Shutdown stsetch SNF 2007-01-25 17:43:34: wfr broken inside etch chamber

eenriquez at eenriquez at
Fri Jan 26 08:55:20 PST 2007

Eric P. cleaned the chamber last night.  Tried to run a plasma clean but it faulted "lost communication with the ICP".  Reset the system and tried to run a clean again.  The system faulted for platen power out of tolerance (high He leak rate). Unloaded wafer and reloaded.  Ran O2 clean sucessfuly.  Ran a second wafer with no problems.

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