From mtang at stanford.edu  Tue Mar  2 14:45:55 2010
From: mtang at stanford.edu (Mary Tang)
Date: Tue, 02 Mar 2010 14:45:55 -0800
Subject: Request for Nanostrip use
In-Reply-To: <76C31945-C099-41A1-84D2-88A29F8DACCB@proceptcorp.com>
References: <12282CED-5399-427C-B849-9C0B3C97D9F9@proceptcorp.com> <76C31945-C099-41A1-84D2-88A29F8DACCB@proceptcorp.com>
Message-ID: <4B8D9523.7010603@stanford.edu>

Hey Dan --


SpecMat at snf has got a filter, so the originating email has to come from 
"snf" or the email you have registered as your forwarding email for 
"snf" emails.  A lot of the lab @snf emails have variations on this 
filter, so you probably should talk with Maureen about getting your 
forward email set up for the one you use most.


Nanostrip is approved for the lab and we in fact thought of converting 
piranha at wbnonmetal over to this, but it's a lot slower than 
conventional piranha for stripping resist.  I have no idea what it does 
for polyimide, but my guess is that it would not be much more efficient, 
since I had thought it was just a constant boiling ternary azeotrope 
version of piranha.  But then maybe that magic ternary ingredient is key.


However, you should submit your SpecMat request and arrange for storage 
BEFORE you order.  That way David and Marie know where it should go when 
it arrives and how to contact you.


This should be used only at wbgeneral or wbgaas.  It should be aspirated 
to AWN (not poured down the drain). You will need a yellow label from 
Mahnaz.  This should be stored in the top shelf of the Chemicals 
Passthrough when it is in use.  When you are done with this, let us know 
and we can dispose of the remaining material.


Thanks,

Mary


Dan Grupp wrote:
> Hi Mary and Ed,
>
> I just emailed specmat at snf.stanford.edu 
> <mailto:specmat at snf.stanford.edu> and it bounced, so I thought i would 
> send it to both of you, hoping it reaches the right people.
>
> Much Thanks,
> Dan
>
> Begin forwarded message:
>
>> *From: *Dan Grupp <grupp at proceptcorp.com <mailto:grupp at proceptcorp.com>>
>> *Date: *March 2, 2010 2:25:52 PM PST
>> *To: *specmat at snf.stanford.edu <mailto:specmat at snf.stanford.edu>
>> *Subject: **Request for Nanostrip*
>>
>> Hello,
>>
>> I would like to use Nanostrip in the lab as soon as possible. A 
>> bottle was just delivered today to snf receiving. I am also wondering 
>> if it is ok there, or should be moved to a better storage location 
>> until specmat decides if it is ok in the lab.
>>
>> Here is the description. THe MSDS is attached.
>>
>> Best Regards,
>> Dan Grupp
>> c:650-704-9551
>>
>>    1. * Your contact information: *  
>>          1. DAn grupp, 
>>          2. login grupp, 
>>          3. grupp at proceptcorp.com <mailto:grupp at proceptcorp.com>, 
>>          4. c:650-704-9551
>>          5. Procept Corp, 275 Shoreline Dr., Redwood City, CA 94065
>>    2. * The chemical or material.  *
>>          1. *Nanostrip *
>>          2. *Maker: Cyantek, www.cyantek.com <http://www.cyantek.com/>*
>>          3. *Description: *"Piranha in a bottle". It is stabilized
>>             pirhana, with a shelf life of many months. It contains
>>             sulfuric acid, peroxymonosulfuric acid (also known as
>>             Caro's acid), and a small amount of hydrogen peroxide.
>>             The action of the Caro's acid is similar to the peroxide,
>>             but the solution doesn't degrade. 
>>    3. *V endor/manufacturer info: *  Cyantek, 3055 Osgood Court,
>>       Fremont, CA 94538, 510-651-3341
>>    4. *Reason for request:* THis chemical is supposed to strip
>>       polyimide at room temperature. I haven't found any other
>>       solution. 
>>    5. * Process Flow: *  The Nanostrip will be used to remove
>>       polyimide from the end of a glass optical fiber. The polyimide
>>       is about 10 um thick. The diameter of the fiber is about 150
>>       um. We will remove up to 1" of polyimide.
>>          1. Fill beaker with Nanostrip
>>          2. Dip fiber into Nanostrip desired distance.
>>          3. Wait desired time (several minutes?).
>>          4. REmove fiber from Nanostrip.
>>          5. Rinse in water.
>>    6. *Amount and form. *1 gallon premixed.
>>    7. * Storage: The bottle would be stored at SNF. *
>>    8. * DIsposal * : The used Nanostrip should be free of heavy
>>       metals, as it is just removing a small amount of polyimide. It
>>       should be safe to dispose in the acid waste drain. 
>>
> =
> ------------------------------------------------------------------------
>
>>   1.
>>
>>
>>
>>
>


-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu

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From erik.garnett at gmail.com  Tue Mar  2 17:11:43 2010
From: erik.garnett at gmail.com (Erik Garnett)
Date: Tue, 2 Mar 2010 17:11:43 -0800
Subject: PMDS in stsetch request
Message-ID: <bd55e2e11003021711k15374ea8qf0f1385b81ff9946@mail.gmail.com>

Hi,

I'd like to try and make silicon on PDMS by curing PDMS on top of an SOI
wafer and then etching back through the handle in stsetch.  The SOI will be
run through the standard cleaning procedure before applying the PDMS.  The
PDMS will be cured in a vacuum oven at 80C.  I've talked to Nancy and she is
OK with me giving it a try using the Al holder as long as I am cleared to
use cured PDMS in stsetch.  Please let me know if you have any further
questions.  Thanks!

Erik Garnett
(egarnett)
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From roberth at quswami.com  Fri Mar  5 09:15:03 2010
From: roberth at quswami.com (Robert Huang)
Date: Fri, 5 Mar 2010 09:15:03 -0800
Subject: request to use aluminum tri-sec butoxide in SNF...
Message-ID: <3F24868DDBDC7B46B2289E33B58C4CB11F8ACF0839@QUSWAMI-DSRV1.quswami.local>

Dear SNF Spec Mat committee:

I would like to use a new chemical in SNF, aluminum tri-sec butoxide (99.99% trace metal basis), and would be obtaining 5-10mL in solution from Sigma-Aldrich.  Below is a link to their website on this material:

http://www.sigmaaldrich.com/catalog/ProductDetail.do?lang=en&N4=511609|ALDRICH&N5=SEARCH_CONCAT_PNO|BRAND_KEY&F=SPEC

In addition, I'm attaching the MSDS sheet for this material.

My intent is to dilute this material (comes in liquid form) in dry2-propanol, then dip my 4" wafers into the solution.  I presume this processing would need to be done at wbsolvent.  I plan to use 100-200mL of total solution in quartzware, basically whatever is the minimum amount needed that will allow me to immerse my wafers in the solution.  Afterwards I intend to process the wafers further on the innotec and metallica tools.

Please let me know if there are any concerns or any special handling requirements.

Regards,

Robert Huang
roberth at quswami.com<mailto:roberth at quswami.com>
408-854-0450
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From roberth at quswami.com  Mon Mar  8 12:46:02 2010
From: roberth at quswami.com (Robert Huang)
Date: Mon, 8 Mar 2010 12:46:02 -0800
Subject: Addition to request to use aluminum tri-sec butoxide in SNF...
Message-ID: <3F24868DDBDC7B46B2289E33B58C4CB11F8ACF0870@QUSWAMI-DSRV1.quswami.local>

Dear SNF Spec Mat committee:

In addition to using aluminum tri-sec butoxide from Sigma-Aldrich, I'd like to use the following chemicals from Strem (links to Strem website are given and MSDS sheets attached):


1)      Aluminum s-butoxide - http://www.strem.com/catalog/v/93-1308/ (composition is actually the same as aluminum tri-sec butoxide from Sigma Aldrich, my original request)

2)      Hafnium t-butoxide - http://www.strem.com/catalog/v/72-5800/

3)      Tetramethoxysilane - http://www.strem.com/catalog/v/93-1459/

4)      Zirconium n-butoxide - http://www.strem.com/catalog/v/93-4003/

As with the aluminum tri-sec butoxide, I would be diluting these materials in dry2-propanol (or methanol) and dipping my 4" wafers into the solution.  Total solution will remain 100-200mL, just enough to immerse my wafers, and I will then process the wafers on innotec and metallica.

