SOI etching question

Masa Rao mprao at
Tue Oct 22 18:08:30 PDT 2002

Hello Fellow STS Users,

    Have a quick question about etching down to the BOX layer in SOI.  Have
noticed notching at the device layer / BOX interface and have read some
papers from STS's website saying that this is a charging effect that can be
alleviated by running a lower frequency RF plasma when you get close to the
BOX layer. Heard from Nancy that the STS is equipped for this but she didn't
know how to use it.  Was wondering if any of you knew how to use it.  Does
it require any kind of special recipes?  If so, does anyone happen to have a
few?  Any and all help you guys could offer would be greatly appreciated.



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