Fwd: Re: Innovadynamics Technical Liaison

Ed Myers edmyers at stanford.edu
Fri Nov 19 09:03:32 PST 2010


These guys have never been up front with what they wanted to do.  I 
suggest they go back through their technical liaison for 
clarification of their needs.  I had a feeling they needed to be watched.


>Date: Thu, 28 Oct 2010 10:10:24 -0700
>To: Mike Young <mike.young at innovadynamics.com>
>From: Ed Myers <edmyers at stanford.edu>
>Subject: Re: SNF Technical Liaison
>Cc: Maureen Baran <mbaran at stanford.edu>, Matthew Robinson 
><matt at innovadynamics.com>
>As an organization we don't have much experience on the spray coater 
>since it is a relatively new to our facility.  We will need to make 
>sure we have chucks or a chucking process compatible with the shape 
>of  your sample.  I don't anticipate this being a problem.  The 
>other spray coat question will be solvent compatibility with your 
>plastic substrate, since the resist is heavily diluted during coating.
>TEOS is a concern.  I am not sure our system deposition temperature 
>is compatible with either glass or plastic.  I do see lab members 
>use our PECVD oxide deposition at much lower temperatures.  This is 
>not something we enjoy as it takes a long day to complete the 
>deposition do to the pre- and post- cleaning of the chamber.
>The metrology tools should not be a problem.  We do request chemical 
>usage of stocked materials.
>Any chemicals which are brought in to the facility must be approved 
>by specmat.  This will require MSDS, volumes and how the chemicals 
>will be used and disposed.  As for hand tools and notebooks, they 
>are allowed as long as they are clean room compatible.  We provide 
>all gowning materials.
>The concern I see is the oxide deposition.
>At 09:52 AM 10/28/2010, Mike Young wrote:
>>Hi Ed and Maureen,
>>As a first project to familiarize ourselves with the SNF, Matt and 
>>I would like to get trained on the EVG 101 Resist spray coater to 
>>coat resist onto our devices.  These devices have glass and/or 
>>organic polymer from which we would like to pattern conducting 
>>arrays for EMI, solar, and display applications.  The goal with 
>>this project is to study the effect of various surface 
>>functionalizations, etching, and cleaning procedures on the wetting 
>>of glass and plastic substrates with various coatings.  For 
>>etching, we want to use various acids and bases available at SNF to 
>>clean our glass and plastic.  After the photoresist deposition, we 
>>would like to use develop and etch processes to achieve conductive patterns.
>>We would also like to get trained on the TEOS furnace to deposit 
>>silicon dioxide onto our polymer and glass substrates.
>>We would like to then characterize the morphology of these coatings 
>>with the nanospec film thickness measurement system, Alphastep 
>>profilometer, Surf scan particle monitor, and M2000 spectroscopic 
>>ellipsometer.  These goals are preliminary as during the safety 
>>session Monday we will assess the exact capabilities of the 
>>fabrication and characterization tools to see which jobs are 
>>actually appropriate.
>>Can we bring in our own cleaning solvents, coatings, substrates, 
>>and our own handheld tools (forceps, wipes, jars, petri dishes, 
>>notebooks, etc.) on Monday and in future sessions?  Do we have to 
>>declare these items?  What equipment (gloves, bunnysuits, googles, 
>>booties, etc.) be provided?  If we use chemicals already at SNF, 
>>such as IPA, acetone, or photoresist, do we report usage of these chemicals?
>>Please let me know if you have questions and I would be happy to 
>>elaborate further over email or in person.
>>Mike Young
>>Director of Technology Development
>>Innova Dynamics
>>office: 415.692.5410
>>mobile: 267.566.3574
>>fax: 415.796.6445
>>1700 Owens Street, Suite 240
>>San Francisco, CA 94158
>>This electronic message contains information from Innova Dynamics. 
>>The contents may be privileged and confidential and are intended 
>>for the use of the intended addressee(s) only. If you are not an 
>>intended addressee, note that any disclosure, copying, 
>>distribution, or use of the contents of this message is prohibited. 
>>If you have received this e-mail in error, please contact me at 
>><mailto:mey at innovadynamics.com>mey at innovadynamics.com.
>>On Tue, Oct 26, 2010 at 2:45 PM, Ed Myers 
>><<mailto:edmyers at stanford.edu>edmyers at stanford.edu> wrote:
>>Maureen Baran gave me your paperwork asking me to sign off as the 
>>technical liaison.  From the description, I am not able to tell if 
>>SNF can support your processing needs.  I need more information as 
>>to what you are trying to achieve at the SNF.  I need to know items 
>>such as the materials you will be working on, or bring in to the 
>>fab, a general idea of your device requirements.  I don't want to 
>>compromise your intellectual property, but I make sure your 
>>activities will be safe for our lab members and our equipment.  I 
>>also want to help and make sure you are able to meet your end goals.

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