Shutdown stsetch SNF 2007-01-25 17:43:34: wfr broken inside etch chamber

[eenriquez at snf.stanford.edu]

Eric P. cleaned the chamber last night.  Tried to run a plasma clean but it faulted "lost communication with the ICP".  Reset the system and tried to run a clean again.  The system faulted for platen power out of tolerance (high He leak rate). Unloaded wafer and reloaded.  Ran O2 clean sucessfuly.  Ran a second wafer with no problems.