From yapeter at stanford.edu Mon Mar 3 18:52:21 2003 From: yapeter at stanford.edu (Yves-Alain Peter) Date: Mon, 03 Mar 2003 18:52:21 -0800 Subject: available now, done early Message-ID: <1046746341.3e6414e54b1c1@webmail.stanford.edu> **************************************** Yves-Alain Peter Postdoctoral Researcher Stanford University Edward L. Ginzton Laboratory, 32 S 450 Via Palou street Stanford, CA 94305-4085 USA Phone : + 1 650 723 1945 Fax : + 1 801 912 5730 E-mail : yap at ieee.org http://www.stanford.edu/~yapeter **************************************** From booth at snf.stanford.edu Tue Mar 4 13:34:20 2003 From: booth at snf.stanford.edu (Len Booth) Date: Tue, 04 Mar 2003 13:34:20 -0800 Subject: STSetch cathode temperature Message-ID: <3E651BDB.CCE9858E@snf.stanford.edu> STSetch users - Nancy has been aware of discussions from some users regarding the appearance of "grass" in the etched areas after some recipes. I called STS this morning and they said that the general range of cathode temperatures that most of their etch customers use is 10C to 35C, with the majority of processes being run at 20C. On our machine, the cathode temperature has been about 10C-12C for many months. With Nancys approval I have set the Cathode temperature to 20 deg C, to minimize the appearance of "grass". If any users still experience the "grass" problem, please use CORALs Problem report to let everyone know, so we can continue to track down the cause. Also report any changes in Resist erosion rates that may be due to cathode temperature changes. Len From DaveHong at aol.com Tue Mar 4 13:55:22 2003 From: DaveHong at aol.com (DaveHong at aol.com) Date: Tue, 04 Mar 2003 16:55:22 -0500 Subject: sts free from 5-8pm tonight Message-ID: <7F3BEA6F.4F3DF52D.006EF7EC@aol.com> Finished my wafers earlier. From eap at gloworm.Stanford.EDU Tue Mar 4 14:34:24 2003 From: eap at gloworm.Stanford.EDU (Eric Perozziello) Date: Tue, 4 Mar 2003 14:34:24 -0800 (PST) Subject: sts free from 5-8pm tonight In-Reply-To: <7F3BEA6F.4F3DF52D.006EF7EC@aol.com> Message-ID: I'll take it. Thanks, -Eric On Tue, 4 Mar 2003 DaveHong at aol.com wrote: > Finished my wafers earlier. > > > From dcaudillo at worldnet.att.net Wed Mar 5 00:54:19 2003 From: dcaudillo at worldnet.att.net (David Caudillo-Malik) Date: Wed, 5 Mar 2003 00:54:19 -0800 Subject: stsetch availible 1800-1930 Message-ID: <001701c2e2f5$1084d1c0$621c510c@pavilion> Wafers not ready yet David Caudillo From latta at snf.stanford.edu Wed Mar 5 10:42:48 2003 From: latta at snf.stanford.edu (Nancy Latta) Date: Wed, 5 Mar 2003 10:42:48 -0800 (PST) Subject: System free until 1:00 today Message-ID: From beckwith at cis.Stanford.EDU Wed Mar 5 16:56:25 2003 From: beckwith at cis.Stanford.EDU (beckwith at cis.Stanford.EDU) Date: Wed, 5 Mar 2003 16:56:25 -0800 (PST) Subject: bubbling resist Message-ID: Hi Stsetchers: My good friend Jasmine said she heard someone talking about problems with their resist bubbling up and popping off during their etch step. The problem is, Jasmine can't remember who was doing the talking! If you are the person who had this problem, please e-mail me. I am having this problem, too, and would like to see if our processes are anything alike. And find out if you came up with a solution. Thanks. Sharleen From DaveHong at aol.com Wed Mar 12 01:03:07 2003 From: DaveHong at aol.com (DaveHong at aol.com) Date: Wed, 12 Mar 2003 04:03:07 EST Subject: sts free 1-5pm on Wed. Message-ID: From opticalmachine at hotmail.com Thu Mar 13 15:28:31 2003 From: opticalmachine at hotmail.com (Ben Jian) Date: Thu, 13 Mar 2003 15:28:31 -0800 Subject: STS etch Message-ID: Dear STS Etch users, The chiller temperature on the STS Etch was recently changed from 13 degree C to 20 C in response to users complaining about grass formation at 13 degree C, and will stay at 20 C for the foreseeable future. Unfortunately my process is ruined by this temperate change. So with Nancy's approval, next Tuesday and Wednesday the chiller will be turned back to 13 C so that I can get all my wafers etched. Sorry for any inconvenience this may cause. Best regards. Ben _________________________________________________________________ MSN 8 with e-mail virus protection service: 2 months FREE* http://join.msn.com/?page=features/virus From ddisney at powerint.com Thu Mar 20 08:51:03 2003 From: ddisney at powerint.com (Donald Disney) Date: Thu, 20 Mar 2003 08:51:03 -0800 Subject: Change in STS etch chiller temperature Message-ID: My etch results have also been degraded, apparently by the change in chiller temperature. I would like to see how many people were adversely impacted by this change vs. the number that benefited. I suspect more were adversely affected. If so, I request that the SNF staff please consider reseting the temperature. Please send your comments. Don Disney -----Original Message----- From: Ben Jian [mailto:opticalmachine at hotmail.com] Sent: Thursday, March 13, 2003 3:29 PM To: stsetch at snf.stanford.edu Subject: STS etch Dear STS Etch users, The chiller temperature on the STS Etch was recently changed from 13 degree C to 20 C in response to users complaining about grass formation at 13 degree C, and will stay at 20 C for the foreseeable future. Unfortunately my process is ruined by this temperate change. So with Nancy's approval, next Tuesday and Wednesday the chiller will be turned back to 13 C so that I can get all my wafers etched. Sorry for any inconvenience this may cause. Best regards. Ben _________________________________________________________________ MSN 8 with e-mail virus protection service: 2 months FREE* http://join.msn.com/?page=features/virus From latta at snf.stanford.edu Thu Mar 20 09:48:26 2003 From: latta at snf.stanford.edu (Nancy Latta) Date: Thu, 20 Mar 2003 09:48:26 -0800 Subject: Change in STS etch chiller temperature In-Reply-To: References: Message-ID: <3E79FEEA.9020402@snf.stanford.edu> Folks, We are all for a survey of the users of stsetch, however, in your comments please include what you mean by degradation, changes or other strange observations. Please be as specific as you can. Just saying it has affected your etch does not help. Thanks, Nancy Donald Disney wrote: > My etch results have also been degraded, apparently by the change in chiller > temperature. I would like to see how many people were adversely impacted by > this change vs. the number that benefited. I suspect more were adversely > affected. If so, I request that the SNF staff please consider reseting the > temperature. Please send your comments. > > Don Disney > > -----Original Message----- > From: Ben Jian [mailto:opticalmachine at hotmail.com] > Sent: Thursday, March 13, 2003 3:29 PM > To: stsetch at snf.stanford.edu > Subject: STS etch > > > Dear STS Etch users, > > The chiller temperature on the STS Etch was recently changed from 13 degree > C to 20 C in response to users complaining about grass formation at 13 > degree C, and will stay at 20 C for the foreseeable future. Unfortunately my > > process is ruined by this temperate change. So with Nancy's approval, next > Tuesday and Wednesday the chiller will be turned back to 13 C so that I can > get all my wafers etched. Sorry for any inconvenience this may cause. > > Best regards. > > Ben > > > > _________________________________________________________________ > MSN 8 with e-mail virus protection service: 2 months FREE* > http://join.msn.com/?page=features/virus -- Nancy Latta Stanford Nanofabrication Facility CIS Room 145 420 Via Palou Mall Stanford, CA 94305-4070 (650) 725-6727 latta at snf.stanford.edu From beckwith at cis.stanford.edu Thu Mar 20 10:00:01 2003 From: beckwith at cis.stanford.edu (Sharleen Beckwith) Date: Thu, 20 Mar 2003 10:00:01 -0800 Subject: Change in STS etch chiller temperature In-Reply-To: References: Message-ID: At 8:51 AM -0800 3/20/03, Donald Disney wrote: >My etch results have also been degraded, apparently by the change in chiller >temperature. I would like to see how many people were adversely impacted by >this change vs. the number that benefited. I suspect more were adversely >affected. If so, I request that the SNF staff please consider reseting the >temperature. Please send your comments. > >Don Disney I was worried, after spending days/weeks dealing with resist problems, and running resist etch tests, that now my resist wouldn't work again. I object to randomly changing machine parameters without any testing what-so-ever. When I asked process and maintenance about how this would affect resist etching no one knew. We etched our wafers early this morning for 4 hours and the resist held up. Lucky for us. I do not know what affect this will have on the Molecular Biology Consortium/Hawaii wafers, however. These wafers were difficult to etch to begin with. Sharleen -- "To announce that there must be no criticism of the president, or that we are to stand by the president right or wrong, is not only unpatriotic and servile, but is morally treasonable to the American public." Theodore Roosevelt writing in the Kansas City Star May 7, 1918 From alan.m.myers at intel.com Thu Mar 20 10:41:24 2003 From: alan.m.myers at intel.com (Myers, Alan M) Date: Thu, 20 Mar 2003 10:41:24 -0800 Subject: Change in STS etch chiller temperature Message-ID: <288F9BF66CD9D5118DF400508B68C4460818B63C@orsmsx113.jf.intel.com> Donald, The change in temperature resulted in "grass" at the bottom of my structures. The more anisotropic the etch, the worse the grass was. Now that the temperature has been reset back to its original value, the grass is gone and my wafers look great! Alan -----Original Message----- From: Donald Disney [mailto:ddisney at powerint.com] Sent: Thursday, March 20, 2003 8:51 AM To: 'stsetch at snf.stanford.edu' Subject: Change in STS etch chiller temperature My etch results have also been degraded, apparently by the change in chiller temperature. I would like to see how many people were adversely impacted by this change vs. the number that benefited. I suspect more were adversely affected. If so, I request that the SNF staff please consider reseting the temperature. Please send your comments. Don Disney -----Original Message----- From: Ben Jian [mailto:opticalmachine at hotmail.com] Sent: Thursday, March 13, 2003 3:29 PM To: stsetch at snf.stanford.edu Subject: STS etch Dear STS Etch users, The chiller temperature on the STS Etch was recently changed from 13 degree C to 20 C in response to users complaining about grass formation at 13 degree C, and will stay at 20 C for the foreseeable future. Unfortunately my process is ruined by this temperate change. So with Nancy's approval, next Tuesday and Wednesday the chiller will be turned back to 13 C so that I can get all my wafers etched. Sorry for any inconvenience this may cause. Best regards. Ben _________________________________________________________________ MSN 8 with e-mail virus protection service: 2 months FREE* http://join.msn.com/?page=features/virus From ddisney at powerint.com Thu Mar 20 12:24:34 2003 From: ddisney at powerint.com (Donald Disney) Date: Thu, 20 Mar 2003 12:24:34 -0800 Subject: Change in STS etch chiller temperature Message-ID: Nancy, Good point. The specific changes I observed in my process (that I assume are related to the temperature change) are: - Increase in photoresist undercut from about 0.80um to about 0.95um - Change in sidewall angle from 90deg to 90.5deg (re-entrant) These may not sound like large differences, but they are enough that I will have to re-optimize my etch process for the new temperature. Before I invest in that effort, I'd like to see if there is support for restoring the old temperature. Thanks for your support. Don Disney -----Original Message----- From: Nancy Latta [mailto:latta at snf.stanford.edu] Sent: Thursday, March 20, 2003 9:48 AM To: Donald Disney Cc: 'stsetch at snf.stanford.edu' Subject: Re: Change in STS etch chiller temperature Folks, We are all for a survey of the users of stsetch, however, in your comments please include what you mean by degradation, changes or other strange observations. Please be as specific as you can. Just saying it has affected your etch does not help. Thanks, Nancy Donald Disney wrote: > My etch results have also been degraded, apparently by the change in chiller > temperature. I would like to see how many people were adversely impacted by > this change vs. the number that benefited. I suspect more were adversely > affected. If so, I request that the SNF staff please consider reseting the > temperature. Please send your comments. > > Don Disney > > -----Original Message----- > From: Ben Jian [mailto:opticalmachine at hotmail.com] > Sent: Thursday, March 13, 2003 3:29 PM > To: stsetch at snf.stanford.edu > Subject: STS etch > > > Dear STS Etch users, > > The chiller temperature on the STS Etch was recently changed from 13 degree > C to 20 C in response to users complaining about grass formation at 13 > degree C, and will stay at 20 C for the foreseeable future. Unfortunately my > > process is ruined by this temperate change. So with Nancy's approval, next > Tuesday and Wednesday the chiller will be turned back to 13 C so that I can > get all my wafers etched. Sorry for any inconvenience this may cause. > > Best regards. > > Ben > > > > _________________________________________________________________ > MSN 8 with e-mail virus protection