Please review these chemicals as well and let me know if there are any concerns.

Regards,

Robert

From: Robert Huang
Sent: Friday, March 05, 2010 9:15 AM
To: specmat at snf.stanford.edu
Subject: request to use aluminum tri-sec butoxide in SNF...

Dear SNF Spec Mat committee:

I would like to use a new chemical in SNF, aluminum tri-sec butoxide (99.99% trace metal basis), and would be obtaining 5-10mL in solution from Sigma-Aldrich.  Below is a link to their website on this material:

http://www.sigmaaldrich.com/catalog/ProductDetail.do?lang=en&N4=511609|ALDRICH&N5=SEARCH_CONCAT_PNO|BRAND_KEY&F=SPEC

In addition, I'm attaching the MSDS sheet for this material.

My intent is to dilute this material (comes in liquid form) in dry2-propanol, then dip my 4" wafers into the solution.  I presume this processing would need to be done at wbsolvent.  I plan to use 100-200mL of total solution in quartzware, basically whatever is the minimum amount needed that will allow me to immerse my wafers in the solution.  Afterwards I intend to process the wafers further on the innotec and metallica tools.

Please let me know if there are any concerns or any special handling requirements.

Regards,

Robert Huang
roberth at quswami.com<mailto:roberth at quswami.com>
408-854-0450
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From tfung at silexos.com  Tue Mar  9 12:14:07 2010
From: tfung at silexos.com (Tracy Fung)
Date: Tue, 9 Mar 2010 12:14:07 -0800
Subject: ProTEK PSB and Primer, polymeric KOH and TMAH mask.
Message-ID: <002a01cabfc5$12ebb460$38c31d20$@com>

Attached are the MSDS for both the ProTEK PSB and Primer.  

Intended use at headway2 or laurel, as well as UV exposure using KarlSuss.
Also wbgeneral for use as a mask during KOH and TMAH etching. 

 

We have been unable to verify the claim that the ProTEK PSB is resistant to
strong alkaline etchant such as KOH and TMAH.  And they have been unwilling
to supply small quantities (grams) for this purposes.  The minimum $1200
purchase is for 250mL of Primer and 250mL of PSB.  I would like to ask if I
can CC an SNF representative in emails requesting sample gram sized
quantities for evaluation purposes.  Brewster sciences appears to be
interested in the use of their ProTEK PSB at the SNF and perhaps if had more
pressure would supply smaller/cheaper evaluation samples.

 

With a confirmation of KOH and TMAH resistance Silexos does plan to purchase
larger quantities. 

 

 

Tracy Fung

Photovoltaic Engineer

 

Silexos

1455 Adams Dr, Suite 1610

Menlo Park, CA 94025

650.716.5172

 

 

This e-mail and any accompanying attachments contain information that is
confidential to Silexos, Inc. The information is intended solely for the use
of the individual to whom it is addressed. Any review, disclosure, copying,
distribution, or use of this e-mail communication by others is strictly
prohibited. If you are not the intended recipient, please notify us
immediately by returning this message to the sender and delete all copies. 

 

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From mtang at stanford.edu  Wed Mar 10 11:49:46 2010
From: mtang at stanford.edu (Mary Tang)
Date: Wed, 10 Mar 2010 11:49:46 -0800
Subject: ProTEK PSB and Primer, polymeric KOH and TMAH mask.
In-Reply-To: <002a01cabfc5$12ebb460$38c31d20$@com>
References: <002a01cabfc5$12ebb460$38c31d20$@com>
Message-ID: <4B97F7DA.9000105@stanford.edu>

Hi Tracy --


A few questions and comments.


1.  It looks like there are two copies of the ProTEK PSB MSDS.  Could 
you please send the MSDS for the primer?  Is it the same as the Protek B 
primer?  If so, that has been approved and there may be some extra 
floating around.


2.  Please use headway2 as I think this is a polyimide-based material 
and polyimides are not typically soluble in acetone -- this would be a 
problem at the laurell.  There are certain precautions to spinning 
polyimides at the headway2 -- please contact James Conway to review them.


3.  I suspect you will also need developer for this material.  Please 
provide an MSDS for the developer.


4.  This is fine to use on the contact aligners, but not the ASML (not 
that you've requested this -- just a reminder.)


5.  If you're willing to share your non-confidential results, we'll 
gladly support your request with a letter or whatever it takes to obtain 
sample-sized quantities for evaluation.


6.  A post-doc researcher has just asked about this very same material.  
He will be getting in touch with you about coordinating evaluation 
efforts.  His coral ID is hdonglee.


Mary




Tracy Fung wrote:
>
> Attached are the MSDS for both the ProTEK PSB and Primer. 
>
> Intended use at headway2 or laurel, as well as UV exposure using 
> KarlSuss.  Also wbgeneral for use as a mask during KOH and TMAH etching.
>
>  
>
> We have been unable to verify the claim that the ProTEK PSB is 
> resistant to strong alkaline etchant such as KOH and TMAH.  And they 
> have been unwilling to supply small quantities (grams) for this 
> purposes.  The minimum $1200 purchase is for 250mL of Primer and 250mL 
> of PSB.  I would like to ask if I can CC an SNF representative in 
> emails requesting sample gram sized quantities for evaluation 
> purposes.  Brewster sciences appears to be interested in the use of 
> their ProTEK PSB at the SNF and perhaps if had more pressure would 
> supply smaller/cheaper evaluation samples.
>
>  
>
> With a confirmation of KOH and TMAH resistance Silexos does plan to 
> purchase larger quantities.
>
>  
>
>  
>
> Tracy Fung
>
> Photovoltaic Engineer
>
>  
>
> Silexos
>
> 1455 Adams Dr, Suite 1610
>
> Menlo Park, CA 94025
>
> 650.716.5172
>
>  
>
>  
>
> This e-mail and any accompanying attachments contain information that 
> is confidential to Silexos, Inc. The information is intended solely 
> for the use of the individual to whom it is addressed. Any review, 
> disclosure, copying, distribution, or use of this e-mail communication 
> by others is strictly prohibited. If you are not the intended 
> recipient, please notify us immediately by returning this message to 
> the sender and delete all copies.
>
>  
>


-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu

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From mtang at stanford.edu  Wed Mar 10 14:44:46 2010
From: mtang at stanford.edu (Mary Tang)
Date: Wed, 10 Mar 2010 14:44:46 -0800
Subject: Addition to request to use aluminum tri-sec butoxide in SNF...
In-Reply-To: <3F24868DDBDC7B46B2289E33B58C4CB11F8ACF0870@QUSWAMI-DSRV1.quswami.local>
References: <3F24868DDBDC7B46B2289E33B58C4CB11F8ACF0870@QUSWAMI-DSRV1.quswami.local>
Message-ID: <4B9820DE.4060908@stanford.edu>

Hi all --

I've just asked Robert for the detailed procedures for what he wants to 
do. (I don't know the chemistries, but am a little concerned that these 
are water and air reactive enough to specifically require dry propanol.)

