Comment sts SNF 2008-11-06 11:43:42: Ran Nitride and Oxide test

[jperez at snf.stanford.edu]

Test results good after showerhead adjustment
LF oxide dep. rate 387.6 A/min., Index of refraction 1.475
HF oxide dep. rate 351.3 A/min., Index of refraction  1.467 
Uniformity across the wafer on both tests improved.