F.Y.I. Users, The Nitride deposition rate has dropped to 72 angstoms per minute. The BOE etch rate is also low (110 - 120 A/ min.). The thickness uniformity is still very good. Jeannie Perez Stanford Nanofabrication Facility CIS Room 146, Mail Code 4070 Stanford, CA 94305 (650) 723-7997 jperez at snf.stanford.edu