From jperez at snf.stanford.edu Fri May 24 17:39:11 2002 From: jperez at snf.stanford.edu (Jeannie Perez) Date: Fri, 24 May 2002 17:39:11 -0700 Subject: STS PECVD Status Temporary! Message-ID: <3CEEDD2F.FD6EDC8F@snf.stanford.edu> To All Users, I have spent may weeks testing, measuring, etching back and I still have more to do. It is all time consuming as you must know. Many changes in the recipe parameters have taken place due to major repairs. I was told by Chris Storment that it would take weeks and possibly months for the system to stabilize. So that users may get their wafers processed, I've created these three recipes. (See attachments). You may copy and create from these three recipes. The old recipes will not give you good oxide or nitride results. Attached to the STS are the recipe parameters and results from tests done with these recipes. If you are using one of the three standard recipes, only adjust time. If you want to tweak other parameters for your process, then copy / edit. I am still working on the Process and Procedures. The uniformity on a load size of four wafers are excellent. For both oxide and nitride. Back wfr. 1779 A \ Front wfr. 1797 A \ OXIDE Left wfr. 1770 A / Right wfr. 1794 A / Thanks you for your patience, Jeannie Perez Stanford Nanofabrication Facility CIS Room 146, Mail Code 4070 Stanford, CA 94305 (650) 723-7997 jperez at snf.stanford.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: STS PECVD Hi-Freq. Oxide Parameters.doc Type: application/msword Size: 20992 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: STS PECVD Loi-Freq. Oxide Parameters.doc Type: application/msword Size: 20480 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: STS PECVD Nitride Parameters.doc Type: application/msword Size: 20480 bytes Desc: not available URL: