From masafumi at stanford.edu  Fri Apr  1 00:30:38 2005
From: masafumi at stanford.edu (masa)
Date: Fri, 01 Apr 2005 00:30:38 -0800
Subject: KOH tolerance of SiN
In-Reply-To: <1112222378.424b2aaac9da6@webmail.stanford.edu>
References: <1112210887.424afdc7148bd@webmail.stanford.edu> <1112222378.424b2aaac9da6@webmail.stanford.edu>
Message-ID: <20050331141049.B043.MASAFUMI@stanford.edu>

Hi all,

I have a question about KOH tolerance of SiN by STS. I plan to use this
SiN as a mask for the Si etching in KOH. I'd like to etch through 400um
wafer. Since I heard this SiN is as bad as SiO against HF, I'm wondering this
may not be good to use long KOH etching. If you have any experience,
please let me know. I'm thinking to deposit SiN around 500nm thick.

Thanks.
Masafumi Nakamura







From jperez at snf.stanford.edu  Thu Apr  7 10:02:55 2005
From: jperez at snf.stanford.edu (Jeannie Perez)
Date: Thu, 07 Apr 2005 10:02:55 -0700
Subject: Warning.............. STS Users
Message-ID: <425567BF.3050401@snf.stanford.edu>

Hi All,
The Operating procedures and training limits the depositions "NOT TO 
EXCEED A TOTAL THICKNESS OF 4.5 UM".
I am going to start disqualifying users that exceed this limit.
Jeannie



From jperez at snf.stanford.edu  Fri Apr 15 14:24:59 2005
From: jperez at snf.stanford.edu (Jeannie Perez)
Date: Fri, 15 Apr 2005 14:24:59 -0700
Subject: STS PECVD Nitride Recipes can be edited back
Message-ID: <4260312B.419C34F8@snf.stanford.edu>

All Users,
The 2% Silane gas flow for nitride recipes (2000 sccm) is stable again.
I ran a test for five minutes and the Silane flow only fluctuated .01%
of the  set point. Please edited your NITRIDE RECIPES, Silane gas flows
back to 2000 sccm.

--
Jeannie Perez
Science and Engineering Technician
Stanford Nanofabrication Facility
Stanford University
Tel: (650) 723-7997
Fax: (650) 725-6278




From seymour at snf.stanford.edu  Wed Apr 20 07:55:24 2005
From: seymour at snf.stanford.edu (Ray Seymour)
Date: Wed, 20 Apr 2005 07:55:24 -0700
Subject: silane cylinder change.
Message-ID: <42666D5C.C145BE9D@snf.stanford.edu>

System down for cylinder change and leak check.



From jperez at snf.stanford.edu  Thu Apr 21 09:47:23 2005
From: jperez at snf.stanford.edu (Jeannie Perez)
Date: Thu, 21 Apr 2005 09:47:23 -0700
Subject: STS DID NOT Pass leak check!
Message-ID: <4267D91A.177D8A2A@snf.stanford.edu>

Please check Coral for STS PECVD STATUS. STS did NOT pass leak check and
will NOT be up when expected. It doesn't look like it will be up for the
rest of today.
Thanks,

--
Jeannie Perez
Science and Engineering Technician
Stanford Nanofabrication Facility
Stanford University
Tel: (650) 723-7997
Fax: (650) 725-6278