Mary

Robert Huang wrote:
>
> Dear SNF Spec Mat committee:
>
> In addition to using aluminum tri-sec butoxide from Sigma-Aldrich, I?d 
> like to use the following chemicals from Strem (links to Strem website 
> are given and MSDS sheets attached):
>
> 1) Aluminum s-butoxide - http://www.strem.com/catalog/v/93-1308/ 
> (composition is actually the same as aluminum tri-sec butoxide from 
> Sigma Aldrich, my original request)
>
> 2) Hafnium t-butoxide - http://www.strem.com/catalog/v/72-5800/
>
> 3) Tetramethoxysilane - http://www.strem.com/catalog/v/93-1459/
>
> 4) Zirconium n-butoxide - http://www.strem.com/catalog/v/93-4003/
>
> As with the aluminum tri-sec butoxide, I would be diluting these 
> materials in dry2-propanol (or methanol) and dipping my 4? wafers into 
> the solution. Total solution will remain 100-200mL, just enough to 
> immerse my wafers, and I will then process the wafers on innotec and 
> metallica.
>
> Please review these chemicals as well and let me know if there are any 
> concerns.
>
> Regards,
>
> Robert
>
> *From:* Robert Huang
> *Sent:* Friday, March 05, 2010 9:15 AM
> *To:* specmat at snf.stanford.edu
> *Subject:* request to use aluminum tri-sec butoxide in SNF...
>
> Dear SNF Spec Mat committee:
>
> I would like to use a new chemical in SNF, aluminum tri-sec butoxide 
> (99.99% trace metal basis), and would be obtaining 5-10mL in solution 
> from Sigma-Aldrich. Below is a link to their website on this material:
>
> http://www.sigmaaldrich.com/catalog/ProductDetail.do?lang=en&N4=511609|ALDRICH&N5=SEARCH_CONCAT_PNO|BRAND_KEY&F=SPEC 
> <http://www.sigmaaldrich.com/catalog/ProductDetail.do?lang=en&N4=511609%7CALDRICH&N5=SEARCH_CONCAT_PNO%7CBRAND_KEY&F=SPEC>
>
> In addition, I?m attaching the MSDS sheet for this material.
>
> My intent is to dilute this material (comes in liquid form) in 
> dry2-propanol, then dip my 4? wafers into the solution. I presume this 
> processing would need to be done at wbsolvent. I plan to use 100-200mL 
> of total solution in quartzware, basically whatever is the minimum 
> amount needed that will allow me to immerse my wafers in the solution. 
> Afterwards I intend to process the wafers further on the innotec and 
> metallica tools.
>
> Please let me know if there are any concerns or any special handling 
> requirements.
>
> Regards,
>
> Robert Huang
>
> roberth at quswami.com <mailto:roberth at quswami.com>
>
> 408-854-0450
>


-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu



From tfung at silexos.com  Wed Mar 10 16:36:39 2010
From: tfung at silexos.com (Tracy Fung)
Date: Wed, 10 Mar 2010 16:36:39 -0800
Subject: ProTEK PSB and Primer, polymeric KOH and TMAH mask.
In-Reply-To: <4B97F7DA.9000105@stanford.edu>
References: <002a01cabfc5$12ebb460$38c31d20$@com> <4B97F7DA.9000105@stanford.edu>
Message-ID: <001c01cac0b2$ea8002d0$bf800870$@com>

Hi Mary,

 

4761 is the primer msds

5869 is the photoresist msds

 

I look forward to hearing from hdonglee

 

From: Mary Tang [mailto:mtang at stanford.edu] 
Sent: Wednesday, March 10, 2010 11:50 AM
To: Tracy Fung
Cc: SpecMat at snf.stanford.edu; Mahnaz Mansourpour; James Conway
Subject: Re: ProTEK PSB and Primer, polymeric KOH and TMAH mask.

 

Hi Tracy --


A few questions and comments.


1.  It looks like there are two copies of the ProTEK PSB MSDS.  Could you
please send the MSDS for the primer?  Is it the same as the Protek B primer?
If so, that has been approved and there may be some extra floating around.


2.  Please use headway2 as I think this is a polyimide-based material and
polyimides are not typically soluble in acetone -- this would be a problem
at the laurell.  There are certain precautions to spinning polyimides at the
headway2 -- please contact James Conway to review them.


3.  I suspect you will also need developer for this material.  Please
provide an MSDS for the developer.


4.  This is fine to use on the contact aligners, but not the ASML (not that
you've requested this -- just a reminder.)


5.  If you're willing to share your non-confidential results, we'll gladly
support your request with a letter or whatever it takes to obtain
sample-sized quantities for evaluation.


6.  A post-doc researcher has just asked about this very same material.  He
will be getting in touch with you about coordinating evaluation efforts.
His coral ID is hdonglee.


Mary




Tracy Fung wrote: 

Attached are the MSDS for both the ProTEK PSB and Primer.  

Intended use at headway2 or laurel, as well as UV exposure using KarlSuss.
Also wbgeneral for use as a mask during KOH and TMAH etching. 

 

We have been unable to verify the claim that the ProTEK PSB is resistant to
strong alkaline etchant such as KOH and TMAH.  And they have been unwilling
to supply small quantities (grams) for this purposes.  The minimum $1200
purchase is for 250mL of Primer and 250mL of PSB.  I would like to ask if I
can CC an SNF representative in emails requesting sample gram sized
quantities for evaluation purposes.  Brewster sciences appears to be
interested in the use of their ProTEK PSB at the SNF and perhaps if had more
pressure would supply smaller/cheaper evaluation samples.

 

With a confirmation of KOH and TMAH resistance Silexos does plan to purchase
larger quantities. 

 

 

Tracy Fung

Photovoltaic Engineer

 

Silexos

1455 Adams Dr, Suite 1610

Menlo Park, CA 94025

650.716.5172

 

 

This e-mail and any accompanying attachments contain information that is
confidential to Silexos, Inc. The information is intended solely for the use
of the individual to whom it is addressed. Any review, disclosure, copying,
distribution, or use of this e-mail communication by others is strictly
prohibited. If you are not the intended recipient, please notify us
immediately by returning this message to the sender and delete all copies. 

 






-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu
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From tfung at silexos.com  Wed Mar 10 16:40:05 2010
From: tfung at silexos.com (Tracy Fung)
Date: Wed, 10 Mar 2010 16:40:05 -0800
Subject: ProTEK PSB and Primer, polymeric KOH and TMAH mask.
References: <002a01cabfc5$12ebb460$38c31d20$@com> <4B97F7DA.9000105@stanford.edu> 
Message-ID: <002101cac0b3$6551d060$2ff57120$@com>

Sorry the email got sent before I was finished.

As for the developer, I'll make sure to get a copy of it and email it out as
well.

 

Thanks,

-Tracy

 

 

From: Tracy Fung [mailto:tfung at silexos.com] 
Sent: Wednesday, March 10, 2010 4:37 PM
To: 'Mary Tang'
Cc: 'SpecMat at snf.stanford.edu'; 'Mahnaz Mansourpour'; 'James Conway'
Subject: RE: ProTEK PSB and Primer, polymeric KOH and TMAH mask.

 

Hi Mary,

 

4761 is the primer msds

5869 is the photoresist msds

 

I look forward to hearing from hdonglee

 

From: Mary Tang [mailto:mtang at stanford.edu] 
Sent: Wednesday, March 10, 2010 11:50 AM
To: Tracy Fung
Cc: SpecMat at snf.stanford.edu; Mahnaz Mansourpour; James Conway
Subject: Re: ProTEK PSB and Primer, polymeric KOH and TMAH mask.

 

Hi Tracy --


A few questions and comments.


1.  It looks like there are two copies of the ProTEK PSB MSDS.  Could you
please send the MSDS for the primer?  Is it the same as the Protek B primer?
If so, that has been approved and there may be some extra floating around.


2.  Please use headway2 as I think this is a polyimide-based material and
polyimides are not typically soluble in acetone -- this would be a problem
at the laurell.  There are certain precautions to spinning polyimides at the
headway2 -- please contact James Conway to review them.


3.  I suspect you will also need developer for this material.  Please
provide an MSDS for the developer.


4.  This is fine to use on the contact aligners, but not the ASML (not that
you've requested this -- just a reminder.)


5.  If you're willing to share your non-confidential results, we'll gladly
support your request with a letter or whatever it takes to obtain
sample-sized quantities for evaluation.


6.  A post-doc researcher has just asked about this very same material.  He
will be getting in touch with you about coordinating evaluation efforts.
His coral ID is hdonglee.


Mary




Tracy Fung wrote: 

Attached are the MSDS for both the ProTEK PSB and Primer.  

Intended use at headway2 or laurel, as well as UV exposure using KarlSuss.
Also wbgeneral for use as a mask during KOH and TMAH etching. 

 

We have been unable to verify the claim that the ProTEK PSB is resistant to
strong alkaline etchant such as KOH and TMAH.  And they have been unwilling
to supply small quantities (grams) for this purposes.  The minimum $1200
purchase is for 250mL of Primer and 250mL of PSB.  I would like to ask if I
can CC an SNF representative in emails requesting sample gram sized
quantities for evaluation purposes.  Brewster sciences appears to be
interested in the use of their ProTEK PSB at the SNF and perhaps if had more
pressure would supply smaller/cheaper evaluation samples.

 

With a confirmation of KOH and TMAH resistance Silexos does plan to purchase
larger quantities. 

 

 

Tracy Fung

Photovoltaic Engineer

 

Silexos

1455 Adams Dr, Suite 1610

Menlo Park, CA 94025

650.716.5172

 

 

This e-mail and any accompanying attachments contain information that is
confidential to Silexos, Inc. The information is intended solely for the use
of the individual to whom it is addressed. Any review, disclosure, copying,
distribution, or use of this e-mail communication by others is strictly
prohibited. If you are not the intended recipient, please notify us
immediately by returning this message to the sender and delete all copies. 

 





-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu
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From roberth at quswami.com  Wed Mar 10 17:52:49 2010
From: roberth at quswami.com (Robert Huang)
Date: Wed, 10 Mar 2010 17:52:49 -0800
Subject: additional material...RE: Addition to request to use aluminum
 tri-sec butoxide in SNF...
Message-ID: <3F24868DDBDC7B46B2289E33B58C4CB11F8ACFCDAF@QUSWAMI-DSRV1.quswami.local>

Dear SNF Spec Mat committee:

Attached is a paper which provides more details on how I plan to use these chemicals.  Look at the 1st paragraph in "Experimental Section" on p. 476 as well as the paragraph on p. 477 that starts "After sintering...".

Regards,

Robert
________________________________
From: Robert Huang
Sent: Monday, March 08, 2010 12:46 PM
To: specmat at snf.stanford.edu
Subject: Addition to request to use aluminum tri-sec butoxide in SNF...

Dear SNF Spec Mat committee:

In addition to using aluminum tri-sec butoxide from Sigma-Aldrich, I?d like to use the following chemicals from Strem (links to Strem website are given and MSDS sheets attached):


1)      Aluminum s-butoxide - http://www.strem.com/catalog/v/93-1308/ (composition is actually the same as aluminum tri-sec butoxide from Sigma Aldrich, my original request)

2)      Hafnium t-butoxide - http://www.strem.com/catalog/v/72-5800/

3)      Tetramethoxysilane - http://www.strem.com/catalog/v/93-1459/

4)      Zirconium n-butoxide - http://www.strem.com/catalog/v/93-4003/

As with the aluminum tri-sec butoxide, I would be diluting these materials in dry2-propanol (or methanol) and dipping my 4? wafers into the solution.  Total solution will remain 100-200mL, just enough to immerse my wafers, and I will then process the wafers on innotec and metallica.

Please review these chemicals as well and let me know if there are any concerns.

Regards,

Robert

From: Robert Huang
Sent: Friday, March 05, 2010 9:15 AM
To: specmat at snf.stanford.edu
Subject: request to use aluminum tri-sec butoxide in SNF...

Dear SNF Spec Mat committee:

I would like to use a new chemical in SNF, aluminum tri-sec butoxide (99.99% trace metal basis), and would be obtaining 5-10mL in solution from Sigma-Aldrich.  Below is a link to their website on this material:

http://www.sigmaaldrich.com/catalog/ProductDetail.do?lang=en&N4=511609|ALDRICH&N5=SEARCH_CONCAT_PNO|BRAND_KEY&F=SPEC

In addition, I?m attaching the MSDS sheet for this material.

My intent is to dilute this material (comes in liquid form) in dry2-propanol, then dip my 4? wafers into the solution.  I presume this processing would need to be done at wbsolvent.  I plan to use 100-200mL of total solution in quartzware, basically whatever is the minimum amount needed that will allow me to immerse my wafers in the solution.  Afterwards I intend to process the wafers further on the innotec and metallica tools.

Please let me know if there are any concerns or any special handling requirements.

Regards,

Robert Huang
roberth at quswami.com<mailto:roberth at quswami.com>
408-854-0450
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From mtang at stanford.edu  Thu Mar 11 11:13:42 2010
From: mtang at stanford.edu (Mary Tang)
Date: Thu, 11 Mar 2010 11:13:42 -0800
Subject: additional material...RE: Addition to request to use aluminum
 tri-sec butoxide in SNF...
In-Reply-To: <3F24868DDBDC7B46B2289E33B58C4CB11F8ACFCDAF@QUSWAMI-DSRV1.quswami.local>
References: <3F24868DDBDC7B46B2289E33B58C4CB11F8ACFCDAF@QUSWAMI-DSRV1.quswami.local>
Message-ID: <4B9940E6.5090201@stanford.edu>

Hi Robert --

Thanks!  The protocol describes preparation of the solutions in dry-IPA 
under anaerobic glovebox conditions.  I'm afraid we do not have a 
glovebox here at SNF -- were you planning to make up your solutions 
here?   I'm also not sure how water/air reactive these chemicals are -- 
the MSDS say that they can form possibly explosive mixtures with water 
-- but then, the MSDS for octadecyl trichlorosilane (OTS) says the same 
and this is used a lot in the lab.  I suspect the chemicals you have are 
similar, but you should check on this with the supplier.  (OTS is 
moisture and air sensitive, but basically means that when you let it sit 
around for a few hours, it turns into useless sand, but if you work 
quickly, you can get a good surface coating down.)

So again, please check with your supplier on recommendations for 
handling and using these chemicals.  We can't provide a glovebox here, 
but you may not need one.  Our primary concern is safety (if these are, 
indeed, explosive, then these are a definite no).  The secondary concern 
is whether air/moisture exposure will adversely affect your experiment.  
Please let us know what your supplier or other knowledgeable source 
recommends. 


Mary

Robert Huang wrote:
> Dear SNF Spec Mat committee:
>  
> Attached is a paper which provides more details on how I plan to use 
> these chemicals.  Look at the 1st paragraph in "Experimental Section" 
> on p. 476 as well as the paragraph on p. 477 that starts "After 
> sintering...".
>  
> Regards,
>  
> Robert
> ------------------------------------------------------------------------
> *From:* Robert Huang
> *Sent:* Monday, March 08, 2010 12:46 PM
> *To:* specmat at snf.stanford.edu
> *Subject:* Addition to request to use aluminum tri-sec butoxide in SNF...
>
> Dear SNF Spec Mat committee:
>
>  
>
> In addition to using aluminum tri-sec butoxide from Sigma-Aldrich, I?d 
> like to use the following chemicals from Strem (links to Strem website 
> are given and MSDS sheets attached):
>
>  
>
> 1)      Aluminum s-butoxide - http://www.strem.com/catalog/v/93-1308/ 
> (composition is actually the same as aluminum tri-sec butoxide from 
> Sigma Aldrich, my original request)
>
> 2)      Hafnium t-butoxide - http://www.strem.com/catalog/v/72-5800/
>
> 3)      Tetramethoxysilane - http://www.strem.com/catalog/v/93-1459/
>
> 4)      Zirconium n-butoxide - http://www.strem.com/catalog/v/93-4003/
>
>  
>
> As with the aluminum tri-sec butoxide, I would be diluting these 
> materials in dry2-propanol (or methanol) and dipping my 4? wafers into 
> the solution.  Total solution will remain 100-200mL, just enough to 
> immerse my wafers, and I will then process the wafers on innotec and 
> metallica.
>
>  
>
> Please review these chemicals as well and let me know if there are any 
> concerns.
>
>  
>
> Regards,
>
>  
>
> Robert
>
>  
>
> *From:* Robert Huang
> *Sent:* Friday, March 05, 2010 9:15 AM
> *To:* specmat at snf.stanford.edu
> *Subject:* request to use aluminum tri-sec butoxide in SNF...
>
>  
>
> Dear SNF Spec Mat committee:
>
>  
>
> I would like to use a new chemical in SNF, aluminum tri-sec butoxide 
> (99.99% trace metal basis), and would be obtaining 5-10mL in solution 
> from Sigma-Aldrich.  Below is a link to their website on this material:
>
>  
>
> http://www.sigmaaldrich.com/catalog/ProductDetail.do?lang=en&N4=511609|ALDRICH&N5=SEARCH_CONCAT_PNO|BRAND_KEY&F=SPEC 
> <http://www.sigmaaldrich.com/catalog/ProductDetail.do?lang=en&N4=511609%7CALDRICH&N5=SEARCH_CONCAT_PNO%7CBRAND_KEY&F=SPEC>
>
>  
>
> In addition, I?m attaching the MSDS sheet for this material.
>
>  
>
> My intent is to dilute this material (comes in liquid form) in 
> dry2-propanol, then dip my 4? wafers into the solution.  I presume 
> this processing would need to be done at wbsolvent.  I plan to use 
> 100-200mL of total solution in quartzware, basically whatever is the 
> minimum amount needed that will allow me to immerse my wafers in the 
> solution.  Afterwards I intend to process the wafers further on the 
> innotec and metallica tools.
>
>  
>
> Please let me know if there are any concerns or any special handling 
> requirements.
>
>  
>
> Regards,
>
>  
>
> Robert Huang
>
> roberth at quswami.com <mailto:roberth at quswami.com>
>
> 408-854-0450
>


