Unity request for p5000etch

Lidia Vereen lvereen at unitysemi.com
Thu Nov 3 10:09:05 PDT 2011


There are two materials. They are conductive metal oxides.  Their
composition is highly confidential.

The materials have Pr, Co, Mn, La, Sr, Ca.   If Mn is a problem,  we do not
necessarily have to use that composition.  

We would prefer to use a chemical etch ie CF4, CHF3, etc.  I doubt the
chlorine based chemistries would work.  We may have likely have to use a
larger component of sputter etch ie Ar in the etch.  

Given the options open to us, access to the P5000 is very important.
Please let us know your decision as soon as is feasible.



-----Original Message-----
From: Mary Tang [mailto:mtang at stanford.edu] 
Sent: Thursday, November 03, 2011 9:41 AM
To: lvereen at unitysemi.com
Cc: specmat at snf.stanford.edu; jbumgarner at snf.stanford.edu; maurice stevens
Subject: Unity request for p5000etch

Hi Lidia --

We've been reviewing your request for etching CMO materials on P5000 
based on the info you'd sent last August.  The sticking point has been 
the Manganese -- but when I spoke with Mary Calarrudo, she said that the 
material to be etched was not Cobalt manganese oxide (which I think we'd 
assumed "CMO" meant).  She says CMO is Complex Metal Oxide.

So, apologies for the delay, but I'm confused.  Could we get a 
definitive description of the elements in the films you would like 
etched in the p5000?  As well as some description of the type of process 
(chemistry and chamber) you'd like to use?  You do not have to disclose 
anything proprietary but part of the agreement of working at SNF is 
sharing info about composition and processes to the degree other 
researchers' work may be affected.  So, specific composition is not 
needed, but certainly the elemental components would be helpful, 
especially if things appear at trace levels.



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