SpecMat request: AZ negative resist

[jim kruger]

SpecMat request  8-24-11

jimkruger at snf.stanford.edu

customer:  NthDegree Tech Worldwide

Material:  AZ nLof 2070  negative
photoresist.
Perhaps other viscosities later.

Supplier:  Capital Scientific 
capitalscientific.com
Mfg.:  Clariant AZ
Quantity:  1 quart 


Storage:  Group L,  with other personal
photoresists.

I choose this negative resist because
of its compatibility with our standard resists:  same TMAH developer,
spinner cup compatibility, etc.

It remains acetone soluble until BOTH
i-line exposure and 110 C bake so clean up is not an issue.

Equipment:
spin:  Headway or Laurell
bake:  litho hot plate or ovens
develop:  SVG track or hand develop,
MF 26A
Metal dep:  Innotec or send out. 
Ni/Al
Lift-off:  Wbsolvent, acetone or
1165, IPA rinse

Inspect:  optical or SEM.

Lift-off in acetone should work because
the resist  “anti-bleaches” and crosslinks only at the surface
(~1 or so um), the bulk remaining TMAH soluble for undercut profile
and later, acetone soluble for lift-off.
1165 can be used for a more aggressive
liftoff, attacking even the exposed material if hot.

Attached:  MSDS, AZ data sheet, process
info from microchemicals.com


I have discussed this with Mahnaz.

Thanks,

jim
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