-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu



From roberth at quswami.com  Mon Mar 15 08:17:58 2010
From: roberth at quswami.com (Robert Huang)
Date: Mon, 15 Mar 2010 08:17:58 -0700
Subject: additional material...RE: Addition to request to use aluminum
 tri-sec butoxide in SNF...
In-Reply-To: <4B9940E6.5090201@stanford.edu>
References: <3F24868DDBDC7B46B2289E33B58C4CB11F8ACFCDAF@QUSWAMI-DSRV1.quswami.local>
 <4B9940E6.5090201@stanford.edu>
Message-ID: <3F24868DDBDC7B46B2289E33B58C4CB11F8ACF08D4@QUSWAMI-DSRV1.quswami.local>

Hi Mary,

Yes, I was planning to make the solutions at SNF.  Are you aware of any other groups on campus that may have anaerobic gloveboxes, perhaps one of the groups that is working on ALD?  If they are also using liquid pre-cursors which I believe are similar to the ones I'm interested in using, then I suspect they may have a glovebox.

In the meantime, I will also double-check with the supplier.

Regards,

Robert 

-----Original Message-----
From: Mary Tang [mailto:mtang at stanford.edu] 
Sent: Thursday, March 11, 2010 11:14 AM
To: Robert Huang
Cc: specmat at snf.stanford.edu
Subject: Re: additional material...RE: Addition to request to use aluminum tri-sec butoxide in SNF...

Hi Robert --

Thanks!  The protocol describes preparation of the solutions in dry-IPA 
under anaerobic glovebox conditions.  I'm afraid we do not have a 
glovebox here at SNF -- were you planning to make up your solutions 
here?   I'm also not sure how water/air reactive these chemicals are -- 
the MSDS say that they can form possibly explosive mixtures with water 
-- but then, the MSDS for octadecyl trichlorosilane (OTS) says the same 
and this is used a lot in the lab.  I suspect the chemicals you have are 
similar, but you should check on this with the supplier.  (OTS is 
moisture and air sensitive, but basically means that when you let it sit 
around for a few hours, it turns into useless sand, but if you work 
quickly, you can get a good surface coating down.)

So again, please check with your supplier on recommendations for 
handling and using these chemicals.  We can't provide a glovebox here, 
but you may not need one.  Our primary concern is safety (if these are, 
indeed, explosive, then these are a definite no).  The secondary concern 
is whether air/moisture exposure will adversely affect your experiment.  
Please let us know what your supplier or other knowledgeable source 
recommends. 


Mary

Robert Huang wrote:
> Dear SNF Spec Mat committee:
>  
> Attached is a paper which provides more details on how I plan to use 
> these chemicals.  Look at the 1st paragraph in "Experimental Section" 
> on p. 476 as well as the paragraph on p. 477 that starts "After 
> sintering...".
>  
> Regards,
>  
> Robert
> ------------------------------------------------------------------------
> *From:* Robert Huang
> *Sent:* Monday, March 08, 2010 12:46 PM
> *To:* specmat at snf.stanford.edu
> *Subject:* Addition to request to use aluminum tri-sec butoxide in SNF...
>
> Dear SNF Spec Mat committee:
>
>  
>
> In addition to using aluminum tri-sec butoxide from Sigma-Aldrich, I'd 
> like to use the following chemicals from Strem (links to Strem website 
> are given and MSDS sheets attached):
>
>  
>
> 1)      Aluminum s-butoxide - http://www.strem.com/catalog/v/93-1308/ 
> (composition is actually the same as aluminum tri-sec butoxide from 
> Sigma Aldrich, my original request)
>
> 2)      Hafnium t-butoxide - http://www.strem.com/catalog/v/72-5800/
>
> 3)      Tetramethoxysilane - http://www.strem.com/catalog/v/93-1459/
>
> 4)      Zirconium n-butoxide - http://www.strem.com/catalog/v/93-4003/
>
>  
>
> As with the aluminum tri-sec butoxide, I would be diluting these 
> materials in dry2-propanol (or methanol) and dipping my 4" wafers into 
> the solution.  Total solution will remain 100-200mL, just enough to 
> immerse my wafers, and I will then process the wafers on innotec and 
> metallica.
>
>  
>
> Please review these chemicals as well and let me know if there are any 
> concerns.
>
>  
>
> Regards,
>
>  
>
> Robert
>
>  
>
> *From:* Robert Huang
> *Sent:* Friday, March 05, 2010 9:15 AM
> *To:* specmat at snf.stanford.edu
> *Subject:* request to use aluminum tri-sec butoxide in SNF...
>
>  
>
> Dear SNF Spec Mat committee:
>
>  
>
> I would like to use a new chemical in SNF, aluminum tri-sec butoxide 
> (99.99% trace metal basis), and would be obtaining 5-10mL in solution 
> from Sigma-Aldrich.  Below is a link to their website on this material:
>
>  
>
> http://www.sigmaaldrich.com/catalog/ProductDetail.do?lang=en&N4=511609|ALDRICH&N5=SEARCH_CONCAT_PNO|BRAND_KEY&F=SPEC 
> <http://www.sigmaaldrich.com/catalog/ProductDetail.do?lang=en&N4=511609%7CALDRICH&N5=SEARCH_CONCAT_PNO%7CBRAND_KEY&F=SPEC>
>
>  
>
> In addition, I'm attaching the MSDS sheet for this material.
>
>  
>
> My intent is to dilute this material (comes in liquid form) in 
> dry2-propanol, then dip my 4" wafers into the solution.  I presume 
> this processing would need to be done at wbsolvent.  I plan to use 
> 100-200mL of total solution in quartzware, basically whatever is the 
> minimum amount needed that will allow me to immerse my wafers in the 
> solution.  Afterwards I intend to process the wafers further on the 
> innotec and metallica tools.
>
>  
>
> Please let me know if there are any concerns or any special handling 
> requirements.
>
>  
>
> Regards,
>
>  
>
> Robert Huang
>
> roberth at quswami.com <mailto:roberth at quswami.com>
>
> 408-854-0450
>


-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu



From mtang at stanford.edu  Mon Mar 15 13:39:52 2010
From: mtang at stanford.edu (Mary Tang)
Date: Mon, 15 Mar 2010 13:39:52 -0700
Subject: [Fwd: RE: ProTEK PSB and Primer, polymeric KOH and TMAH mask.]
Message-ID: <4B9E9B18.7040200@stanford.edu>

Hi all --

I've just verbally OK'ed this.  These are all storage group L.  She 
plans on ordering 250 ml of the primer and the  PSB material.  She 
didn't know, but I'm assuming that there will be a gallon of the El 
material which seems to be primarily ethyl lactate.  She will contact 
Mahnaz about labels and storage (sorry Mahnaz, though if it's any 
consolation, I think there's a possibility of a good long lead time.) 

Two other people have asked about photosensitive Protek, so I've 
referred them to Tracy -- she is OK with this.

Mary

-------- Original Message --------
Subject: 	RE: ProTEK PSB and Primer, polymeric KOH and TMAH mask.
Date: 	Wed, 10 Mar 2010 16:56:52 -0800
From: 	Tracy Fung <tfung at silexos.com>
To: 	'Mary Tang' <mtang at stanford.edu>
References: 	<002a01cabfc5$12ebb460$38c31d20$@com> 
<4B97F7DA.9000105 at stanford.edu> <002101cac0b3$6551d060$2ff57120$@com> 
<4B983CD8.4000605 at stanford.edu>



Sorry about that

 

I've attached both msds to this email.  Also from the presentation the 
claim is the photoresist is solvent developable.  In ProTEK's example 
process they appear to use EL which I assume is ethel lactate. I'll be 
double checking with their representative.

