From eenriquez at snf.stanford.edu Tue Jan 4 10:58:18 2011 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Tue, 4 Jan 2011 10:58:18 -0800 Subject: Comment stsetch SNF 2010-12-03 10:55:30: Completed Monthly PM Message-ID: From eenriquez at snf.stanford.edu Tue Jan 4 10:59:03 2011 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Tue, 4 Jan 2011 10:59:03 -0800 Subject: Problem stsetch SNF 2010-12-14 16:13:59: Monitor dead Message-ID: Replaced the monitor. From eenriquez at snf.stanford.edu Tue Jan 4 10:59:32 2011 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Tue, 4 Jan 2011 10:59:32 -0800 Subject: Comment stsetch SNF 2010-12-14 23:11:20: monitor problem fixed Message-ID: Archived From pnataraj at snf.stanford.edu Sun Jan 9 21:39:17 2011 From: pnataraj at snf.stanford.edu (pnataraj at snf.stanford.edu) Date: Sun, 9 Jan 2011 21:39:17 -0800 Subject: Shutdown stsetch SNF 2011-01-09 21:39:16: Wafer Broken in the Chamber Message-ID: Users, I am sorry. My wafer broke in the middle of the etch. My wafer was loaded on top of the substrate holder and still managed to broke. It never happened to me before. I have asked Eric to help me,if he is free. I have also left a NOTE on the tool to NOT to use it. I am very sorry, Pradeep From eenriquez at snf.stanford.edu Mon Jan 10 13:29:25 2011 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Mon, 10 Jan 2011 13:29:25 -0800 Subject: Shutdown stsetch SNF 2011-01-09 21:39:16: Wafer Broken in the Chamber Message-ID: Recovered the user's wafer and ran O2 clean. Cycled wafers with no problems. From latta at snf.stanford.edu Wed Jan 12 17:29:57 2011 From: latta at snf.stanford.edu (latta at snf.stanford.edu) Date: Wed, 12 Jan 2011 17:29:57 -0800 Subject: Comment stsetch SNF 2010-10-15 12:32:14: Quals after pumps replaced Message-ID: archived From latta at snf.stanford.edu Wed Jan 12 17:30:29 2011 From: latta at snf.stanford.edu (latta at snf.stanford.edu) Date: Wed, 12 Jan 2011 17:30:29 -0800 Subject: Comment stsetch SNF 2010-12-01 17:52:40: Quick qual after chamber clean Message-ID: new quals posted. From latta at snf.stanford.edu Wed Jan 12 17:40:39 2011 From: latta at snf.stanford.edu (latta at snf.stanford.edu) Date: Wed, 12 Jan 2011 17:40:39 -0800 Subject: Comment stsetch SNF 2011-01-12 17:40:38: Quals after shutdown Message-ID: O2CLEAN run for 20 min, DEEP run for 30 min for seasoning Three wafersrun for 10 min, DEEP, with the following results; 1 Si ER = 2.0um/min, PR ER = 85A, Sel Si : PR = 235 : 1 2 Si ER = 2.0um/min, PR ER = 73A, Sel Si : PR = 274 : 1 3 Si ER = 1.96um/min, PR ER = 69A, Sel Si : PR = 284 : 1 One wafer was run for 60 min, DEEP- Si ER = 1.75um/min, PR ER = 171A, Sel Si : PR = 102 : 1 Not sure why the PR ER is so slow for the 10 min etches or why the longer etch yields lower ER's. From minchieh at snf.stanford.edu Thu Jan 13 11:38:45 2011 From: minchieh at snf.stanford.edu (minchieh at snf.stanford.edu) Date: Thu, 13 Jan 2011 11:38:45 -0800 Subject: Shutdown stsetch SNF 2011-01-13 11:38:44: wafer lost during trasnfer out Message-ID: Wafer & holder didn't get transferred out. From eenriquez at snf.stanford.edu Thu Jan 13 14:08:27 2011 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Thu, 13 Jan 2011 14:08:27 -0800 Subject: Shutdown stsetch SNF 2011-01-13 11:38:44: wafer lost during trasnfer out Message-ID: Recoved the user's wafer and placed in her wafer box. Cycled wafer and ran o2 clean. From eenriquez at snf.stanford.edu Wed Jan 26 10:12:40 2011 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Wed, 26 Jan 2011 10:12:40 -0800 Subject: Comment stsetch SNF 2011-01-26 10:12:39: Completed monthly PM Message-ID: From eenriquez at snf.stanford.edu Wed Jan 26 11:16:09 2011 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Wed, 26 Jan 2011 11:16:09 -0800 Subject: Comment stsetch SNF 2011-01-26 11:16:09: Replaced Freon 318 cylinder Message-ID: From latta at snf.stanford.edu Wed Jan 26 15:20:57 2011 From: latta at snf.stanford.edu (latta at snf.stanford.edu) Date: Wed, 26 Jan 2011 15:20:57 -0800 Subject: Comment stsetch SNF 2011-01-26 15:20:56: Grass check for SMOOSHAL Message-ID: I ran a wafer at 15.5 mins two times. After the first 15.5 min the etched areas had texture. After the next 15.5 mins the same areas were showing the hazy stage of grassing (under optical 'scope it looks like particles in open areas). Around the clamp marks the grassing was severe. This was using our standard qual mask. Early runs using DEEP (and a different mask) looked very good at 15.5 mins. As a work around measure while we figure out what has shifted with the SMOOSHAL recipe users might consider increasing the etch time by a second or two.