Comment stsetch SNF 2009-06-24 17:50:09: wafer not centered

till at snf.stanford.edu till at snf.stanford.edu
Wed Jun 24 17:50:09 PDT 2009


seems to load the wafer in the process chamber not centered. Neither with holder nor without. Also there is a increase in the He flow for all my wafers. Without holder it is around 3 and with holder it jumps from 3.20-3.90. Tried it with wafers with different layers and backside contamination.




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