Problem stsetch 2003-08-08 07:22:26: He flow unstable, dusty particles in chamber

mislam at mislam at
Fri Aug 8 07:22:27 PDT 2003

Observed tiny particles around the wafer seal in the chamber.
This is probabily effecting He flow and wafer cooling.
He flow is little high and unstable with even clean wafer.

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