From jperez at snf.stanford.edu Mon Jan 7 15:47:48 2008 From: jperez at snf.stanford.edu (Jeannie Perez) Date: Mon, 07 Jan 2008 15:47:48 -0800 Subject: Test Results for Nitride, Low Freq. Oxide and High Freq. Oxide Message-ID: <6.2.5.6.2.20080107150845.01dd8b00@snf.stanford.edu> Hi Everyone, To my amazement after major PM changes to the STS system (new shower head and realignment of Platen and Thermometer), the test results were good. The GOOD news is that the Deposition Rate on all three tests have increased, so take caution. I've never seen them so high. Probably due to the alignment of the Platen. If you have concerns, please notify me. I'll still be running more tests. Wafers measured on Woollam. Low Frequency, four wafer averages; Back Front Left side Right side Position on Platen 1798 1787 1791 1761 (Thickness) 1.47 1.47 1.47 1.47 (Index of Refraction) 0.847% 0.96% 0.84% 0.87% (range) 10 11,2 10 9.1 (std. dev.) Low Freq. dep. rate is ~380 A / minute Deposition Time was 4' 35" High Frequency, four wafer averages; Back Front Left side Right side Position on Platen 3864 3882 3918 3918 A (Thickness) 1.46 1.46 1.46 1.46 (Index of Refraction) 2.47% 1,40% 3,5% 3% (range) 57 30 78 72 (std Dev.) High frequency dep. rate is ~390 A / minute Deposition Time was 10 minutes. Nitride Deposition for ~13.5 minutes- dep rate is ~ 126 to 130 A / minute Only measured one of four tests on Woollam. Ed Myers will work on recipe. Average thickness 1761A, Didn't give the correct Index of Refraction. Ed figured out to be 1.97. Regards, Jeannie Perez Science and Engineering Technician Stanford Nanofabrication Facility Stanford University Tel: (650) 723-7997 Fax: (650) 725-6278 -------------- next part -------------- An HTML attachment was scrubbed... URL: From jperez at snf.stanford.edu Tue Jan 8 15:40:39 2008 From: jperez at snf.stanford.edu (Jeannie Perez) Date: Tue, 08 Jan 2008 15:40:39 -0800 Subject: STS PECVD Nitride Message-ID: <6.2.5.6.2.20080108153325.01d6c920@snf.stanford.edu> Hi Everyone, Ed Myers has modified his Recipe on the Woollam and here are the results from Mondays test. Deposition Rate isn't as fast as first stated. Dep. rate for PECVD Nitride is 105 Angstroms per minute. The range across the four wafers were less than <2%. STS PECVD is up. Jeannie Perez Science and Engineering Technician Stanford Nanofabrication Facility Stanford University Tel: (650) 723-7997 Fax: (650) 725-6278 -------------- next part -------------- An HTML attachment was scrubbed... URL: From xhlim at stanford.edu Fri Jan 18 09:33:42 2008 From: xhlim at stanford.edu (Xiao Hann Lim) Date: Fri, 18 Jan 2008 09:33:42 -0800 Subject: Reservation canceled 9.30-12 Message-ID: <2E624A3FCF7147ECA875329508942463@stanford.edu> An HTML attachment was scrubbed... URL: