Comment stsetch SNF 2011-11-17 14:11:09: confirming nharjee above

eenriquez at eenriquez at
Mon Nov 21 12:08:28 PST 2011

Helium flow is stable at 3.8 (during process) when running a bare silicon wafer.  The flow however is unstable when using the carrier.  This is normal and is inherent in the design of the carrier.

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