[Fwd: RE: ProTEK PSB and Primer, polymeric KOH and TMAH mask.]
Mary Tang
mtang at stanford.edu
Mon Mar 15 13:40:32 PDT 2010
Hi all --
For the record, Protek PSB developer.
M
-------- Original Message --------
Subject: RE: ProTEK PSB and Primer, polymeric KOH and TMAH mask.
Date: Wed, 10 Mar 2010 19:04:04 -0800
From: Tracy Fung <tfung at silexos.com>
To: 'Mary Tang' <mtang at stanford.edu>
References: <002a01cabfc5$12ebb460$38c31d20$@com>
<4B97F7DA.9000105 at stanford.edu> <002101cac0b3$6551d060$2ff57120$@com>
<4B983CD8.4000605 at stanford.edu>
Mary,
Attached is the msds for the Ethyl Lactate, which is used as a solvent
developer.
-Tracy
*From:* Mary Tang [mailto:mtang at stanford.edu]
*Sent:* Wednesday, March 10, 2010 4:44 PM
*To:* Tracy Fung
*Subject:* Re: ProTEK PSB and Primer, polymeric KOH and TMAH mask.
Hi Tracy --
We got two copies of the 5869 and none of the 4761 in your original
request in addition to the nifty powerpoint presentation. Could you
please send again?
Thanks,
mary
Tracy Fung wrote:
Sorry the email got sent before I was finished.
As for the developer, I'll make sure to get a copy of it and email it
out as well.
Thanks,
-Tracy
*From:* Tracy Fung [mailto:tfung at silexos.com]
*Sent:* Wednesday, March 10, 2010 4:37 PM
*To:* 'Mary Tang'
*Cc:* 'SpecMat at snf.stanford.edu <mailto:SpecMat at snf.stanford.edu>';
'Mahnaz Mansourpour'; 'James Conway'
*Subject:* RE: ProTEK PSB and Primer, polymeric KOH and TMAH mask.
Hi Mary,
4761 is the primer msds
5869 is the photoresist msds
I look forward to hearing from hdonglee
*From:* Mary Tang [mailto:mtang at stanford.edu]
*Sent:* Wednesday, March 10, 2010 11:50 AM
*To:* Tracy Fung
*Cc:* SpecMat at snf.stanford.edu <mailto:SpecMat at snf.stanford.edu>; Mahnaz
Mansourpour; James Conway
*Subject:* Re: ProTEK PSB and Primer, polymeric KOH and TMAH mask.
Hi Tracy --
A few questions and comments.
1. It looks like there are two copies of the ProTEK PSB MSDS. Could
you please send the MSDS for the primer? Is it the same as the Protek B
primer? If so, that has been approved and there may be some extra
floating around.
2. Please use headway2 as I think this is a polyimide-based material
and polyimides are not typically soluble in acetone -- this would be a
problem at the laurell. There are certain precautions to spinning
polyimides at the headway2 -- please contact James Conway to review them.
3. I suspect you will also need developer for this material. Please
provide an MSDS for the developer.
4. This is fine to use on the contact aligners, but not the ASML (not
that you've requested this -- just a reminder.)
5. If you're willing to share your non-confidential results, we'll
gladly support your request with a letter or whatever it takes to obtain
sample-sized quantities for evaluation.
6. A post-doc researcher has just asked about this very same material.
He will be getting in touch with you about coordinating evaluation
efforts. His coral ID is hdonglee.
Mary
Tracy Fung wrote:
Attached are the MSDS for both the ProTEK PSB and Primer.
Intended use at headway2 or laurel, as well as UV exposure using
KarlSuss. Also wbgeneral for use as a mask during KOH and TMAH etching.
We have been unable to verify the claim that the ProTEK PSB is resistant
to strong alkaline etchant such as KOH and TMAH. And they have been
unwilling to supply small quantities (grams) for this purposes. The
minimum $1200 purchase is for 250mL of Primer and 250mL of PSB. I would
like to ask if I can CC an SNF representative in emails requesting
sample gram sized quantities for evaluation purposes. Brewster sciences
appears to be interested in the use of their ProTEK PSB at the SNF and
perhaps if had more pressure would supply smaller/cheaper evaluation
samples.
With a confirmation of KOH and TMAH resistance Silexos does plan to
purchase larger quantities.
Tracy Fung
Photovoltaic Engineer
Silexos
1455 Adams Dr, Suite 1610
Menlo Park, CA 94025
650.716.5172
This e-mail and any accompanying attachments contain information that is
confidential to Silexos, Inc. The information is intended solely for the
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notify us immediately by returning this message to the sender and delete
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--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang at stanford.edu <mailto:mtang at stanford.edu>
http://snf.stanford.edu
--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang at stanford.edu <mailto:mtang at stanford.edu>
http://snf.stanford.edu
--
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
CIS Room 136, Mail Code 4070
Stanford, CA 94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu
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