Problem stsetch 2002-06-24 21:58:01: STS Unloading problem.

harshal at snf.stanford.edu harshal at snf.stanford.edu
Mon Jun 24 09:58:02 PDT 2002


i was trying to etch a wafer that was mounted on another wafer with photoresist in between them. as i was about to load the wafers, the working wafer surface developed some cracks and hence i immediately aborted the loading process. so THE WAFER DID NOT GO INTO THE PROCESS CHAMBER. but now as i tried to unload the wafer, the pressure in the loading chamber would not come up with the rate as it usually does. the pressure is coming up extremely slowly. i m not sure if there is a way to have the system vented in any other way. hence i disabled the system and would wait for advice untill tomorrow morning.




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