From jperez at snf.stanford.edu Fri Mar 7 12:25:58 2003 From: jperez at snf.stanford.edu (jperez at snf.stanford.edu) Date: Mar 7, 2003 12:25:58 PM Subject: Problem sts 2003-03-07 12:25:56: Report Problem for sts Nitride deposition Message-ID: Index of Refraction has dropped from 2.04 to 1.98 From sabnis at snf.stanford.edu Fri Mar 14 12:48:46 2003 From: sabnis at snf.stanford.edu (sabnis at snf.stanford.edu) Date: Mar 14, 2003 12:48:46 AM Subject: Problem sts 2003-03-14 00:48:45: Report Problem for sts Message-ID: After cleaning the chamber this evening, I ran a 1000 A std. mix frequency nitride recipe. The resulting index of refraction was 1.932 and the 6:1 BOE etch rate was 450 A/min. The index is substantially lower than it should be (normally > 2), and the corresponding BOE etch rate is too high (normally 200 A/min). I think this indicates a leak in the system, resulting in parasitic incorporation of oxygen in the film. I recommend that no one run a nitride process on the machine until the problem is fixed. Somone should qualify the machine by running several SiN depositions to ensure the nitride films reproducibly exhibit an index > 2. - vijit From wkinney at snf.stanford.edu Mon Mar 17 02:31:32 2003 From: wkinney at snf.stanford.edu (wkinney at snf.stanford.edu) Date: Mar 17, 2003 2:31:32 PM Subject: Problem sts 2003-03-17 14:31:32: STS did not vent the 1st time Message-ID: STS did not vent after 1K oxide dep. Restarted into standby and vented. OK on 2nd try.