Fwd: Re: Innovadynamics Technical Liaison
edmyers at stanford.edu
Fri Nov 19 09:03:32 PST 2010
These guys have never been up front with what they wanted to do. I
suggest they go back through their technical liaison for
clarification of their needs. I had a feeling they needed to be watched.
>Date: Thu, 28 Oct 2010 10:10:24 -0700
>To: Mike Young <mike.young at innovadynamics.com>
>From: Ed Myers <edmyers at stanford.edu>
>Subject: Re: SNF Technical Liaison
>Cc: Maureen Baran <mbaran at stanford.edu>, Matthew Robinson
><matt at innovadynamics.com>
>As an organization we don't have much experience on the spray coater
>since it is a relatively new to our facility. We will need to make
>sure we have chucks or a chucking process compatible with the shape
>of your sample. I don't anticipate this being a problem. The
>other spray coat question will be solvent compatibility with your
>plastic substrate, since the resist is heavily diluted during coating.
>TEOS is a concern. I am not sure our system deposition temperature
>is compatible with either glass or plastic. I do see lab members
>use our PECVD oxide deposition at much lower temperatures. This is
>not something we enjoy as it takes a long day to complete the
>deposition do to the pre- and post- cleaning of the chamber.
>The metrology tools should not be a problem. We do request chemical
>usage of stocked materials.
>Any chemicals which are brought in to the facility must be approved
>by specmat. This will require MSDS, volumes and how the chemicals
>will be used and disposed. As for hand tools and notebooks, they
>are allowed as long as they are clean room compatible. We provide
>all gowning materials.
>The concern I see is the oxide deposition.
>At 09:52 AM 10/28/2010, Mike Young wrote:
>>Hi Ed and Maureen,
>>As a first project to familiarize ourselves with the SNF, Matt and
>>I would like to get trained on the EVG 101 Resist spray coater to
>>coat resist onto our devices. These devices have glass and/or
>>organic polymer from which we would like to pattern conducting
>>arrays for EMI, solar, and display applications. The goal with
>>this project is to study the effect of various surface
>>functionalizations, etching, and cleaning procedures on the wetting
>>of glass and plastic substrates with various coatings. For
>>etching, we want to use various acids and bases available at SNF to
>>clean our glass and plastic. After the photoresist deposition, we
>>would like to use develop and etch processes to achieve conductive patterns.
>>We would also like to get trained on the TEOS furnace to deposit
>>silicon dioxide onto our polymer and glass substrates.
>>We would like to then characterize the morphology of these coatings
>>with the nanospec film thickness measurement system, Alphastep
>>profilometer, Surf scan particle monitor, and M2000 spectroscopic
>>ellipsometer. These goals are preliminary as during the safety
>>session Monday we will assess the exact capabilities of the
>>fabrication and characterization tools to see which jobs are
>>Can we bring in our own cleaning solvents, coatings, substrates,
>>and our own handheld tools (forceps, wipes, jars, petri dishes,
>>notebooks, etc.) on Monday and in future sessions? Do we have to
>>declare these items? What equipment (gloves, bunnysuits, googles,
>>booties, etc.) be provided? If we use chemicals already at SNF,
>>such as IPA, acetone, or photoresist, do we report usage of these chemicals?
>>Please let me know if you have questions and I would be happy to
>>elaborate further over email or in person.
>>Director of Technology Development
>>1700 Owens Street, Suite 240
>>San Francisco, CA 94158
>>This electronic message contains information from Innova Dynamics.
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>>If you have received this e-mail in error, please contact me at
>><mailto:mey at innovadynamics.com>mey at innovadynamics.com.
>>On Tue, Oct 26, 2010 at 2:45 PM, Ed Myers
>><<mailto:edmyers at stanford.edu>edmyers at stanford.edu> wrote:
>>Maureen Baran gave me your paperwork asking me to sign off as the
>>technical liaison. From the description, I am not able to tell if
>>SNF can support your processing needs. I need more information as
>>to what you are trying to achieve at the SNF. I need to know items
>>such as the materials you will be working on, or bring in to the
>>fab, a general idea of your device requirements. I don't want to
>>compromise your intellectual property, but I make sure your
>>activities will be safe for our lab members and our equipment. I
>>also want to help and make sure you are able to meet your end goals.
More information about the specmat