From xpxie at stanford.edu Mon Sep 8 16:50:06 2003 From: xpxie at stanford.edu (xpxie) Date: Mon, 8 Sep 2003 16:50:06 -0700 Subject: About Si3N4 refractive index vs deposition conditions in the PECVD system Message-ID: <000b01c37663$ee8131b0$dc5740ab@xxp> Hi, Has anyone done any research or had any old data on the Si3N4 refractive index vs deposition conditions in the PECVD system? My target is to obtain a refractive index of about 2.2 with good control. Any suggestions would be appreciated very much. Xiuping Xie From jperez at snf.stanford.edu Wed Sep 17 08:51:33 2003 From: jperez at snf.stanford.edu (Jeannie Perez) Date: Wed, 17 Sep 2003 08:51:33 -0700 Subject: Community Service added to your account Message-ID: <3F688305.728BF7B2@snf.stanford.edu> All Users, I am pleased to say that, we've added to the accounts of all (or at least the last five months of qualified users) Users of STS PECVD tool "COMMUNITY SERVICE". This will allow you to select community service when enabling for the Cleaning Cycle ONLY! When enabling, press on the down arrow, across from Project and community service should be there for you to select. This way, you won't be charged for cleaning the system. Once you've finished with the clean and start processing, you must be enabled under your own account. Any infraction may cause you the use of the STS tool. Regards, -- Jeannie Perez Stanford Nanofabrication Facility CIS Room 146, Mail Code 4070 Stanford, CA 94305 (650) 723-7997 jperez at snf.stanford.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: