Comment stsetch SNF 2009-09-03 09:59:01: Quals before and after chamber clean & PM

latta at snf.stanford.edu latta at snf.stanford.edu
Thu Sep 3 09:59:01 PDT 2009


Here are the results of the pre and post chamber clean etches in stsetch;
Pre Clean;
Wafer 1 avr ER Si = 2.12um/min, avr ER PR = 296A/min, selectivity Si : PR = 72 :1
Wafer 2 avr ER Si = 1.91um/min, avr ER PR = 245A/min, selectivity Si : PR = 80 :1
Post Clean;
Wafer 1 avr ER Si = 1.97um/min, avr ER PR = 293A/min, selectivity Si : PR = 67 :1
Wafer 2 avr ER Si = 2.21um/min, avr ER PR = 323A/min, selectivity Si : PR = 68 :1
Uniformity improved somewhat after the clean.
All data available, just ask. 




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