 

-Tracy

 

*From:* Mary Tang [mailto:mtang at stanford.edu]
*Sent:* Wednesday, March 10, 2010 4:44 PM
*To:* Tracy Fung
*Subject:* Re: ProTEK PSB and Primer, polymeric KOH and TMAH mask.

 

Hi Tracy --

We got two copies of the 5869 and none of the 4761 in your original 
request in addition to the nifty powerpoint presentation.  Could you 
please send again?

Thanks,

mary

Tracy Fung wrote:

Sorry the email got sent before I was finished.

As for the developer, I'll make sure to get a copy of it and email it 
out as well.

 

Thanks,

-Tracy

 

 

*From:* Tracy Fung [mailto:tfung at silexos.com]
*Sent:* Wednesday, March 10, 2010 4:37 PM
*To:* 'Mary Tang'
*Cc:* 'SpecMat at snf.stanford.edu <mailto:SpecMat at snf.stanford.edu>'; 
'Mahnaz Mansourpour'; 'James Conway'
*Subject:* RE: ProTEK PSB and Primer, polymeric KOH and TMAH mask.

 

Hi Mary,

 

4761 is the primer msds

5869 is the photoresist msds

 

I look forward to hearing from hdonglee

 

*From:* Mary Tang [mailto:mtang at stanford.edu]
*Sent:* Wednesday, March 10, 2010 11:50 AM
*To:* Tracy Fung
*Cc:* SpecMat at snf.stanford.edu <mailto:SpecMat at snf.stanford.edu>; Mahnaz 
Mansourpour; James Conway
*Subject:* Re: ProTEK PSB and Primer, polymeric KOH and TMAH mask.

 

Hi Tracy --


A few questions and comments.


1.  It looks like there are two copies of the ProTEK PSB MSDS.  Could 
you please send the MSDS for the primer?  Is it the same as the Protek B 
primer?  If so, that has been approved and there may be some extra 
floating around.


2.  Please use headway2 as I think this is a polyimide-based material 
and polyimides are not typically soluble in acetone -- this would be a 
problem at the laurell.  There are certain precautions to spinning 
polyimides at the headway2 -- please contact James Conway to review them.


3.  I suspect you will also need developer for this material.  Please 
provide an MSDS for the developer.


4.  This is fine to use on the contact aligners, but not the ASML (not 
that you've requested this -- just a reminder.)


5.  If you're willing to share your non-confidential results, we'll 
gladly support your request with a letter or whatever it takes to obtain 
sample-sized quantities for evaluation.


6.  A post-doc researcher has just asked about this very same material.  
He will be getting in touch with you about coordinating evaluation 
efforts.  His coral ID is hdonglee.


Mary




Tracy Fung wrote:

Attached are the MSDS for both the ProTEK PSB and Primer. 

Intended use at headway2 or laurel, as well as UV exposure using 
KarlSuss.  Also wbgeneral for use as a mask during KOH and TMAH etching.

 

We have been unable to verify the claim that the ProTEK PSB is resistant 
to strong alkaline etchant such as KOH and TMAH.  And they have been 
unwilling to supply small quantities (grams) for this purposes.  The 
minimum $1200 purchase is for 250mL of Primer and 250mL of PSB.  I would 
like to ask if I can CC an SNF representative in emails requesting 
sample gram sized quantities for evaluation purposes.  Brewster sciences 
appears to be interested in the use of their ProTEK PSB at the SNF and 
perhaps if had more pressure would supply smaller/cheaper evaluation 
samples.

 

With a confirmation of KOH and TMAH resistance Silexos does plan to 
purchase larger quantities.

 

 

Tracy Fung

Photovoltaic Engineer

 

Silexos

1455 Adams Dr, Suite 1610

Menlo Park, CA 94025

650.716.5172

 

 

This e-mail and any accompanying attachments contain information that is 
confidential to Silexos, Inc. The information is intended solely for the 
use of the individual to whom it is addressed. Any review, disclosure, 
copying, distribution, or use of this e-mail communication by others is 
strictly prohibited. If you are not the intended recipient, please 
notify us immediately by returning this message to the sender and delete 
all copies.

 




-- 

Mary X. Tang, Ph.D.

Stanford Nanofabrication Facility

CIS Room 136, Mail Code 4070

Stanford, CA  94305

(650)723-9980

mtang at stanford.edu <mailto:mtang at stanford.edu>

http://snf.stanford.edu




-- 

Mary X. Tang, Ph.D.

Stanford Nanofabrication Facility

CIS Room 136, Mail Code 4070

Stanford, CA  94305

(650)723-9980

mtang at stanford.edu <mailto:mtang at stanford.edu>

http://snf.stanford.edu


-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu

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From mtang at stanford.edu  Mon Mar 15 13:40:32 2010
From: mtang at stanford.edu (Mary Tang)
Date: Mon, 15 Mar 2010 13:40:32 -0700
Subject: [Fwd: RE: ProTEK PSB and Primer, polymeric KOH and TMAH mask.]
Message-ID: <4B9E9B40.8000804@stanford.edu>

Hi all --

For the record, Protek PSB developer.

M

-------- Original Message --------
Subject: 	RE: ProTEK PSB and Primer, polymeric KOH and TMAH mask.
Date: 	Wed, 10 Mar 2010 19:04:04 -0800
From: 	Tracy Fung <tfung at silexos.com>
To: 	'Mary Tang' <mtang at stanford.edu>
References: 	<002a01cabfc5$12ebb460$38c31d20$@com> 
<4B97F7DA.9000105 at stanford.edu> <002101cac0b3$6551d060$2ff57120$@com> 
<4B983CD8.4000605 at stanford.edu>



Mary,

 

Attached is the msds for the Ethyl Lactate, which is used as a solvent 
developer.

 

-Tracy

 

 

*From:* Mary Tang [mailto:mtang at stanford.edu]
*Sent:* Wednesday, March 10, 2010 4:44 PM
*To:* Tracy Fung
*Subject:* Re: ProTEK PSB and Primer, polymeric KOH and TMAH mask.

 

Hi Tracy --

We got two copies of the 5869 and none of the 4761 in your original 
request in addition to the nifty powerpoint presentation.  Could you 
please send again?

Thanks,

mary

Tracy Fung wrote:

Sorry the email got sent before I was finished.

As for the developer, I'll make sure to get a copy of it and email it 
out as well.

 

Thanks,

-Tracy

 

 

*From:* Tracy Fung [mailto:tfung at silexos.com]
*Sent:* Wednesday, March 10, 2010 4:37 PM
*To:* 'Mary Tang'
*Cc:* 'SpecMat at snf.stanford.edu <mailto:SpecMat at snf.stanford.edu>'; 
'Mahnaz Mansourpour'; 'James Conway'
*Subject:* RE: ProTEK PSB and Primer, polymeric KOH and TMAH mask.

 

Hi Mary,

 

4761 is the primer msds

5869 is the photoresist msds

 

I look forward to hearing from hdonglee

 

*From:* Mary Tang [mailto:mtang at stanford.edu]
*Sent:* Wednesday, March 10, 2010 11:50 AM
*To:* Tracy Fung
*Cc:* SpecMat at snf.stanford.edu <mailto:SpecMat at snf.stanford.edu>; Mahnaz 
Mansourpour; James Conway
*Subject:* Re: ProTEK PSB and Primer, polymeric KOH and TMAH mask.

 

Hi Tracy --


A few questions and comments.


1.  It looks like there are two copies of the ProTEK PSB MSDS.  Could 
you please send the MSDS for the primer?  Is it the same as the Protek B 
primer?  If so, that has been approved and there may be some extra 
floating around.


2.  Please use headway2 as I think this is a polyimide-based material 
and polyimides are not typically soluble in acetone -- this would be a 
problem at the laurell.  There are certain precautions to spinning 
polyimides at the headway2 -- please contact James Conway to review them.


3.  I suspect you will also need developer for this material.  Please 
provide an MSDS for the developer.


4.  This is fine to use on the contact aligners, but not the ASML (not 
that you've requested this -- just a reminder.)


5.  If you're willing to share your non-confidential results, we'll 
gladly support your request with a letter or whatever it takes to obtain 
sample-sized quantities for evaluation.


