edmyers at stanford.edu
Wed Jun 23 15:25:28 PDT 2010
I don't think we have H2 in Argon.
At 02:29 PM 6/23/2010, Mary Tang wrote:
>Hello fellow SpecMat'ers --
>Here is a request (actually, two) from a UCSB student, soon to join the lab.
>-------- Original Message --------
>Date: Wed, 23 Jun 2010 14:22:54 -0700
>From: Kaveh Milaninia <mailto:kavehm at ece.ucsb.edu><kavehm at ece.ucsb.edu>
>To: <mailto:mtang at snf.stanford.edu><mtang at snf.stanford.edu>
>It was very nice meeting you on Monday. I'm still waiting for my PI
>to come back from a talk in order to sign the papers needed to get
>access to the lab as well as the CIS grant. In the meantime I was
>wondering if I could make a couple SpecMat requests.
>1. Acetone Vapor Clean:
>Materials: PMMA coated Silicon samples
>Process: A small 50 mL container is filled with approximately 20-30
>mL of acetone and heated to 80C. The container itself is sealed with
>the exception of a very small, 1-2 mm hole, in the lid to allow for
>the escape of acetone vapor. Samples coated with a PMMA film are
>placed on the hole with the PMMA side down to allow for the removal
>of PMMA without excess capillary forces.
>2. Carbon Nanofilm Anneal
>Material: Graphene on Silicon samples
>Process: Silicon pieces with graphene on top are cleaned under an
>atmosphere of hydrogen (4%) in argon at 300-400C to remove residual
>resist or other organic contaminants present on graphene surfaces.
>Argon is needed instead of nitrogen to ensure minimal oxygen in
>presence of and prevent the doping of the graphene samples.
>Please let me know if any further information is required. Thanks.
>Mary X. Tang, Ph.D.
>Stanford Nanofabrication Facility
>CIS Room 136, Mail Code 4070
>Stanford, CA 94305
><mailto:mtang at stanford.edu>mtang at stanford.edu
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