From rcordova at snf.stanford.edu Fri Aug 1 17:58:30 2008 From: rcordova at snf.stanford.edu (rcordova at snf.stanford.edu) Date: Fri, 1 Aug 2008 17:58:30 -0700 Subject: Problem sts SNF 2008-08-01 17:58:30: F1 STANDBY only option!! Message-ID: System gets stuck in a standby mode (argon key is down) and will not allow for dep. I hit abort and vented system, reloaded program and same thing. J Shott came by and offered to check if the pump downstairs was ok. in the meantime I loaded my process without samples and it worked. J Shott said he found nothing wrong. But it is intermittant. It just locked up againand after many attempts was able to do one more pass. From calarrudo at snf.stanford.edu Sat Aug 2 15:57:23 2008 From: calarrudo at snf.stanford.edu (calarrudo at snf.stanford.edu) Date: Sat, 2 Aug 2008 15:57:23 -0700 Subject: Problem sts SNF 2008-08-02 15:57:23: Uniformity issue Message-ID: I ran a test yesterday and the uniformity from wafer to wafer was different. My low reading was 238A and My high reading was 278A. I also had to inr`crease my dep time from 0:45 to 1:05 to deposit 250A. I gave John shot all the information. From shott at snf.stanford.edu Mon Aug 4 08:55:53 2008 From: shott at snf.stanford.edu (shott at snf.stanford.edu) Date: Mon, 4 Aug 2008 08:55:53 -0700 Subject: Problem sts SNF 2008-08-04 08:55:52: Details of Mary Calarrudo's runs .... Message-ID: Here are the details of Mary Calarrudos runs done with wafers at the 12 o'clock, 3 o'clock, 6 o'clock, and 9 o'clock wafer positions. 12 o'clock wafer: T: 274 C: 278 F: 273 L: 274 R: 270 3 o'clock wafer: T: 240 C: 246 F: 254 L: 254 R: 239 6 o'clock wafer: T: 254 C: 239 F: 250 L: 244 R: 238 9 o'oclock wafer: T: 246 C: 251 F: 259 L: 245 R: 255 In short, the 12 oclock position is noticeably thicker. And, as Jeannier noted, the overall deposition rate has fallen. Mary had to increase her depostion time by nearly 25% to get the nominal 250 A oxide thickness. Do we have a temperature uniformity problem? Or a gas distripbution problem? Thanks, John From jperez at snf.stanford.edu Tue Aug 5 10:50:42 2008 From: jperez at snf.stanford.edu (jperez at snf.stanford.edu) Date: Tue, 5 Aug 2008 10:50:42 -0700 Subject: Shutdown sts SNF 2008-08-05 10:50:42: Working on shower head Message-ID: Will have to clean system before testing From jperez at snf.stanford.edu Tue Aug 5 13:19:12 2008 From: jperez at snf.stanford.edu (jperez at snf.stanford.edu) Date: Tue, 5 Aug 2008 13:19:12 -0700 Subject: Shutdown sts SNF 2008-08-05 10:50:42: Working on shower head Message-ID: Jim tighten the shower head that was loose. Down for a clean because we had to turn off heat for Jim to work on it. Test will need to be ran after clean. From pnataraj at snf.stanford.edu Tue Aug 5 16:24:24 2008 From: pnataraj at snf.stanford.edu (pnataraj at snf.stanford.edu) Date: Tue, 5 Aug 2008 16:24:24 -0700 Subject: Comment sts SNF 2008-08-05 16:24:24: STS new dep rate Message-ID: Turns out that the shower head in tool was loose. Thanks Jeannie for fixing it. The dep rate is back where it used to be. Uniformity is also pretty good. Following are the dep results: Prg: std_lfox Time: 5 min Avg thickness: 1967A Dep rate : 395 A/min Thickness across the wafer Top : 1954A Bottom: 1965A Center: 1991A Left : 1918A Right: 2010A Prg: std_hfox Time: 5 min Avg thickness: 1824A Dep rate : 364 A/min Thickness across the wafer: Top : 1832A Bottom: 1820A Center: 1832A Left : 1816A Right: 1820A From jperez at snf.stanford.edu Thu Aug 7 07:57:44 2008 From: jperez at snf.stanford.edu (jperez at snf.stanford.edu) Date: Thu, 7 Aug 2008 07:57:44 -0700 Subject: Problem sts SNF 2008-08-04 08:55:52: Details of Mary Calarrudo's runs .... Message-ID: Showhead was tighten by Jim H. and dep. rate and uniformity is back to normal. From jperez at snf.stanford.edu Thu Aug 7 07:58:52 2008 From: jperez at snf.stanford.edu (jperez at snf.stanford.edu) Date: Thu, 7 Aug 2008 07:58:52 -0700 Subject: Problem sts SNF 2008-08-02 15:57:23: Uniformity issue Message-ID: Showhead was tighten by Jim H., dep rate and uniformity back to normal. From jperez at snf.stanford.edu Thu Aug 7 07:59:53 2008 From: jperez at snf.stanford.edu (jperez at snf.stanford.edu) Date: Thu, 7 Aug 2008 07:59:53 -0700 Subject: Problem sts SNF 2008-07-31 12:14:30: Ran 3 oxide tests today using Hi Freq Message-ID: Seems to had been the showhead being loose. OK now. From rcordova at snf.stanford.edu Fri Aug 8 16:55:26 2008 From: rcordova at snf.stanford.edu (rcordova at snf.stanford.edu) Date: Fri, 8 Aug 2008 16:55:26 -0700 Subject: Problem sts