From jperez at snf.stanford.edu  Thu Jun 27 15:52:57 2002
From: jperez at snf.stanford.edu (Jeannie Perez)
Date: Thu, 27 Jun 2002 15:52:57 -0700
Subject: STS PECVD
Message-ID: <3D1B9749.687124F1@snf.stanford.edu>

F.Y.I. Users,
The Nitride deposition rate has dropped to 72 angstoms per minute. The
BOE etch rate is also low (110 - 120 A/ min.). The thickness uniformity
is still very good.


Jeannie Perez
Stanford Nanofabrication Facility
CIS Room 146, Mail Code 4070
Stanford, CA  94305
(650) 723-7997
jperez at snf.stanford.edu