Next STS PECVD user
jperez at snf.stanford.edu
Wed Jan 23 15:44:41 PST 2002
For the next user depositing Silicon Nitride, please record results in
the logbook especially the refractive index.
The STS PECVD system had a SiH4 / N2 cylinder change. The way I
qualified it was by;
1. Did a clean (only because it was close to 3.0 um).
2. Ran an oxide recipe that had been ran Jan. 10th.
3. Ran two four inch wafers for 2 minutes, Refractive index 1.458.
top 849 A
middle 876 A Avg. 853 A delta 43 A
flat 833 A
Second wafer butted up to the flat of the first wafer..
middle 943 Avg. 943 A, delta 34
Any questions or suggestions, please feel free to talk to me.
More information about the sts