Request to use tylan4 to form aluminum silicide - max temp 600C

[maurice stevens]

Hi Zubin,
Specmat has reviewed and approved your request for:

Using tylan4 furnace to form Aluminum Silicide.
Depositing 0.5 um Al at SNF on  bare silicon wafers.
The wafer will be put into furnace at 575CÂ  - 600C (max) to form silicide.

Do not exceed 600c.  Inspect the tube before and after your wafers come 
out and report any issues.

happy processing


-specmat at snf.stanford.edu



On 4/12/2011 2:50 PM, zpatel at silexos.com wrote:
> Hello All,
> I am resending this email as I am getting failure notice for the email 
> address SpecMat at snf.stanford.edu <mailto:SpecMat at snf.stanford.edu>
> My apologies for people who received multiple emails.
>
> Thanking you,
> Sincerely,
> Zubin
>
>     -------- Original Message --------
>     Subject: Request to use tylan4 to form aluminum silicide - max temp
>     600C
>     From: "Zubin" <zpatel at snf.stanford.edu
>     <mailto:zpatel at snf.stanford.edu>>
>     Date: Tue, April 12, 2011 10:32 am
>     To: SpecMat at snf.stanford.edu <mailto:SpecMat at snf.stanford.edu>,
>     "Nancy Latta" <nlatta at stanford.edu <mailto:nlatta at stanford.edu>>,
>     "maurice " <maurice at snf.stanford.edu
>     <mailto:maurice at snf.stanford.edu>>, "Zubin "
>     <zpatel at snf.stanford.edu <mailto:zpatel at snf.stanford.edu>>
>
>     Hello SpecMat Committee Members,
>
>     I want to request using tylan4 furnace to form Aluminum Silicide.
>
>     The regular silicon process steps currently includes
>     Depositing 0.5 um Al at SNF on  bare silicon wafers.
>     The wafer will be put into furnace at 575C  - 600C (max) to form
>     silicide.
>
>
>     Below mentioned are some available information regarding Al:
>
>     Please let me know if this is possible.
>
>     Thanking you,
>     Sincerely,
>     Zubin
>
>     The melting point and vapor pressure at respective temperature is
>     summarized below
>
>     source 1: Curt J. Lesker,
>
>     Material 	Melting Point 	Temperature 	Vapor pressure
>     	( C ) 	( C ) 	(torr)
>     AL 	660 	677 	1.00E-08
>     		821 	1.00E-06
>     		1010 	1.00E-04
>
>
>
>     Source 2:
>     http://www.veeco.com/promos/vapor-pressure-curves-of-the-elements.asp
>
>
>
>
>
>
>
>
>

-- 
maurice at stanford.edu

Maurice Stevens
Stanford Nanofabrication Facility
CIS Room 142, Mail Code 4070
Stanford, CA  94305
P. (650)725-3660
F. (650)725.6278

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