Material for use in STSetch

Mary Tang mtang at stanford.edu
Mon Jul 11 13:45:42 PDT 2011


Hi Tracy --

Thanks for the TXRF.  It is OK to process your GaN-containing wafers in 
STSetch, provided (as we discussed) that the GaN is not exposed to the 
plasma.  Please submit another request if you plan to use other clean or 
semiclean tools.

Thanks,

Mary

On 6/28/2011 10:17 AM, Tracy Fung wrote:
> Specmat,
>
> My company would like to process GaN material deposited by an outside 
> vendor in STSetch.  We have the TXRF data from EAG attached.
>
> The tools we would like to get approval to use the material in:
> STSetch, etching Si wafer only with GaN layer coated in photoresist.
> P5000
>
> Please do not publicize our usage of GaN material.
>
> Thanks,
> _________________________
> Tracy Fung
>


-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
Paul G. Allen Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu

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