Problem stsetch SNF 2011-11-20 05:58:03: He back flow leak?

eenriquez at snf.stanford.edu eenriquez at snf.stanford.edu
Mon Nov 21 12:07:47 PST 2011


Helium flow is stable at 3.8 (during process) when running a bare silicon wafer.  The flow however is unstable when using the carrier.  This is normal and is inherent in the design of the carrier.




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