Comment sts SNF 2009-05-08 13:45:00: changed to bottle B should do test run before running wafers

jperez at snf.stanford.edu jperez at snf.stanford.edu
Tue Jun 2 07:08:20 PDT 2009

Previous message: Problem sts SNF 2009-05-31 17:24:03: can't pump down the chamber
Next message: Comment sts SNF 2009-05-31 20:45:25: leak problem is fixed
Messages sorted by: [ date ] [ thread ] [ subject ] [ author ]

Yesterday's test result for low frequency oxide deposition rate
was low 359 angstroms per minute.

Previous message: Problem sts SNF 2009-05-31 17:24:03: can't pump down the chamber
Next message: Comment sts SNF 2009-05-31 20:45:25: leak problem is fixed
Messages sorted by: [ date ] [ thread ] [ subject ] [ author ]

More information about the sts-pcs mailing list