SNF 2008-08-08 16:55:25: System not pumpind down to 15 mtorr Message-ID: Ed Meyers came to help. System continues in a Standby mode because it cannot reach 15 militorr. He used his magic, and it pumped down long enough for recipe to start. From emyers at snf.stanford.edu Sat Aug 9 16:50:54 2008 From: emyers at snf.stanford.edu (emyers at snf.stanford.edu) Date: Sat, 9 Aug 2008 16:50:54 -0700 Subject: Comment sts SNF 2008-08-09 16:50:53: Slow Pump Down Message-ID: I worked with Rosie at 5pm on Friday regarding not being able to pump to 15 mTorr after loading wafer. System hung up at 22-24 mTorr. Eventually it hit the target and began the depositioin. Today I watch another user run the system. It pump to 4mTorr base very quickly. I'm not sure it wasn't a sample problem, since other samples Rosie was running did not have the same problem. From rcordova at snf.stanford.edu Wed Aug 13 14:26:30 2008 From: rcordova at snf.stanford.edu (rcordova at snf.stanford.edu) Date: Wed, 13 Aug 2008 14:26:30 -0700 Subject: Comment sts SNF 2008-08-13 14:26:29: Starting clean again! Message-ID: Found system at 4.0 microns when I arrived. From jperez at snf.stanford.edu Thu Aug 14 07:12:47 2008 From: jperez at snf.stanford.edu (jperez at snf.stanford.edu) Date: Thu, 14 Aug 2008 07:12:47 -0700 Subject: Problem sts SNF 2008-07-11 12:16:57: Nitride depositions has a problem with Message-ID: Watched a 10 min. deposition and did NOT see High frequency failure. Dep rate was 89 A/ min. From jperez at snf.stanford.edu Thu Aug 14 07:16:49 2008 From: jperez at snf.stanford.edu (jperez at snf.stanford.edu) Date: Thu, 14 Aug 2008 07:16:49 -0700 Subject: Problem sts SNF 2008-05-21 17:24:18: RF power tolerance error Message-ID: We haven't seen this error in awhile, at least the log sheet at STS not one has added this error to it. From jperez at snf.stanford.edu Thu Aug 14 07:19:46 2008 From: jperez at snf.stanford.edu (jperez at snf.stanford.edu) Date: Thu, 14 Aug 2008 07:19:46 -0700 Subject: Problem sts SNF 2008-07-10 14:55:42: High freq RF power not striking all the time Message-ID: I watched a ten minute deposition without seeing plasma on high frequency fail. From jperez at snf.stanford.edu Thu Aug 14 07:22:13 2008 From: jperez at snf.stanford.edu (jperez at snf.stanford.edu) Date: Thu, 14 Aug 2008 07:22:13 -0700 Subject: Problem sts SNF 2008-08-01 17:58:30: F1 STANDBY only option!! Message-ID: We have not seen this problem, but it could be that STS computer needed a reboot and that was done. From jperez at snf.stanford.edu Thu Aug 14 07:23:57 2008 From: jperez at snf.stanford.edu (jperez at snf.stanford.edu) Date: Thu, 14 Aug 2008 07:23:57 -0700 Subject: Problem sts SNF 2008-08-08 16:55:25: System not pumpind down to 15 mtorr Message-ID: Ran system through two passes and had no problem. Again it may have just needed a reboot and that was done. From jperez at snf.stanford.edu Thu Aug 14 07:27:36 2008 From: jperez at snf.stanford.edu (jperez at snf.stanford.edu) Date: Thu, 14 Aug 2008 07:27:36 -0700 Subject: Comment sts SNF 2008-08-09 16:50:53: Slow Pump Down Message-ID: I ran two passes through STS without a problem. System had been rebooted and possibly it corrected the problem. From jperez at snf.stanford.edu Thu Aug 14 07:27:54 2008 From: jperez at snf.stanford.edu (jperez at snf.stanford.edu) Date: Thu, 14 Aug 2008 07:27:54 -0700 Subject: Comment sts SNF 2008-08-13 14:26:29: Starting clean again! Message-ID: This clean was completed. From jperez at snf.stanford.edu Thu Aug 14 10:05:37 2008 From: jperez at snf.stanford.edu (jperez at snf.stanford.edu) Date: Thu, 14 Aug 2008 10:05:37 -0700 Subject: Comment sts SNF 2008-08-14 10:05:36: Change 2% silane bottle will run a test Message-ID: From jperez at snf.stanford.edu Thu Aug 14 13:31:04 2008 From: jperez at snf.stanford.edu (jperez at snf.stanford.edu) Date: Thu, 14 Aug 2008 13:31:04 -0700 Subject: Comment sts SNF 2008-08-14 10:05:36: Change 2% silane bottle will run a test Message-ID: Ran two test wafers (front and back), the dep rate for both were 389 and 390 angstroms per minute. Uniformity across the wafers were 3 and w4 %. Refractive index for both were 1.47. OK to use. From pnataraj at snf.stanford.edu Thu Aug 21 14:59:39 2008 From: pnataraj at snf.stanford.edu (pnataraj at snf.stanford.edu) Date: Thu, 21 Aug 2008 14:59:39 -0700 Subject: Comment sts SNF 2008-08-21 14:59:38: STS wet etch rates Message-ID: 1. HighFrequency Oxide 6:1 BOE = 2749A/min 20:1 BOE = 817A/min 2. LowFrequency Oxide 6:1 BOE = 1360A/min 20:1 BOE = 197A/min 3. Nitiride Etch rate 6:1 BOE= 173A/min