PMMA coated Silicon samples >Process: A small 50 mL container is filled with approximately 20-30 >mL of acetone and heated to 80C. The container itself is sealed with >the exception of a very small, 1-2 mm hole, in the lid to allow for >the escape of acetone vapor. Samples coated with a PMMA film are >placed on the hole with the PMMA side down to allow for the removal >of PMMA without excess capillary forces. > >2. Carbon Nanofilm Anneal >Material: Graphene on Silicon samples >Process: Silicon pieces with graphene on top are cleaned under an >atmosphere of hydrogen (4%) in argon at 300-400C to remove residual >resist or other organic contaminants present on graphene surfaces. >Argon is needed instead of nitrogen to ensure minimal oxygen in >presence of and prevent the doping of the graphene samples. > >Please let me know if any further information is required. Thanks. > >Kaveh > > >-- >Mary X. Tang, Ph.D. >Stanford Nanofabrication Facility >CIS Room 136, Mail Code 4070 >Stanford, CA 94305 >(650)723-9980 >mtang at stanford.edu >http://snf.stanford.edu From mtang at stanford.edu Wed Jun 23 16:10:38 2010 From: mtang at stanford.edu (Mary Tang) Date: Wed, 23 Jun 2010 16:10:38 -0700 Subject: [Fwd: SpecMat] In-Reply-To: <6.2.5.6.2.20100623152447.0529cbf0@stanford.edu> References: <4C227CD4.4020409@stanford.edu> <6.2.5.6.2.20100623152447.0529cbf0@stanford.edu> Message-ID: <4C22946E.6090705@stanford.edu> No, but we do have some systems with both H2 and Ar (oxidation furnaces, tylansige). I'm supposing there may be temperature, interlock, and cleanliness concerns with graphene and trace organics removal. Does anyone see a reasonable path here? M Ed Myers wrote: > Mary, > > I don't think we have H2 in Argon. > > Ed > > > At 02:29 PM 6/23/2010, Mary Tang wrote: >> Hello fellow SpecMat'ers -- >> >> Here is a request (actually, two) from a UCSB student, soon to join >> the lab. >> >> >> Mary >> >> -------- Original Message -------- >> Subject: SpecMat >> Date: Wed, 23 Jun 2010 14:22:54 -0700 >> From: Kaveh Milaninia >> To: >> >> >> Mary >> >> It was very nice meeting you on Monday. I'm still waiting for my PI >> to come back from a talk in order to sign the papers needed to get >> access to the lab as well as the CIS grant. In the meantime I was >> wondering if I could make a couple SpecMat requests. >> >> 1. Acetone Vapor Clean: >> Materials: PMMA coated Silicon samples >> Process: A small 50 mL container is filled with approximately 20-30 >> mL of acetone and heated to 80C. The container itself is sealed with >> the exception of a very small, 1-2 mm hole, in the lid to allow for >> the escape of acetone vapor. Samples coated with a PMMA film are >> placed on the hole with the PMMA side down to allow for the removal >> of PMMA without excess capillary forces. >> >> 2. Carbon Nanofilm Anneal >> Material: Graphene on Silicon samples >> Process: Silicon pieces with graphene on top are cleaned under an >> atmosphere of hydrogen (4%) in argon at 300-400C to remove residual >> resist or other organic contaminants present on graphene surfaces. >> Argon is needed instead of nitrogen to ensure minimal oxygen in >> presence of and prevent the doping of the graphene samples. >> >> Please let me know if any further information is required. Thanks. >> >> Kaveh >> >> >> -- >> Mary X. Tang, Ph.D. >> Stanford Nanofabrication Facility >> CIS Room 136, Mail Code 4070 >> Stanford, CA 94305 >> (650)723-9980 >> mtang at stanford.edu >> http://snf.stanford.edu > > -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From mtang at stanford.edu Wed Jun 23 16:21:44 2010 From: mtang at stanford.edu (Mary Tang) Date: Wed, 23 Jun 2010 16:21:44 -0700 Subject: [Fwd: Warning about TMAH] Message-ID: <4C229708.8040003@stanford.edu> Hi all -- This is a surprise to me -- I wasn't aware TMAH was so toxic. We should revisit our chemical handling procedures at wbgeneral and wbgaas (where labmembers use 40% TMAH for silicon etching) and svgdev and the manual develop benches (MF 26 developer is about 2-3% TMAH.) Mary -------- Original Message -------- Subject: Warning about TMAH Date: Wed, 23 Jun 2010 11:59:13 +0200 From: Crabb, Kevin M. To: mtang at stanford.edu Hi Mary, Greetings from Lam Research AG in Villach, Austria (formerly SEZ)! I've been working here 3 months now, and so far I'm enjoying it quite a lot! I just got a forward about TMAH and severe respiratory problems (leading to 3 deaths) after exposure to skin. I'm not sure if you and the rest of the SNF staff/students were aware of this, so I just thought I'd pass it on. I hope you're doing well! Kevin -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: TMAH.PDF Type: application/pdf Size: 579042 bytes Desc: not available URL: From mtang at stanford.edu Tue Jun 29 08:49:10 2010 From: mtang at stanford.edu (Mary Tang) Date: Tue, 29 Jun 2010 08:49:10 -0700 Subject: SpecMat request: Protein solutions of PBS and BSA In-Reply-To: References: <4C295DC4.3040309@stanford.edu> Message-ID: <4C2A15F6.5020401@stanford.edu> Hi Meredith -- OK, the RI analysis makes sense, although you should check with Ed about the model -- there will likely be a concentration gradient in your samples. Your sample handling procedure is fine for the SEO contact analyzer, but you'll have to check with Ed for the Woollam. I think