STS PECVD

Jeannie Perez jperez at snf.stanford.edu
Thu Jun 27 15:52:57 PDT 2002


F.Y.I. Users,
The Nitride deposition rate has dropped to 72 angstoms per minute. The
BOE etch rate is also low (110 - 120 A/ min.). The thickness uniformity
is still very good.


Jeannie Perez
Stanford Nanofabrication Facility
CIS Room 146, Mail Code 4070
Stanford, CA  94305
(650) 723-7997
jperez at snf.stanford.edu





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