From davehong at snf.stanford.edu Wed Feb 13 08:05:28 2002 From: davehong at snf.stanford.edu (davehong at snf.stanford.edu) Date: Feb 13, 2002 8:05:28 AM Subject: Problem sts 2002-02-13 08:05:26: NO2 flow not stable Message-ID: I was trying to run at 900 sccm, the flow count not be stablized. From jperez at snf.stanford.edu Fri Feb 15 04:20:48 2002 From: jperez at snf.stanford.edu (jperez at snf.stanford.edu) Date: Feb 15, 2002 4:20:48 PM Subject: Comment sts 2002-02-15 16:20:47: NO2 valve was closed Message-ID: From kyang at snf.stanford.edu Sun Feb 17 12:07:48 2002 From: kyang at snf.stanford.edu (kyang at snf.stanford.edu) Date: Feb 17, 2002 12:07:48 AM Subject: Problem sts 2002-02-17 00:07:48: silane flow problem Message-ID: After the deposition start, silane flow rate reaches 1320, than quickly drop to zero. From booth at snf.stanford.edu Tue Feb 19 12:13:01 2002 From: booth at snf.stanford.edu (booth at snf.stanford.edu) Date: Feb 19, 2002 12:13:01 PM Subject: Shutdown sts 2002-02-19 12:13:00: STSetch maintenance at 12:45pm today Message-ID: From sguan at snf.stanford.edu Wed Feb 20 09:10:29 2002 From: sguan at snf.stanford.edu (sguan at snf.stanford.edu) Date: Feb 20, 2002 9:10:29 AM Subject: Comment sts 2002-02-20 09:10:27: Noted on PECVD, wrong machine, should be etcher Message-ID: From jperez at snf.stanford.edu Wed Feb 20 09:14:31 2002 From: jperez at snf.stanford.edu (jperez at snf.stanford.edu) Date: Feb 20, 2002 9:14:31 AM Subject: Shutdown sts 2002-02-19 12:13:00: STSetch maintenance at 12:45pm today Message-ID: Len put down wrong STS, this is STS PECVD