Quest for processing in P5000
lelewang at stanford.edu
Tue Jul 12 22:29:17 PDT 2011
My wafer is in the contaminated group with Pt metal lines on top. I need to do a directional oxide etch at the bottom of the trench in P5000 and the wafer will be well protected by 1.6um photoresist on top. The opening areas is in the trench which only have oxide and silicon and is clean. Is that ok to etch in p5000? Please reply ASAP. Thanks a lot.
Department of Electrical Engineering
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