Comment sts SNF 2008-11-06 11:43:42: Ran Nitride and Oxide test

jperez at snf.stanford.edu jperez at snf.stanford.edu
Fri Nov 14 09:57:46 PST 2008


Test results good after showerhead adjustment
LF oxide dep. rate 387.6 A/min., Index of refraction 1.475
HF oxide dep. rate 351.3 A/min., Index of refraction  1.467 
Uniformity across the wafer on both tests improved.




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