Problem sts SNF 2005-04-10 15:40:10: Silane MFC does not stabilize

levi at levi at
Sun Apr 10 15:40:10 PDT 2005

In Nitride recipe, we set the MFC for the Silane to 1900 SCCM.
The MFC did not control the flow well, and the flow rate changed from 1650 to 2030. while swinging back and forth. As a result. every few seconds . there will be flow rate error for the Silane flow and the plasma etch will stop, until resumed by F2 key. Seems that the MFC does not function to stabilize flow. This was not observed by former MFC

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