From wslee at stanford.edu Tue Jun 14 08:26:03 2011 From: wslee at stanford.edu (Scott Lee) Date: Tue, 14 Jun 2011 08:26:03 -0700 Subject: HfB2 Metal Coating Message-ID: Hi SpecMat Committee, I have recently obtained some samples of hafnium diboride (HfB2) from a collaborator at a materials science group at the University of Urbana Illinois. The HfB2 films were deposited on 'clean' group samples such as bare silicon, oxide, and patterned polysilicon on oxide. The films were not deposited in a clean room facility so I plan on handling the samples as gold contaminated. The samples will need to pass through litho (headway and karlsuss) in addition to a few etch tools (mrc, pquest) and potentially sts deposition (for an oxide hard mask). Is it okay to work with this material in the cleanroom? Please let me know if you have any questions. Thanks in advance, Scott -------------- next part -------------- An HTML attachment was scrubbed... URL: From mtang at stanford.edu Tue Jun 14 14:51:12 2011 From: mtang at stanford.edu (Mary Tang) Date: Tue, 14 Jun 2011 14:51:12 -0700 Subject: HfB2 Metal Coating In-Reply-To: References: Message-ID: <4DF7D7D0.4020101@stanford.edu> Hi Scott -- Is it safe to assume that the Hf and B are fully incorporated in ceramic form? (In other words, so that nothing off gases when heated to the temperatures required for processing in sts and maybe pquest)? If so, then this strikes me as being OK. Specmat -- Anyone else on SpecMat with a concern? Can we call it good? Mary On 6/14/2011 8:26 AM, Scott Lee wrote: > Hi SpecMat Committee, > > I have recently obtained some samples of hafnium diboride (HfB2) from > a collaborator at a materials science group at the University of > Urbana Illinois. The HfB2 films were deposited on 'clean' group > samples such as bare silicon, oxide, and patterned polysilicon on oxide. > > The films were not deposited in a clean room facility so I plan on > handling the samples as gold contaminated. The samples will need to > pass through litho (headway and karlsuss) in addition to a few etch > tools (mrc, pquest) and potentially sts deposition (for an oxide hard > mask). > > Is it okay to work with this material in the cleanroom? Please let me > know if you have any questions. > > Thanks in advance, > Scott -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility Paul G. Allen Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From hsing at stanford.edu Thu Jun 23 14:59:37 2011 From: hsing at stanford.edu (Alex Hsing) Date: Thu, 23 Jun 2011 14:59:37 -0700 (PDT) Subject: Specmat request Message-ID: <437304513.205075.1308866377876.JavaMail.root@zm03.stanford.edu> Hello, Here is my specmat request: Alex Hsing (Coral login: hsing) phone: 310-560-6895 PI: R.H. Dauskardt Materials: polyvinyl alcohol (PVA) and nylon films on Si wafers Vendor/manufacturer info: Applied Materials Reason for request: I would like to measure the film thickness on the Alphastep Process Flow: No processing will be done Storage: Will not be stored at SNF Disposal: Will not be disposed at SNF Thanks, Alex From mtang at stanford.edu Thu Jun 23 15:05:21 2011 From: mtang at stanford.edu (Mary Tang) Date: Thu, 23 Jun 2011 15:05:21 -0700 Subject: Specmat request In-Reply-To: <437304513.205075.1308866377876.JavaMail.root@zm03.stanford.edu> References: <437304513.205075.1308866377876.JavaMail.root@zm03.stanford.edu> Message-ID: <4E03B8A1.7080903@stanford.edu> Hi Alex -- This should be fine, provided the polymers are fully cured or hardened (so they don't leave gunk on the tip.) Please contact Uli for training if you haven't done so already -- she will review with you the policies on what can and can't be measured on this system. M On 6/23/2011 2:59 PM, Alex Hsing wrote: > Hello, > > Here is my specmat request: > > Alex Hsing (Coral login: hsing) phone: 310-560-6895 > PI: R.H. Dauskardt > > Materials: polyvinyl alcohol (PVA) and nylon films on Si wafers > > Vendor/manufacturer info: Applied Materials > > Reason for request: I would like to measure the film thickness on the Alphastep > > Process Flow: No processing will be done > > Storage: Will not be stored at SNF > > Disposal: Will not be disposed at SNF > > Thanks, > Alex -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility Paul G. Allen Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From fungus at snf.stanford.edu Tue Jun 28 10:17:00 2011 From: fungus at snf.stanford.edu (Tracy Fung) Date: Tue, 28 Jun 2011 10:17:00 -0700 Subject: Material for use in STSetch Message-ID: <20110628101700.2e4e1a1cae0c11e8db06e7eefc1c8d4f.85f23de5bd.wbe@email12.secureserver.net> An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: C0BDK151 W anode TXRF preliminary data.pdf Type: application/pdf Size: 9868 bytes Desc: not available URL: From jpmailoa at MIT.EDU Thu Jun 30 19:23:04 2011 From: jpmailoa at MIT.EDU (Jonathan P Mailoa) Date: Thu, 30 Jun 2011 22:23:04 -0400 Subject: Bringing in silica microspheres Message-ID: <20110630222304.a706kqu84gowgwkw@webmail.mit.edu> Hi My name is Jonathan Mailoa, coral id jpmailoa. I would like to bring in quartz wafers coated with a monolayer of silica microspheres. The monolayer formation is done outside of SNF, so I am planning to use only the gold contaminated equipment. My goal is to obtain a specific quartz texture profile by etching the coated quartz wafer. Can you let me know if this is allowed, or what other information I should provide? Thanks Jonathan From mtang at stanford.edu Thu Jun 30 21:32:57 2011 From: mtang at stanford.edu (Mary Tang) Date: Thu, 30 Jun 2011 21:32:57 -0700 Subject: Bringing in silica microspheres In-Reply-To: <20110630222304.a706kqu84gowgwkw@webmail.mit.edu> References: <20110630222304.a706kqu84gowgwkw@webmail.mit.edu> Message-ID: <4E0D4DF9.1030900@stanford.edu> Hi Jonathan -- This is fine. We do not allow silica microspheres to be spun coated in the lab (i.e., not on the litho spin coaters), but once they are adhered to a wafer, they are generally safe to process, especially if your wet processing is at wbgeneral or wbgaas. I'm presuming you are etching to obtain your texturing -- where will you be doing this? Mary On 6/30/2011 7:23 PM, Jonathan P Mailoa wrote: > Hi > > My name is Jonathan Mailoa, coral id jpmailoa. I would like to bring in quartz > wafers coated with a monolayer of silica microspheres. > > The monolayer formation is done outside of SNF, so I am planning to use only the > gold contaminated equipment. My goal is to obtain a specific quartz texture > profile by etching the coated quartz wafer. > > Can you let me know if this is allowed, or what other information I should > provide? > > Thanks > Jonathan