6.  A post-doc researcher has just asked about this very same material.  
He will be getting in touch with you about coordinating evaluation 
efforts.  His coral ID is hdonglee.


Mary




Tracy Fung wrote:

Attached are the MSDS for both the ProTEK PSB and Primer. 

Intended use at headway2 or laurel, as well as UV exposure using 
KarlSuss.  Also wbgeneral for use as a mask during KOH and TMAH etching.

 

We have been unable to verify the claim that the ProTEK PSB is resistant 
to strong alkaline etchant such as KOH and TMAH.  And they have been 
unwilling to supply small quantities (grams) for this purposes.  The 
minimum $1200 purchase is for 250mL of Primer and 250mL of PSB.  I would 
like to ask if I can CC an SNF representative in emails requesting 
sample gram sized quantities for evaluation purposes.  Brewster sciences 
appears to be interested in the use of their ProTEK PSB at the SNF and 
perhaps if had more pressure would supply smaller/cheaper evaluation 
samples.

 

With a confirmation of KOH and TMAH resistance Silexos does plan to 
purchase larger quantities.

 

 

Tracy Fung

Photovoltaic Engineer

 

Silexos

1455 Adams Dr, Suite 1610

Menlo Park, CA 94025

650.716.5172

 

 

This e-mail and any accompanying attachments contain information that is 
confidential to Silexos, Inc. The information is intended solely for the 
use of the individual to whom it is addressed. Any review, disclosure, 
copying, distribution, or use of this e-mail communication by others is 
strictly prohibited. If you are not the intended recipient, please 
notify us immediately by returning this message to the sender and delete 
all copies.

 




-- 

Mary X. Tang, Ph.D.

Stanford Nanofabrication Facility

CIS Room 136, Mail Code 4070

Stanford, CA  94305

(650)723-9980

mtang at stanford.edu <mailto:mtang at stanford.edu>

http://snf.stanford.edu




-- 

Mary X. Tang, Ph.D.

Stanford Nanofabrication Facility

CIS Room 136, Mail Code 4070

Stanford, CA  94305

(650)723-9980

mtang at stanford.edu <mailto:mtang at stanford.edu>

http://snf.stanford.edu


-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu

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From mtang at stanford.edu  Wed Mar 17 15:49:52 2010
From: mtang at stanford.edu (Mary Tang)
Date: Wed, 17 Mar 2010 15:49:52 -0700
Subject: [Fwd: FW: Sachem etchant]
Message-ID: <4BA15C90.3050605@stanford.edu>

Hi all --

For the record, here's Erhan's SpecMat request email which I am not sure 
he actually sent.

Mary

-------- Original Message --------
Subject: 	FW: Sachem etchant
Date: 	Fri, 19 Feb 2010 11:13:51 -0800
From: 	Erhan Ata <erhanata at fortemedia.com>
To: 	'Mary Tang' <mtang at stanford.edu>



Hi Mary,

About a month ago I've send you the following email. Do I need to 
forward the same info to specmat, or do you think you can OK it?

 

Kind regards,

 

Erhan Ata,

Fortemedia, Inc.

 

------------------------------------------------------------------------

*From:* Erhan Ata [mailto:erhanata at fortemedia.com]
*Sent:* Tuesday, January 19, 2010 12:18 PM
*To:* 'Mary Tang'
*Subject:* Sachem etchant

 

Hi Mary,

After discussions with the vendor we've decided that it would be best if 
we could do our own experiments at SNF by using the Sachem SE1140 if 
possible.

I prepared the following information, but before sending it out to 
specmat wanted to get your feedback on this.

Please let me know if you have any comments, questions.

Sincerely,

 

Erhan

  

 

*CONTACT INFO:*

Erhan Ata

Coral ID: eata

Cell: (650) 224 7894

Tel: (408) 716 8021

erhanata at fortemedia.com

Fortemedia, Inc.

*MATERIAL INFO:*

SACHEM SE-1140: Low water HF based oxide etchant. MSDS attached.

Composition by weight: HF (<6%), Water (25-45%), Proprietary Component 
(<80%)

*MANUFACTURER INFO:*

Sachem, Inc.

821 Woodward Street

Austin, Texas 78704

Phone: (512) 421-4900

*REASON FOR REQUEST:*

Highly selective against Silicon Nitride. Especially oxide to PECVD SiN 
etch selectivity in HF/BHF solutions is very poor. SE-1140 offers very 
good selectivity.

*PROCESS FLOW:*

Since this etchant contains HF we're planning to use gold contaminated 
general purpose wet benches (WBGEN, WBGAAS), following procedures 
applicable to HF based etchants unless otherwise recommended by SNF staff.

We plan to test etch rates of thin film materials, such as SiN, PSG, 
TEOS and HDP oxides, and metals such as Al, TiN, and Cu. All of these 
materials will come from a leading CMOS foundry.  Since we're not 
planning to do any further processing in any of SNF tools (except thin 
film metrology and optical inspections) we believe there's no reason for 
SNF to be concerned about contamination from these wafers and materials 
on them.

*AMOUNT AND FORM:*

About a gallon, in liquid form. No mixing or heating required, usage 
similar to BOE.

*STORAGE:*

We are targeting a short storage time, around a week at most. However, 
depending on timing of arrival of etchant and thin film materials, we 
may request an extension of storage.

*DISPOSAL:*

Our company does not handle chemicals; therefore we don't have any 
disposal service set up. We prefer to work with SNF for disposal but if 
required we can outsource it.


-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu

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From mtang at stanford.edu  Wed Mar 17 15:56:04 2010
From: mtang at stanford.edu (Mary Tang)
Date: Wed, 17 Mar 2010 15:56:04 -0700
Subject: [Fwd: HF/BOE based chemicals for our trials]
Message-ID: <4BA15E04.6080409@stanford.edu>

And which I guess is here.

This can be disposed of as usual in the HF drain at wbgeneral or 
wbgaas.  Although the major component of Sachem is listed as 
proprietary, it is evidently tetrabutyl phosphonium hydroxide which is 
commonly used in selective etch mixtures and can be disposed of through 
normal means.  The only concern I have is if there's enough space in the 
passthrough -- will check with Uli.


Mary

-------- Original Message --------
Subject: 	HF/BOE based chemicals for our trials
Date: 	Wed, 17 Mar 2010 15:40:06 -0700
From: 	Erhan Ata <erhanata at fortemedia.com>
To: 	'Mary Tang' <mtang at stanford.edu>, <mahnaz at snf.stanford.edu>
CC: 	<dcala at snf.stanford.edu>



Hi Mary, Mahnaz and David,

 

Attached are MSDS for the custom chemical that we've ordered from Sachem 
(SE-1140). Apparently they have shipped it earlier than we asked for and 
had already been delivered to SNF. There should be two 1 gallon containers.

 

We also would like to order another chemical, known as *Silox Vapox III* 
 from Transene, (http://www.transene.com/sio2.html#silox). We have not 
ordered it yet but I would like to order *one quart* this week and we 
should receive next week if that's OK.

I also attached an MSDS for Silox Vapox.

We plan to use WBGAAS, or WBGENERAL and should need the chemicals for 3 
months or less (tentatively), depending on the results we get, we may 
give up using them earlier or ask for extension.

 

Please let me know if I need to provide further info.

 

Sincerely,

 

Erhan Ata

Fortemedia, Inc.

 

Cell: (650) 224 7894

 

 


-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu

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From mtang at stanford.edu  Wed Mar 17 16:03:44 2010
From: mtang at stanford.edu (Mary Tang)
Date: Wed, 17 Mar 2010 16:03:44 -0700
Subject: HF/BOE based chemicals for our trials
In-Reply-To: <760BAAF7562C435881961CBD18D8665D@eadelld430>
References: <760BAAF7562C435881961CBD18D8665D@eadelld430>
Message-ID: <4BA15FD0.9010705@stanford.edu>

Hi Erhan --

These should be OK to use. These should be stored in the chemicals 
passthrough. Please check with Uli to make sure there is sufficient 
space in there first.

If there is, please get in touch with Mahnaz to obtain yellow labels and 
barcodes -- and log your chemicals in the book. Fill out the labels. 
Make sure to write in a "to remove by" date. Ask a staff member to help 
you place your labeled chemicals in the passthrough.

When you use the chemicals, waste chemical and first few rinses should 
be put into the HF drain.

Thanks,

Mary

Erhan Ata wrote:
>
> Hi Mary, Mahnaz and David,
>
> Attached are MSDS for the custom chemical that we?ve ordered from 
> Sachem (SE-1140). Apparently they have shipped it earlier than we 
> asked for and had already been delivered to SNF. There should be two 1 
> gallon containers.
>
> We also would like to order another chemical, known as *Silox Vapox 
> III* from Transene, (http://www.transene.com/sio2.html#silox). We have 
> not ordered it yet but I would like to order *one quart* this week and 
> we should receive next week if that?s OK.
>
> I also attached an MSDS for Silox Vapox.
>
> We plan to use WBGAAS, or WBGENERAL and should need the chemicals for 
> 3 months or less (tentatively), depending on the results we get, we 
> may give up using them earlier or ask for extension.
>
> Please let me know if I need to provide further info.
>
> Sincerely,
>
> Erhan Ata
>
> Fortemedia, Inc.
>
> Cell: (650) 224 7894
>


-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu



From tzhu at us.aosmd.com  Thu Mar 18 22:22:07 2010
From: tzhu at us.aosmd.com (Gavin Zhu [US Gavin Zhu])
Date: Thu, 18 Mar 2010 22:22:07 -0700
Subject: Transene Ni etchant
Message-ID: <FFDF9821E5340749AC2A18AE7D8A38A0055F4E7A@diamond.us.aosmd.com>

Dear Specmat committee, 

 

I would like to purchase one bottle of Transene Ni etchant, please see
the attached MSDS, I talked with Mahnaz and Uli, Uli told me we do not
have Ni etchant, so I will buy myself, this product is most common used
in industry.

Your approval will be much appreciated,

 

Best regards,

Gavin

 

Alpha & Omega Semiconductor, Inc.

495 Mercury Drive | Sunnyvale CA 94085 | USA

Direct: 408-789-3207 | Fax: 408-830-9749

Email: tzhu at aosmd.com <mailto:tzhu at aosmd.com>  

 

 

 

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From mtang at stanford.edu  Thu Mar 18 22:58:55 2010
From: mtang at stanford.edu (Mary Tang)
Date: Thu, 18 Mar 2010 22:58:55 -0700
Subject: Transene Ni etchant
In-Reply-To: <FFDF9821E5340749AC2A18AE7D8A38A0055F4E7A@diamond.us.aosmd.com>
References: <FFDF9821E5340749AC2A18AE7D8A38A0055F4E7A@diamond.us.aosmd.com>
Message-ID: <4BA3129F.1070506@stanford.edu>

Hi Gavin --

This should be OK, provided the following:

1.  Let us know how much you have ordered.  Preferably, no more than a 
one gallon bottle.  Not a case again, please.  Have it shipped to SNF, 
attention to you.  Make sure David and Marie know this is coming and how 
to get in touch with you.

2.  Obtain a yellow label and barcode from Mahnaz or other SpecMat 
member.  Log your acid in the logbook.  Put a use-by or dispose-of-by 
date.  3-6 months is usually reasonable. 

3.  When the acid arrives, arrange with David, Marie or other staff 
member to help you place it in the chemical passthrough.  This chemical 
should be stored in the designated personal chemicals storage area of 
the passthrough.

4.  This should be used at wbgeneral or wbgaas.  Where will your nickel 
containing wafers be processed next?  Waste should be collected locally, 
along with the first few rinses.   Use standard procedure for labeling 
waste.

5.  When you do not think you will use the chemical any more, please 
dispose of as hazardous waste.


Mary

Gavin Zhu [US Gavin Zhu] wrote:
>
> Dear Specmat committee,
>
>  
>
> I would like to purchase one bottle of Transene Ni etchant, please see 
> the attached MSDS, I talked with Mahnaz and Uli, Uli told me we do not 
> have Ni etchant, so I will buy myself, this product is most common 
> used in industry.
>
> Your approval will be much appreciated,
>
>  
>
> Best regards,
>
> Gavin
>
>  
>
> **Alpha & Omega Semiconductor, Inc.**
>
> 495 Mercury Drive | Sunnyvale CA 94085 | USA
>
> Direct: 408-789-3207 | Fax: 408-830-9749
>
> Email: tzhu at aosmd.com <mailto:tzhu at aosmd.com>
>
>  
>
>  
>

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From tzhu at us.aosmd.com  Fri Mar 19 10:10:44 2010
From: tzhu at us.aosmd.com (Gavin Zhu [US Gavin Zhu])
Date: Fri, 19 Mar 2010 10:10:44 -0700
Subject: Transene Ni etchant
In-Reply-To: <4BA3129F.1070506@stanford.edu>
Message-ID: <FFDF9821E5340749AC2A18AE7D8A38A0055F4F57@diamond.us.aosmd.com>

Hi Mary,

 

Thanks so much for your approval, I will make sure this time is only one
bottle of gallon and make sure follow the rest of rules as always.

 

Best regards,

Gavin

 

Alpha & Omega Semiconductor, Inc.

495 Mercury Drive | Sunnyvale CA 94085 | USA

Direct: 408-789-3207 | Fax: 408-830-9749

Email: tzhu at aosmd.com <mailto:tzhu at aosmd.com>  

 

 

 

________________________________

From: Mary Tang [mailto:mtang at stanford.edu] 
Sent: Thursday, March 18, 2010 10:59 PM
To: Gavin Zhu [US Gavin Zhu]
Cc: specmat at snf.stanford.edu
Subject: Re: Transene Ni etchant

 

Hi Gavin --

This should be OK, provided the following:

1.  Let us know how much you have ordered.  Preferably, no more than a
one gallon bottle.  Not a case again, please.  Have it shipped to SNF,
attention to you.  Make sure David and Marie know this is coming and how
to get in touch with you.

2.  Obtain a yellow label and barcode from Mahnaz or other SpecMat
member.  Log your acid in the logbook.  Put a use-by or dispose-of-by
date.  3-6 months is usually reasonable.  

3.  When the acid arrives, arrange with David, Marie or other staff
member to help you place it in the chemical passthrough.  This chemical
should be stored in the designated personal chemicals storage area of
the passthrough.

4.  This should be used at wbgeneral or wbgaas.  Where will your nickel
containing wafers be processed next?  Waste should be collected locally,
along with the first few rinses.   Use standard procedure for labeling
waste.

5.  When you do not think you will use the chemical any more, please
dispose of as hazardous waste.


Mary

Gavin Zhu [US Gavin Zhu] wrote: 

Dear Specmat committee, 

 

I would like to purchase one bottle of Transene Ni etchant, please see
the attached MSDS, I talked with Mahnaz and Uli, Uli told me we do not
have Ni etchant, so I will buy myself, this product is most common used
in industry.

Your approval will be much appreciated,

 

Best regards,

Gavin

 

Alpha & Omega Semiconductor, Inc.

495 Mercury Drive | Sunnyvale CA 94085 | USA

Direct: 408-789-3207 | Fax: 408-830-9749

Email: tzhu at aosmd.com <mailto:tzhu at aosmd.com>  

 



 

 

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From jqguo at stanford.edu  Tue Mar 30 10:41:30 2010
From: jqguo at stanford.edu (Jiquan Guo)
Date: Tue, 30 Mar 2010 10:41:30 -0700
Subject: Request to use Nb(Niobium) and Sn(Tin) targets in Metalica
Message-ID: <001b01cad030$4054b020$c0fe1060$@edu>

Contact name: Jiquan Guo (650)804-9662, jqguo at stanford.edu, coral name jqguo
PI: Sami Tantawi

Chemical to be used: Nb(Niobium) sputtering target, Sn(Tin) sputtering
target
Vendor info:
http://www.lesker.com/newweb/deposition_materials/depositionmaterials_CertFo
rm.cfm?partno=EJTSNXX501A4

http://www.lesker.com/newweb/deposition_materials/depositionmaterials_CertFo
rm.cfm?partno=EJTNBXX351A2


Reason for request: sputter Nb, Sn, Ti to form superconducting films on
Sapphire 

Process flow: Clean Sapphire substrate at Wbgen, sputter 1 or 2 of Nb/Ti/Sn
in Metalica. 

Amount and form: one target(1" Dia and 0.125" thickness) for each material

Storage: Outside

Disposal: NA