EH&S could pick up biohazardous waste from SNF, but they won't be expecting it. I suggest checking with the Kovacs lab group to see what they do and maybe borrow the appropriate labels and bags. I'm not sure small amounts of BSA needs to be handled specially, but it's best to be conservative and show your REU's good lab practices. Let me know what the Kovacs lab people say and I'll also drop a note to our EH&S. Thanks, Mary Meredith M. Lee wrote: > Hi Mary, > > Thanks for the quick reply -- yes, we agree we don't want the > solutions touching anything that is not ours and disposable. > > For the Woollam, we planned to dispense the solution wet, take a > measurement set, then dry and take another measurement set. > > We want to know the refractive index of BSA at different > concentrations if the BSA is wet or dry. This is because in our > "real" samples with photonic crystals we can detect binding events in > two ways - (1) while the solution is covering the surface, or (2) > after drying out the microchannel -- i.e. BSA in air (with greater > index contrast). > > Do you prefer for us to dispose of the waste outside of SNF? > > Thanks, > -Meredith > -------------------------------------------------- > Meredith M. Lee > Stanford University > Ph.D. Candidate, Dept. of Electrical Engineering > Center for Integrated Systems > 420 Via Ortega, Stanford, CA 94305-4075 > Fax: (650) 723-4659 > mmlee at stanford.edu > > > > > On Mon, Jun 28, 2010 at 7:43 PM, Mary Tang > wrote: > > Hi Meredith - > > No, your first SpecMat message did not get through - the list is > filtered... > > As for the contact angle measurement tool, your solutions and > procedure sound fine. I think the main concern for either the SEO > contact angle or the Woollam is guarding the solutions touching > any other surface since PBS contains sodium. I wasn't sure from > the description -- is the measurement on the woollam done on wet > or dried film? (I'm just not sure of the value of information > about a wet drop...) > > Mary > > > Meredith M. Lee wrote: >> Hi, not sure if this email went through--forwarding below! >> >> Thanks, >> -Meredith >> >> >> ---------- Forwarded message ---------- >> From: *Meredith M. Lee* > > >> Date: Mon, Jun 28, 2010 at 6:58 PM >> Subject: SpecMat request: Protein solutions of PBS and BSA >> To: specmat at snf.stanford.edu >> Cc: Philip Ponce de Leon > >, elkallas > >, James Harris >> > >> >> >> Hi, >> >> As part of an NNIN REU project (student Phil Ponce de Leon, >> "Surface Treatments for Controlling Hydrophobicity of Photonic >> Crystal Biosensors"), we are interested in measuring the contact >> angle and refractive index of solutions of BSA (bovine serum >> albumin) suspended in PBS (phosphate buffered saline). PBS and >> BSA are obtainable at the campus Biostores and are kept chilled >> in a refrigerator at 4 deg C in BioX after the different >> concentration solutions have been made (in BioX). The amount of >> solutions we would like to bring into SNF, and suggested >> operating procedures are listed below. >> >> The two pieces of equipment we would like to use are: >> >> *Contact Angle Tool* >> Using our own syringe and syringe tips for handling the BSA/PBS, >> we would like to dispense drops (20 microliters) on our wafers. >> Suggestion for disposal after measurement is to absorb droplets >> with a cleanroom wipe and put in a ziploc bag in biohazard waste, >> and to take out of SNF for disposal in BioX. The wafer surfaces >> would be Si, or SiNx, either bare or with teflon or silanized, >> and can be disposed of after the test, or kept in containers >> clearly marked for later repeated test to determine the longevity >> of surface treatments. Standard practice of labels for >> "chemicals/solutions in use" would be followed, and any >> accidental spillage will be handled from procedures used in BioX >> or Genome Technology Center labs. (or if specmat can suggest >> desired procedures). >> >> *Woollam Ellipsometer* >> We would like to use our own pipette and pipette tips (disposed >> of in our own sharps wastebin) to dispense (again 10s of >> microliters) solutions onto "wells" that are defined by O-rings >> taped down with kapton tape on 4" Si wafers. The solution >> dispensing would be done immediately before an ellipsometry >> measurement on the Woollam. Dessicant will be used to dry the >> wells, and a "dried protein solution" measurement will be taken >> before removing the sample. >> >> */The nature of the project is such that after contact with the >> BSA/PBS solutions, the samples will not go into any other >> equipment. /* >> >> >> The mentors for this REU project are post doc Pascale El Kallassi >> and PhD student Meredith Lee, under Prof. Jim Harris. Each >> person handling the above experiment will have taken the >> bio-safety course on STARS Stanford training. >> >> Please let us know if this proposal would be acceptable. Thanks! >> >> Meredith >> >> -------------------------------------------------- >> Meredith M. Lee >> Stanford University >> Ph.D. Candidate, Dept. of Electrical Engineering >> Center for Integrated Systems >> 420 Via Ortega, Stanford, CA 94305-4075 >> Fax: (650) 723-4659 >> mmlee at stanford.edu >> >> >> > -------------- next part -------------- An HTML attachment was scrubbed... URL: