SpecMat request: AZ negative resist

Mary Tang mtang at stanford.edu
Fri Sep 2 09:52:52 PDT 2011


Sorry for the delay.  This is fine; you know the drill.  Thanks for the 
info.

M

On 8/24/2011 3:17 PM, jim kruger wrote:
> SpecMat request 8-24-11
>
> jimkruger at snf.stanford.edu <mailto:jimkruger at snf.stanford.edu>
>
> customer: NthDegree Tech Worldwide
>
> Material: AZ nLof 2070 negative photoresist.
> Perhaps other viscosities later.
>
> Supplier: Capital Scientific capitalscientific.com
> Mfg.: Clariant AZ
> Quantity: 1 quart
>
>
> Storage: Group L, with other personal photoresists.
>
> I choose this negative resist because of its compatibility with our 
> standard resists: same TMAH developer, spinner cup compatibility, etc.
>
> It remains acetone soluble until BOTH i-line exposure and 110 C bake 
> so clean up is not an issue.
>
> Equipment:
> spin: Headway or Laurell
> bake: litho hot plate or ovens
> develop: SVG track or hand develop, MF 26A
> Metal dep: Innotec or send out. Ni/Al
> Lift-off: Wbsolvent, acetone or 1165, IPA rinse
>
> Inspect: optical or SEM.
>
> Lift-off in acetone should work because the resist “anti-bleaches” and 
> crosslinks only at the surface (~1 or so um), the bulk remaining TMAH 
> soluble for undercut profile and later, acetone soluble for lift-off.
> 1165 can be used for a more aggressive liftoff, attacking even the 
> exposed material if hot.
>
> Attached: MSDS, AZ data sheet, process info from microchemicals.com
>
>
> I have discussed this with Mahnaz.
>
> Thanks,
>
> jim
>


-- 
Mary X. Tang, Ph.D.
Stanford Nanofabrication Facility
Paul G. Allen Room 136, Mail Code 4070
Stanford, CA  94305
(650)723-9980
mtang at stanford.edu
http://snf.stanford.edu

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