service: 2 months FREE* > http://join.msn.com/?page=features/virus -- Nancy Latta Stanford Nanofabrication Facility CIS Room 145 420 Via Palou Mall Stanford, CA 94305-4070 (650) 725-6727 latta at snf.stanford.edu From mcmaster at cooligy.com Thu Mar 20 12:57:53 2003 From: mcmaster at cooligy.com (Mark McMaster) Date: Thu, 20 Mar 2003 12:57:53 -0800 Subject: Change in STS etch chiller temperature Message-ID: <183A0EDBFD6E8E46872E909796F5CFEE150675@OZ.atsila.com> I also had grassy channels at the lower temperature and my parts are completely non-functional with this artifact. The change to 20C eliminated the grass formation. It is my understanding that previous attempts to eliminate the grass by adjusting other parameters had been unsuccessful (perhaps someone could shed more light here). I also understand that the 20C setpoint was confirmed by STS (again, someone could help with more info on this). Mark -----Original Message----- From: Myers, Alan M [mailto:alan.m.myers at intel.com] Sent: Thursday, March 20, 2003 10:41 AM To: 'Donald Disney'; 'stsetch at snf.stanford.edu' Subject: RE: Change in STS etch chiller temperature Donald, The change in temperature resulted in "grass" at the bottom of my structures. The more anisotropic the etch, the worse the grass was. Now that the temperature has been reset back to its original value, the grass is gone and my wafers look great! Alan -----Original Message----- From: Donald Disney [mailto:ddisney at powerint.com] Sent: Thursday, March 20, 2003 8:51 AM To: 'stsetch at snf.stanford.edu' Subject: Change in STS etch chiller temperature My etch results have also been degraded, apparently by the change in chiller temperature. I would like to see how many people were adversely impacted by this change vs. the number that benefited. I suspect more were adversely affected. If so, I request that the SNF staff please consider reseting the temperature. Please send your comments. Don Disney -----Original Message----- From: Ben Jian [mailto:opticalmachine at hotmail.com] Sent: Thursday, March 13, 2003 3:29 PM To: stsetch at snf.stanford.edu Subject: STS etch Dear STS Etch users, The chiller temperature on the STS Etch was recently changed from 13 degree C to 20 C in response to users complaining about grass formation at 13 degree C, and will stay at 20 C for the foreseeable future. Unfortunately my process is ruined by this temperate change. So with Nancy's approval, next Tuesday and Wednesday the chiller will be turned back to 13 C so that I can get all my wafers etched. Sorry for any inconvenience this may cause. Best regards. Ben _________________________________________________________________ MSN 8 with e-mail virus protection service: 2 months FREE* http://join.msn.com/?page=features/virus From eap at gloworm.Stanford.EDU Thu Mar 20 13:00:27 2003 From: eap at gloworm.Stanford.EDU (Eric Perozziello) Date: Thu, 20 Mar 2003 13:00:27 -0800 (PST) Subject: Change in STS etch chiller temperature In-Reply-To: Message-ID: Please keep in mind that the temperature was mistakenly changed a few months ago. It is back to the manufacturer's recommended temperature now. So, it has been reset to the correct setting. This all started because the chiller died last summer, and was replaced with a temporary chiller just to keep the machine operating. Some people apparently designed their process when the wrong chiller was operating on the machine. According to the logs, the original chiller was re-installed, and set to the correct temperature (18 deg C, Cesar Baxter, July 22). Sometime later (no record), the ciller was changed to 12 C. This has caused numerous problems for numerous people. We couldn't get a clean bottom on trenches or open areas even with the baseline process (something that is pretty fundamental!). The lowered temperature was also likely responsible for the visible buildup of garbage in the system, which causes problems for some time even after the chiller is returned to the proper temperature. Chiller temperature back to normal-> no more garbage. So it is not an issue of "taking a vote". Sidewall angles can be corrected by changing passivation. Mask erosion can be fixed with designed mask bias. Incorrect chiller temperature is not soemthing you can live with, unless you scrub the chamber daily. On Thu, 20 Mar 2003, Donald Disney wrote: > My etch results have also been degraded, apparently by the change in chiller > temperature. I would like to see how many people were adversely impacted by > this change vs. the number that benefited. I suspect more were adversely > affected. If so, I request that the SNF staff please consider reseting the > temperature. Please send your comments. > > Don Disney > > -----Original Message----- > From: Ben Jian [mailto:opticalmachine at hotmail.com] > Sent: Thursday, March 13, 2003 3:29 PM > To: stsetch at snf.stanford.edu > Subject: STS etch > > > Dear STS Etch users, > > The chiller temperature on the STS Etch was recently changed from 13 degree > C to 20 C in response to users complaining about grass formation at 13 > degree C, and will stay at 20 C for the foreseeable future. Unfortunately my > > process is ruined by this temperate change. So with Nancy's approval, next > Tuesday and Wednesday the chiller will be turned back to 13 C so that I can > get all my wafers etched. Sorry for any inconvenience this may cause. > > Best regards. > > Ben > > > > _________________________________________________________________ > MSN 8 with e-mail virus protection service: 2 months FREE* > http://join.msn.com/?page=features/virus > From ddisney at powerint.com Thu Mar 20 13:17:30 2003 From: ddisney at powerint.com (Donald Disney) Date: Thu, 20 Mar 2003 13:17:30 -0800 Subject: Change in STS etch chiller temperature Message-ID: Eric, Thanks for the history and detailed explanation. It sounds like the best option for the community is for me and others who were adversely affected to re-optimize. It is a pain, but can certainy be done. Nancy, Could you please confirm the staff's intention regarding temperature setting. I would like confirmation before I start re-optimizing. Thanks. Don -----Original Message----- From: Eric Perozziello [mailto:eap at gloworm.Stanford.EDU] Sent: Thursday, March 20, 2003 1:00 PM To: stsetch at snf.stanford.edu Subject: Re: Change in STS etch chiller temperature Please keep in mind that the temperature was mistakenly changed a few months ago. It is back to the manufacturer's recommended temperature now. So, it has been reset to the correct setting. This all started because the chiller died last summer, and was replaced with a temporary chiller just to keep the machine operating. Some people apparently designed their process when the wrong chiller was operating on the machine. According to the logs, the original chiller was re-installed, and set to the correct temperature (18 deg C, Cesar Baxter, July 22). Sometime later (no record), the ciller was changed to 12 C. This has caused numerous problems for numerous people. We couldn't get a clean bottom on trenches or open areas even with the baseline process (something that is pretty fundamental!). The lowered temperature was also likely responsible for the visible buildup of garbage in the system, which causes problems for some time even after the chiller is returned to the proper temperature. Chiller temperature back to normal-> no more garbage. So it is not an issue of "taking a vote". Sidewall angles can be corrected by changing passivation. Mask erosion can be fixed with designed mask bias. Incorrect chiller temperature is not soemthing you can live with, unless you scrub the chamber daily. On Thu, 20 Mar 2003, Donald Disney wrote: > My etch results have also been degraded, apparently by the change in chiller > temperature. I would like to see how many people were adversely impacted by > this change vs. the number that benefited. I suspect more were adversely > affected. If so, I request that the SNF staff please consider reseting the > temperature. Please send your comments. > > Don Disney > > -----Original Message----- > From: Ben Jian [mailto:opticalmachine at hotmail.com] > Sent: Thursday, March 13, 2003 3:29 PM > To: stsetch at snf.stanford.edu > Subject: STS etch > > > Dear STS Etch users, > > The chiller temperature on the STS Etch was recently changed from 13 degree > C to 20 C in response to users complaining about grass formation at 13 > degree C, and will stay at 20 C for the foreseeable future. Unfortunately my > > process is ruined by this temperate change. So with Nancy's approval, next > Tuesday and Wednesday the chiller will be turned back to 13 C so that I can > get all my wafers etched. Sorry for any inconvenience this may cause. > > Best regards. > > Ben > > > > _________________________________________________________________ > MSN 8 with e-mail virus protection service: 2 months FREE* > http://join.msn.com/?page=features/virus > From beckwith at cis.stanford.edu Thu Mar 20 13:27:51 2003 From: beckwith at cis.stanford.edu (Sharleen Beckwith) Date: Thu, 20 Mar 2003 13:27:51 -0800 Subject: Change in STS etch chiller temperature In-Reply-To: References: Message-ID: Hi All: >According to the logs, the original chiller was re-installed, and set to >the correct temperature (18 deg C, Cesar Baxter, July 22). >Sometime later (no record), the ciller was changed to 12 C. This >has caused numerous problems for numerous people. We couldn't get a >clean bottom on trenches or open areas even with the baseline process >(something that is pretty fundamental!). This begs the following questions: Who changed it to 12C, why, and why was no one told? I don't have a problem with parameters changing when necessary. I do have a problem when things get changed and the user base is not informed. For all I know that change to 12C could have caused the problems with my resist. I have spent numerous hours trying to figure out what was wrong. It worked, then it didn't work, now it is working again. Sharleen -- "To announce that there must be no criticism of the president, or that we are to stand by the president right or wrong, is not only unpatriotic and servile, but is morally treasonable to the American public." Theodore Roosevelt writing in the Kansas City Star May 7, 1918 From bchui at california.com Fri Mar 21 04:29:58 2003 From: bchui at california.com (Benjamin Chui) Date: Fri, 21 Mar 2003 04:29:58 -0800 Subject: STS chiller temperature Message-ID: Hi all, Yesterday was the first time I tried out the STS with the new (20 C) chiller temperature. All of the 3 wafers I etched turned out extremely well. Selectivity vs resist and oxide was excellent, and the etch rate seems to have gone up by ~10% as well. Sidewall angle was about the same as before. And of course, no grass!!! Ben Chui From Spotworthy at aol.com Fri Mar 21 05:22:37 2003 From: Spotworthy at aol.com (Spotworthy at aol.com) Date: Fri, 21 Mar 2003 08:22:37 -0500 Subject: Sat morn 6-10am res. removed Message-ID: <1892139A.2F0491B3.0CEC25E7@aol.com> Saturday, 3/22/03 6-10am is now available. Sorry for the short notice. Linda W. From bchui at california.com Sat Mar 22 16:24:06 2003 From: bchui at california.com (Benjamin Chui) Date: Sat, 22 Mar 2003 16:24:06 -0800 Subject: STS free Monday 1000-1300 Message-ID: From bchui at california.com Mon Mar 24 12:42:25 2003 From: bchui at california.com (Benjamin Chui) Date: Mon, 24 Mar 2003 12:42:25 -0800 Subject: STS available today 1300-1630 Message-ID: with a half hour gap at 1400-1430. Sorry for the late notice. Ben From beckwith at cis.Stanford.EDU Mon Mar 24 12:49:25 2003 From: beckwith at cis.Stanford.EDU (beckwith at cis.Stanford.EDU) Date: Mon, 24 Mar 2003 12:49:25 -0800 (PST) Subject: STS available today 1300-1630 In-Reply-To: Message-ID: On Mon, 24 Mar 2003, Benjamin Chui wrote: > with a half hour gap at 1400-1430. > > Sorry for the late notice. > > Ben I took the time! From jocelyn.nee at lightconnect.com Mon Mar 24 13:29:50 2003 From: jocelyn.nee at lightconnect.com (Jocelyn Nee) Date: Mon, 24 Mar 2003 13:29:50 -0800 Subject: STSETCH available 2:30-3pm and 4:30-6:30pm TODAY Message-ID: <2963ADCF008F5F4BA05BCD4B1720A96DD8E4F9@lcpo.lightconnect.com> My wafers are not ready due to matrix downtime. Jocelyn -------------- next part -------------- An HTML attachment was scrubbed... URL: From dcaudillo at att.net Mon Mar 24 20:43:00 2003 From: dcaudillo at att.net (dcaudillo at att.net) Date: Tue, 25 Mar 2003 04:43:00 +0000 Subject: stsetch availible now Message-ID: Done Early.... From beckwith at cis.Stanford.EDU Tue Mar 25 18:30:26 2003 From: beckwith at cis.Stanford.EDU (beckwith at cis.Stanford.EDU) Date: Tue, 25 Mar 2003 18:30:26 -0800 (PST) Subject: machine is available from 1:30 am - 7:30 am Wed. 3/26 Message-ID: From jocelyn.nee at lightconnect.com Mon Mar 31 13:08:33 2003 From: jocelyn.nee at lightconnect.com (Jocelyn Nee) Date: Mon, 31 Mar 2003 13:08:33 -0800 Subject: STS etcher free 1:30pm-8pm today Message-ID: <2963ADCF008F5F4BA05BCD4B1720A96DD8E510@lcpo.lightconnect.com> My wafers are not ready. Jocelyn -------------- next part -------------- An HTML attachment was scrubbed... URL: From maurice at snf.stanford.edu Mon Mar 31 14:06:22 2003 From: maurice at snf.stanford.edu (Maurice Stevens) Date: Mon, 31 Mar 2003 14:06:22 -0800 Subject: Free til 3:00pm Message-ID: <3E88BBDE.EEA7395C@snf.stanford.edu>