From mtang at stanford.edu Mon Apr 2 11:27:52 2012 From: mtang at stanford.edu (Mary Tang) Date: Mon, 02 Apr 2012 11:27:52 -0700 Subject: Fwd: TXRF repot Message-ID: <4F79EFA8.506@stanford.edu> Hi all -- I haven't been around so don't know the latest on this. I take it that if he's checking in with me that he's still waiting for an answer? I assume that this is for a tungsten source. Just looking at this, this stuff does not look really "bad" -- but nor does it look "clean" because of the Fe. I might be able to buy "semiclean." If this is in response to his request to run on Teos2, I think there may be concerns from others with really "clean" processes on this tube. In my humble opinion, I would suggest that this would be OK to run on TEOS2 -- provided they use their own dedicated quartz boats and wand tips. Fe seems to be the only concern and it is not terribly volatile at TEOS2 temperatures, so the main concern would be cross-contamination from shared quartzware. M -------- Original Message -------- Subject: TXRF repot Date: Mon, 2 Apr 2012 10:45:19 -0700 From: Vipin.Ayanoor-Vitikkate at hgst.com To: mtang at snf.stanford.edu CC: emyer at snf.stanford.edu, maurice at snf.stanford.edu Sorry I forgot to attach this in the earlier email. thanks vipin -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: TXRF-TEOS.doc Type: application/octet-stream Size: 40960 bytes Desc: not available URL: From johnramunas at gmail.com Wed Apr 4 20:51:52 2012 From: johnramunas at gmail.com (John Ramunas) Date: Wed, 4 Apr 2012 20:51:52 -0700 Subject: Question about photolithography with sub-10-micron features Message-ID: Dear SNF, Do you (or a company you know of) provide a service which patterns photoresist with feature sizes as small as 2 microns on silicone wafers? The Stanford Microfluidics Foundry says their limit is 10 microns. Thanks, John -------------- next part -------------- An HTML attachment was scrubbed... URL: From mtang at stanford.edu Thu Apr 5 09:42:43 2012 From: mtang at stanford.edu (Mary Tang) Date: Thu, 05 Apr 2012 09:42:43 -0700 Subject: Question about photolithography with sub-10-micron features In-Reply-To: References: Message-ID: <4F7DCB83.4050601@stanford.edu> Hi John -- I don't know of a company that patterns on silicone elastomers and suspect you may have a hard time finding one. The limit on contact masking is just under one micron under ideal conditions. Elastomers are far from ideal. It would also depend on the kind of mask being used (transparency versus chrome and the resolution.) For elastomers, it would depend on the substrate, the thickness of PDMS and the dimensions of the features you need (both lateral and depth.) Are you patterning on PDMS or making molds for casting PDMS? Are you making valves like the Microfluidics Foundry process provides? If you'd like to come by and talk with either Mahnaz (who is the litho process lead) or me, we can go over your device needs and determine whether or how this could be done at SNF. I don't know if you are trained on the tools required, but we can certainly come up with a process flow and training/experimental plan with you if this is what you have in mind. If you've got a description or sketch of your device, please send it over. Mary On 4/4/2012 8:51 PM, John Ramunas wrote: > Dear SNF, > > Do you (or a company you know of) provide a service which patterns > photoresist with feature sizes as small as 2 microns on silicone > wafers? The Stanford Microfluidics Foundry says their limit is 10 > microns. > > Thanks, > John > From Salowitz at stanford.edu Wed Apr 11 17:35:15 2012 From: Salowitz at stanford.edu (Nathan Salowitz) Date: Wed, 11 Apr 2012 17:35:15 -0700 Subject: Apiezon Wax-W Message-ID: <4F862343.6000501@stanford.edu> Hello, I am seeking Specmat approval to use "Apiezon Wax-W" as a back side protector in long KOH etches. Use (Application): there are 2 possibilities for application of the material: 1) I can use a hotplate in the litho area, other lab members who I've discussed this process with said "put aluminum foil everywhere" 2) alternatively I can use a hotplate in my lab, not as clean but an option. Use (KOH etch): Uli indicated that it is ok to put this in the gold contaminated KOH labware. Removal: I have found alternate facilities neighboring my lab to remove the material using established methods (xylenes) and as this is the last step in my process, my samples will not need to re-enter the clean room. I am also still looking into alternate methods for removal. Storage: I can store the wax in my lab, outside the SNF an MSDS and datasheet are attached. Cheers, Nate -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Apiezon Wax W Hard Vacuum Sealing Mounting Wax and Etch Resist Safety Data Sheet.pdf Type: application/pdf Size: 104765 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Apiezon Wax W, W40 & W100 Vacuum Sealing and Mounting Waxes Technical Datasheet.pdf Type: application/pdf Size: 216910 bytes Desc: not available URL: From mtang at stanford.edu Wed Apr 11 17:43:11 2012 From: mtang at stanford.edu (Mary Tang) Date: Wed, 11 Apr 2012 17:43:11 -0700 Subject: Apiezon Wax-W In-Reply-To: <4F862343.6000501@stanford.edu> References: <4F862343.6000501@stanford.edu> Message-ID: <4F86251F.9010806@stanford.edu> Hi Nathan -- This is the infamous "black wax" often used in the lab. It's fine to use at wbgeneral as Uli describes. What we do have a problem with is the mess it creates on the hotplates in litho. I'll defer to Mahnaz on how she would like (or not) to do this. I can offer you a hotplate in the wafersaw room as an alternative. I would suggest that cleanroom level cleanliness is not so important for applying black wax if the next step is gold-contaminated KOH labware. Xylenes is the preferred method of removal at SNF (we don't allow TCA or borothene in the lab - these the traditional methods.) Mary On 4/11/2012 5:35 PM, Nathan Salowitz wrote: > > Hello, > I am seeking Specmat approval to use "Apiezon Wax-W" as a back > side protector in long KOH etches. > > Use (Application): there are 2 possibilities for application of the > material: > 1) I can use a hotplate in the litho area, other lab members who I've > discussed this process with said "put aluminum foil everywhere" > 2) alternatively I can use a hotplate in my lab, not as clean but an > option. > > Use (KOH etch): > Uli indicated that it is ok to put this in the gold contaminated KOH > labware. > > Removal: I have found alternate facilities neighboring my lab to > remove the material using established methods (xylenes) and as this is > the last step in my process, my samples will not need to re-enter the > clean room. I am also still looking into alternate methods for removal. > > Storage: I can store the wax in my lab, outside the SNF > > an MSDS and datasheet are attached. > Cheers, > Nate > -------------- next part -------------- An HTML attachment was scrubbed... URL: