From ericp at snf.stanford.edu Thu Feb 21 21:33:44 2008 From: ericp at snf.stanford.edu (ericp at snf.stanford.edu) Date: Thu, 21 Feb 2008 21:33:44 -0800 Subject: Problem stsetch SNF 2008-02-21 21:33:44: C4F8 flow out of tolerance Message-ID: Once during a half hour process, I received a C4F8 flow out of tolerance error. Again (see my previous message), if we try to control few micron-sized features, this kills the profile! Another SOI wafer burned by a failing machine. In a switched etch process, we cannot afford drop-outs like this. From ericp at snf.stanford.edu Thu Feb 21 23:15:51 2008 From: ericp at snf.stanford.edu (ericp at snf.stanford.edu) Date: Thu, 21 Feb 2008 23:15:51 -0800 Subject: Problem stsetch SNF 2008-02-21 23:15:50: C4F8 failure, update. Message-ID: Did it again on a second wafer, approx 10 min into a half hour etch. That's enough $300 bills burned in this machine for today. From eenriquez at snf.stanford.edu Tue Feb 26 13:28:01 2008 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Tue, 26 Feb 2008 13:28:01 -0800 Subject: Comment stsetch SNF 2008-02-26 13:28:01: C4F8 update Message-ID: Ran and observed the recipe that the user ran (SHER2) for 33 minutes without any problems. Will continue to monitor. From mcherry at snf.stanford.edu Tue Feb 26 14:25:59 2008 From: mcherry at snf.stanford.edu (mcherry at snf.stanford.edu) Date: Tue, 26 Feb 2008 14:25:59 -0800 Subject: Comment stsetch SNF 2008-02-26 14:25:58: C4F8 Update Message-ID: Running DEEP: -C4F8 error at 2' (minutes) 30" (seconds) into 5' etch, resumed and completed etch -Another error 4'55" into a second 5' etch, resumed (for the 5 seconds) and completed etch -Another error 10'21" into a 15' etch, resumed and immediately received coil power error, resumed again -Another C4F8 error 13'44" into same 15' etch, resumed and completed etch However, wafer and PR were completely burned after all this, burning through nitride windows. I did not inspect the wafer outside of the chamber between etches, since I was not concerned with the integrity of this wafer. The C4F8 flow appeared irregular and unreliable throughout the etches, even though there were only these periodic errors. From ericp at snf.stanford.edu Tue Feb 26 20:10:28 2008 From: ericp at snf.stanford.edu (ericp at snf.stanford.edu) Date: Tue, 26 Feb 2008 20:10:28 -0800 Subject: Problem stsetch SNF 2008-02-26 20:10:27: C4F8, continued failures Message-ID: The C4F8 only occasionally reaches setpoint. This, obviously, destroys wafers. Can we please either fix this problem, or call field service? "continuing to monitor" a known problem is "continuing to destroy my wafers," on which we've blown a capped ($7000 not including wafers or time) month of processing. From ericp at snf.stanford.edu Tue Feb 26 20:11:59 2008 From: ericp at snf.stanford.edu (ericp at snf.stanford.edu) Date: Tue, 26 Feb 2008 20:11:59 -0800 Subject: Comment stsetch SNF 2008-02-26 20:11:58: by the way... Message-ID: Ran the "baseline" DEEP recipe, was failing in the first few minutes. From shwong at snf.stanford.edu Wed Feb 27 08:27:06 2008 From: shwong at snf.stanford.edu (shwong at snf.stanford.edu) Date: Wed, 27 Feb 2008 08:27:06 -0800 Subject: Problem stsetch SNF 2008-02-27 08:27:06: C4F8 doesn't reach set point and my dummy wafer is stuck inside Message-ID: From eenriquez at snf.stanford.edu Wed Feb 27 08:31:07 2008 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Wed, 27 Feb 2008 08:31:07 -0800 Subject: Shutdown stsetch SNF 2008-02-27 08:31:07: No C4F8 flow Message-ID: From eenriquez at snf.stanford.edu Wed Feb 27 19:05:16 2008 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Wed, 27 Feb 2008 19:05:16 -0800 Subject: Comment stsetch SNF 2008-02-27 19:05:15: Update Message-ID: Found that C4F8 has liquid in the lines. Pumping out gas line over night. From eenriquez at snf.stanford.edu Thu Feb 28 09:32:46 2008 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Thu, 28 Feb 2008 09:32:46 -0800 Subject: Comment stsetch SNF 2008-02-28 09:32:45: Update Message-ID: Pumped out the C4F8 gas line to the gas cylinder. Set the regulator pressure to 27 psi. Flowed C4F8 for 1 hour at max flow with no problems. Suspect that the regulator might have a creep problem which caused excess pressure to build up in the line. The high line pressure might have caused liquid to form in the line. STSetch2 was not affected by the liquid in the line because it has a regulator at the tool. Will order a new regulator and we will also continue to monitor the line pressure. From eenriquez at snf.stanford.edu Thu Feb 28 14:48:21 2008 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Thu, 28 Feb 2008 14:48:21 -0800 Subject: Comment stsetch SNF 2008-02-28 14:48:21: Update Message-ID: Delivery pressure is stable now but C4F8 flow started dropping after 2 hours flowing maximum flow (170 sccm). Will pump down MFC overnight and will send out MFC tomorrow for repair. From eenriquez at snf.stanford.edu Fri Feb 29 14:31:05 2008 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Fri, 29 Feb 2008 14:31:05 -0800 Subject: Comment stsetch SNF 2008-02-29 14:31:05: Update Message-ID: C4F8 MFC is defective and sent out for repair. Should be here on Monday. From unshzenqcjf at eowwupzfr.com.cn Thu Feb 7 00:33:44 2008 From: unshzenqcjf at eowwupzfr.com.cn (cgwwvshzguns) Date: Thu, 7 Feb 2008 16:33:44 +0800 Subject: =?GB2312?B?1+7QwtPKvP7Iurei?= Message-ID: <20080207083344.278B64DDB52@chinese-5e0f8c2.com> An HTML attachment was scrubbed... URL: