From amoini at snf.stanford.edu Sun May 13 10:41:54 2012 From: amoini at snf.stanford.edu (amoini at snf.stanford.edu) Date: Sun, 13 May 2012 10:41:54 -0700 Subject: Problem stsetch SNF 2012-05-13 10:41:53: crashed turbo?? Message-ID: Loud clanking when I tried to load my wafer. Didn't load and gave message "ICP acknowledge transfer mode entry failure requested." After ~15 minutes I minimized screen and re-maximized and got message "Waiting for turbo to reach speed". E006 on turbo. From cbaxter at snf.stanford.edu Sun May 13 16:22:05 2012 From: cbaxter at snf.stanford.edu (cbaxter at snf.stanford.edu) Date: Sun, 13 May 2012 16:22:05 -0700 Subject: Problem stsetch SNF 2012-05-13 10:41:53: crashed turbo?? Message-ID: Reset the system and ramped up turbo.. From amoini at snf.stanford.edu Tue May 15 08:27:27 2012 From: amoini at snf.stanford.edu (amoini at snf.stanford.edu) Date: Tue, 15 May 2012 08:27:27 -0700 Subject: Problem stsetch SNF 2012-05-15 08:27:26: turbo crash Message-ID: From cbaxter at snf.stanford.edu Tue May 15 14:59:54 2012 From: cbaxter at snf.stanford.edu (cbaxter at snf.stanford.edu) Date: Tue, 15 May 2012 14:59:54 -0700 Subject: Problem stsetch SNF 2012-05-15 08:27:26: turbo crash Message-ID: Re-started the turbo pump. We will schedule a tool shutdown to work on the slit door leak.. From eenriquez at snf.stanford.edu Tue May 22 09:51:01 2012 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Tue, 22 May 2012 09:51:01 -0700 Subject: Shutdown stsetch SNF 2012-05-22 09:51:00: Replacing ch. door seal Message-ID: From eenriquez at snf.stanford.edu Tue May 22 15:07:26 2012 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Tue, 22 May 2012 15:07:26 -0700 Subject: Shutdown stsetch SNF 2012-05-22 09:51:00: Replacing ch. door seal Message-ID: Completed chamber door seal replacement. Chamber leak rate is 3 mTorr/ minute. Ran O2 plasma and ran the Deep recipe. From eenriquez at snf.stanford.edu Wed May 23 06:49:11 2012 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Wed, 23 May 2012 06:49:11 -0700 Subject: Comment stsetch SNF 2012-04-26 15:38:49: Qual after He flow set back to 3.75 from 5.0 Message-ID: Archived From latta at snf.stanford.edu Thu May 24 12:34:48 2012 From: latta at snf.stanford.edu (latta at snf.stanford.edu) Date: Thu, 24 May 2012 12:34:48 -0700 Subject: Comment stsetch SNF 2012-05-24 12:34:47: Qual 5/24 2012 Message-ID: DEEP 00:10:00 Si ER = 1.89um/min, PR ER = 238A/min, Sel = 79:1 From eenriquez at snf.stanford.edu Thu May 31 08:59:40 2012 From: eenriquez at snf.stanford.edu (eenriquez at snf.stanford.edu) Date: Thu, 31 May 2012 08:59:40 -0700 Subject: Comment stsetch SNF 2012-05-31 08:59:40: Update burnt resist Message-ID: Helium backside flow looks good. Will ask Nancy to run a test. From latta at snf.stanford.edu Thu May 31 15:54:38 2012 From: latta at snf.stanford.edu (latta at snf.stanford.edu) Date: Thu, 31 May 2012 15:54:38 -0700 Subject: Problem stsetch SNF 2012-05-30 21:49:21: burn photoresist Message-ID: Chatted with labmember who reported burnt resist. There may be He leak issues with his multi layered wafer stack fitting on the lip seal, or having used EBR at the litho step the edges may have been etched back enough to allow for leaky He. He will show me a sample wafer before the next etch Additionally, another user ran a 3.5 hr etch without resist burning. From latta at snf.stanford.edu Thu May 31 15:54:55 2012 From: latta at snf.stanford.edu (latta at snf.stanford.edu) Date: Thu, 31 May 2012 15:54:55 -0700 Subject: Comment stsetch SNF 2012-05-31 08:59:40: Update burnt resist Message-ID: archived