From dwnam at stanford.edu  Sun Mar 13 14:33:48 2011
From: dwnam at stanford.edu (Donguk Nam)
Date: Sun, 13 Mar 2011 14:33:48 -0700
Subject: PECVD is free today from 7pm to midnight
Message-ID: <AANLkTi=JPwFQTEhMaT1v_5dxD9_sa-tiESoZx71VGrik@mail.gmail.com>

Samples are not ready.

Donguk
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From chen0622 at yahoo.com  Tue Mar 15 06:44:10 2011
From: chen0622 at yahoo.com (c.c.)
Date: Tue, 15 Mar 2011 06:44:10 -0700 (PDT)
Subject: reservation released 9:30 to 12:00 AM (03/15)
Message-ID: <151901.11287.qm@web161614.mail.bf1.yahoo.com>

Sorry for the late notice. 
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From npapte at stanford.edu  Thu Mar 17 16:57:19 2011
From: npapte at stanford.edu (Nikhil Apte)
Date: Thu, 17 Mar 2011 16:57:19 -0700
Subject: sts PECVD high compressive stress nitride / oxide recipe
Message-ID: <AANLkTik5xa5ghqqYb82m70WmWkYuLzh-_sSzem6mq-JH@mail.gmail.com>

Hi,

I am planning to deposit a high compressive stress nitride/oxide film on my
wafers to correct the wafer curvature. Can anyone help me with what recipe /
parameters I should use?

Thanks,
Nikhil
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From ylyang at stanford.edu  Thu Mar 17 17:45:44 2011
From: ylyang at stanford.edu (Yongliang Yang)
Date: Thu, 17 Mar 2011 17:45:44 -0700 (PDT)
Subject: sts PECVD high compressive stress nitride / oxide recipe
In-Reply-To: <AANLkTik5xa5ghqqYb82m70WmWkYuLzh-_sSzem6mq-JH@mail.gmail.com>
Message-ID: <1292350594.54442.1300409144891.JavaMail.root@zm04.stanford.edu>

Hi,

Low frequency PECVD SiNx tends to be compressive. I deposited SiNx with different high and low frequency times and tested the tresses. Here is the results:

Standard recipe:
high frequency time= 5s
long frequency time=2s
---- Tested stress = ~ -70 MPa

My recipe:
high frequency time= 4s
long frequency time=3s
---- Tested stress = ~ -250 MPa

Best,
Yongliang

----- Original Message -----
From: "Nikhil Apte" <npapte at stanford.edu>
To: sts at snf.stanford.edu
Sent: Thursday, March 17, 2011 4:57:19 PM
Subject: sts PECVD high compressive stress nitride / oxide recipe

Hi, 


I am planning to deposit a high compressive stress nitride/oxide film on my wafers to correct the wafer curvature. Can anyone help me with what recipe / parameters I should use? 


Thanks, 
Nikhil