Comment sts SNF 2009-03-06 20:15:37: uniformity worsened

[jperez at snf.stanford.edu]

Uniformity  was good per wafer (4). Ran oxide low frequency 
test on four wafers and dep. rate was 401 angstroms per
 minute, 402 A, 404A, 405A. Nitride test was 101A, 102A, 104A
102A.