Comment sts SNF 2009-03-06 20:15:37: uniformity worsened

jperez at snf.stanford.edu jperez at snf.stanford.edu
Tue Mar 10 13:58:18 PDT 2009


Uniformity  was good per wafer (4). Ran oxide low frequency 
test on four wafers and dep. rate was 401 angstroms per
 minute, 402 A, 404A, 405A. Nitride test was 101A, 102A, 104A
102A.




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