From huangzb at stanford.edu  Mon Dec  5 10:46:28 2005
From: huangzb at stanford.edu (Zubin Huang)
Date: Mon, 5 Dec 2005 10:46:28 -0800
Subject: remove reservation from 4-7am on Tuesday
Message-ID: <200512051846.jB5IkVhJ001448@smtp2.Stanford.EDU>

Hi, 

Remove reservation from 4-7am on Tuesday. Sorry for the late notice.

????????
Best regards,
 				

????????Zubin Huang
????????huangzb at stanford.edu
??????????

From huangzb at stanford.edu  Wed Dec  7 01:01:41 2005
From: huangzb at stanford.edu (Zubin Huang)
Date: Wed, 7 Dec 2005 01:01:41 -0800
Subject: cancel reservation from 4:00-7:00pm on Thursday
Message-ID: <200512070901.jB791jQI025210@smtp2.Stanford.EDU>

Hi,

Cancel reservation from 4:00-7:00pm on Thursday. Sorry for the late notice.
????????
Best regards,
 				

????????Zubin Huang
????????huangzb at stanford.edu
??????????

From ankurjn at stanford.edu  Wed Dec  7 17:25:45 2005
From: ankurjn at stanford.edu (Ankur Jain)
Date: Wed,  7 Dec 2005 17:25:45 -0800
Subject: Etch rate of STS PECVD Oxide in 6:1 BOE
Message-ID: <1134005145.43978b993ec11@webmail.stanford.edu>

Hello everyone,
 I am trying to etch a 3000 A thick PECVD oxide layer deposited by the STS
PECVD machine at SNF using 6:1 BOE. Can someone who has done something
similar before give me an idea of the expected etch rate they have observed
using 6:1 BOE, or another HF based etchant?


thanks,

Ankur



From sharratt at stanford.edu  Wed Dec  7 19:32:11 2005
From: sharratt at stanford.edu (Bree Sharratt)
Date: Wed, 7 Dec 2005 19:32:11 -0800
Subject: sts res removed tomorrow 9-11am
Message-ID: <5579A992-32D6-4784-BD37-A26646E9852C@stanford.edu>

Sorry for the late notice.  Substrates not ready :(