Comment stsetch SNF 2011-11-15 15:11:48: Unusual observations
eenriquez at snf.stanford.edu
eenriquez at snf.stanford.edu
Mon Nov 21 12:08:39 PST 2011
Helium flow is stable at 3.8 (during process) when running a bare silicon wafer. The flow however is unstable when using the carrier. This is normal and is inherent in the design of the carrier.
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