From faridz at snf.stanford.edu Tue Nov 3 13:20:11 2009 From: faridz at snf.stanford.edu (faridz at snf.stanford.edu) Date: Tue, 3 Nov 2009 13:20:11 -0800 Subject: Comment sts SNF 2009-11-03 13:20:09: clean cycle Message-ID: performing clean cycle under community service. chamber thickness is at 4.2 From faridz at snf.stanford.edu Tue Nov 3 15:38:43 2009 From: faridz at snf.stanford.edu (faridz at snf.stanford.edu) Date: Tue, 3 Nov 2009 15:38:43 -0800 Subject: Shutdown sts SNF 2009-11-03 15:38:43: RF 1Power tolerence error Message-ID: above error apperars while i was running clean cycle O2 Descum recipe. tool stop cleaning i dont know for how long recipe ran. On the bottom menue it give to two option 1) Abort 2) Resume. I try resume sevral times but after few seconds above error re-appears. Per Ed Myers tool has to shutdown. From jperez at snf.stanford.edu Thu Nov 5 08:55:40 2009 From: jperez at snf.stanford.edu (jperez at snf.stanford.edu) Date: Thu, 5 Nov 2009 08:55:40 -0800 Subject: Shutdown sts SNF 2009-11-03 15:38:43: RF 1Power tolerence error Message-ID: It may have been accidently bumped (toggle switch), for High frequency. Placed toggle swithch up (on) and seem run fine. From jperez at snf.stanford.edu Thu Nov 5 08:55:59 2009 From: jperez at snf.stanford.edu (jperez at snf.stanford.edu) Date: Thu, 5 Nov 2009 08:55:59 -0800 Subject: Comment sts SNF 2009-11-03 13:20:09: clean cycle Message-ID: Thanks! From jperez at snf.stanford.edu Thu Nov 5 08:56:29 2009 From: jperez at snf.stanford.edu (jperez at snf.stanford.edu) Date: Thu, 5 Nov 2009 08:56:29 -0800 Subject: Comment sts SNF 2009-09-18 17:01:14: STS-etch Message-ID: will test again today,. From jperez at snf.stanford.edu Fri Nov 6 14:47:24 2009 From: jperez at snf.stanford.edu (jperez at snf.stanford.edu) Date: Fri, 6 Nov 2009 14:47:24 -0800 Subject: Problem sts SNF 2009-11-06 14:47:23: 2% silane gas bottle change Message-ID: From jperez at snf.stanford.edu Fri Nov 6 14:55:15 2009 From: jperez at snf.stanford.edu (jperez at snf.stanford.edu) Date: Fri, 6 Nov 2009 14:55:15 -0800 Subject: Problem sts SNF 2009-11-06 14:47:23: 2% silane gas bottle change Message-ID: Ran Nitride test after gas bottle change and here are the test results; Four test wafers ran in one load. avg. std dev. % range IR 1) 992 18.9 2.5 1.97 back 2) 1048 24.9 3.78 1.97 front tw 3) 1017 23.4 3.23 1.97 left side tw 4) 1019 24.1 3.1 1.97 right side tw From ehe at snf.stanford.edu Thu Nov 12 20:41:56 2009 From: ehe at snf.stanford.edu (ehe at snf.stanford.edu) Date: Thu, 12 Nov 2009 20:41:56 -0800 Subject: Problem sts SNF 2009-11-12 20:41:55: same as before Message-ID: Same problem persists as stated in previous recent notes that have all been magically cleared. Power/etc fluctuating more than normal for this equipment, oxide dep uniformity usually 2% from center to edge of platen, now 12%. From mtang at snf.stanford.edu Tue Nov 17 08:44:26 2009 From: mtang at snf.stanford.edu (mtang at snf.stanford.edu) Date: Tue, 17 Nov 2009 08:44:26 -0800 Subject: Problem sts SNF 2009-11-12 20:41:55: same as before Message-ID: "ehe" has reported this several times in the past few weeks, but staff-run qual tests have not observed the same problems. It may very well be that the qual tests do not test the same process and conditions. Elizabeth: Please provide some more detail about your process (process recipe, substrates, thickness, measurement). It would be very helpful if you could meet up with Ed and Jeannie to review this information. If anyone else has uniformity data to share, it would be appreciated. From khoang at snf.stanford.edu Fri Nov 20 14:48:41 2009 From: khoang at snf.stanford.edu (khoang at snf.stanford.edu) Date: Fri, 20 Nov 2009 14:48:41 -0800 Subject: Comment sts SNF 2009-11-20 14:48:40: Start cycle clean at 2:45pm Message-ID: